Insulating Materials for Optoelectronics PDF Download

Author: F. Agull¢-L¢pez
Publisher: World Scientific
ISBN: 9810222300
Category : Technology & Engineering
Languages : en
Pages : 465

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Book Description
This review volume presents new developments in the preparation, physical characterization and applications of insulating materials for Optoelectronics. Insulators occupy a leading position as laser and optical amplifier hosts, electrooptic and acoustooptic modulators, frequency doublers and optical parametric oscillators, photorefractive devices and radiator detectors. These applications rely heavily on the development of advanced techniques for the preparation of both bulk and waveguide structures, the adequate knowledge of the microscopic behaviour defects, impurities and a thorough understanding of their response to electromagnetic fields. All these topics relating basic physicochemical aspects and applied performance are authoritatively discussed in the book.

Author: Mark Goorsky
Publisher: BoD – Books on Demand
ISBN: 9535106341
Category : Science
Languages : en
Pages : 452

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Book Description
Ion implantation presents a continuously evolving technology. While the benefits of ion implantation are well recognized for many commercial endeavors, there have been recent developments in this field. Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.

Author: Emile Knystautas
Publisher: CRC Press
ISBN: 1351836757
Category : Technology & Engineering
Languages : en
Pages : 362

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Book Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th

Author: S.U. Campisano
Publisher: Elsevier
ISBN: 0444596798
Category : Technology & Engineering
Languages : en
Pages : 320

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Book Description
Ion beam processing is a means of producing both novel materials and structures. The contributions in this volume strongly focus on this aspect and include many papers reporting on the modification of the electrical and structural properties of the target materials, both metals and semiconductors, as well as the synthesis of buried and surface compound layers. Many examples on the applications of high energy and high dose ion implantation are also given. All of the papers from Symposia C and D are presented in this single volume because the interests of many of the participants span both topics. Additionally many of the materials science aspects, including experimental methods, equipment and processing problems, diagnostic and analytical techniques are common to both symposia.

Author: S. Coffa
Publisher: Newnes
ISBN: 044459972X
Category : Science
Languages : en
Pages : 1031

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Book Description
The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.

Author:
Publisher:
ISBN:
Category : Government publications
Languages : en
Pages : 18

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Book Description

Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1002

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Book Description

Author: Dietmar Fink
Publisher: Springer Science & Business Media
ISBN: 3662106086
Category : Technology & Engineering
Languages : en
Pages : 344

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Book Description
The second volume, Transport Processes in Ion Irradiated Polymers deals with transport processes in both unirradiated and irradiated polymers. As both a review and a stimulus, this work seeks to contribute substantially to the literature and advancement of polymeric devices, from both the low- and high-energy regimes.

Author: Feng Chen
Publisher: Springer Nature
ISBN: 981154607X
Category : Science
Languages : en
Pages : 298

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Book Description
This book focuses on the fundamentals, technologies and properties of ion irradiation of dielectric materials (e.g. glasses, crystals) with regard to various photonic applications. It introduces readers to diverse ion-beam techniques for the fabrication and modification of micron- or nanoscale photonic structures, including optical waveguides, photonic crystals, and nanoparticle (nano-spheres and nano-rods) systems, and presents state-of-the-art advances in this multi-disciplinary research field, demonstrating the unique capabilities of ion-beam technologies in optical dielectric materials processing. The book discusses in detail the properties of ion-beam processed waveguides, as well as the modification of dielectrics for photonic applications, such as electro-optic modulation, nonlinear frequency conversion, waveguide amplification and lasing. It also explores synthesis and the correlated optical effects of nanoparticles by ion beams, and features examples of successful micro- and nano-photonic devices. Given its breadth of coverage, the book will particularly appeal to readers interested in ion-beam technology, materials science, and integrated optics.

Author: Y. Pauleau
Publisher: Springer Science & Business Media
ISBN: 9401100772
Category : Technology & Engineering
Languages : en
Pages : 652

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Book Description
Materials and Processes for Surface and Interface Engineering, which has been written by experts in the fields of deposition technology and surface modification techniques, offers up to date tutorial papers on the latest advances in surface and interface engineering. The emphasis is on fundamental aspects, principles and applications of plasma and ion beam processing technology. A handbook for the engineer and scientist as well as an introduction for students in several branches of materials science and surface engineering.