Author: Mengxiao Wang
Publisher:
ISBN:
Category :
Languages : en
Pages : 100
Book Description
Diamond, due to its unique properties, has been studied for decades. Many diamond synthesis methods have been developed as well. As one of the synthesis methods, combustion flame chemical vapor deposition (CVD) is considered as the most flexible way. Combined with laser irradiation, laser-assisted combustion flame CVD can enhance the deposition process of diamond films. In this thesis work, efforts were made to explore the capability of a laser-assisted combustion flame CVD technique with krypton fluoride (KrF) excimer laser irradiation for improving diamond thin film quality and deposition rate. The research efforts mainly focus on following activities, including: 1) studying the influence of the gap distance between the inner flame and the substrates on crystallographic orientations, quality and deposition rate of the diamond film to determine the optimal parameters for the deposition; 2) conducting in-situ KrF excimer laser irradiation during the deposition process to increase the quality and the growth rate of the diamond film with the optimal deposition parameters, which includes excimer laser irradiation on the diamond film and on the combustion flame; 3) applying post-growth KrF excimer laser irradiation on diamond films, which is aiming to understand and verify the effect of KrF excimer laser irradiation on the diamond film during the deposition. A multi-torch combustion flame CVD was also developed for increasing the efficiency of depositing large-area diamond thin films. Diamond thin films have been deposited on tungsten carbide (WC) by the laser-assisted combustion-flame CVD technique in open atmosphere. A KrF excimer laser was used in the process to: 1) achieve energy coupling into combustion flame; 2) influence species proportions in the combustion flame; 3) promote seeding and nucleation process during diamond film deposition; 4) increase the diamond thin film quality and deposition rate through non-diamond carbon removal. Observations from experimental results confirmed that excimer laser irradiation could promote seeding and nucleation of diamond, growth rate and diamond quality. Furthermore, by changing the gap distance, the crystallographic orientations of diamond films can be controlled successfully and the optimal gap distance for diamond deposition can also be found. With applying a multi-torch setup in laser-assisted combustion flame CVD method, large-area diamond thin films were synthesized efficiently.
UV Laser-assisted Diamond Deposition
Author: Mengxiao Wang
Publisher:
ISBN:
Category :
Languages : en
Pages : 100
Book Description
Diamond, due to its unique properties, has been studied for decades. Many diamond synthesis methods have been developed as well. As one of the synthesis methods, combustion flame chemical vapor deposition (CVD) is considered as the most flexible way. Combined with laser irradiation, laser-assisted combustion flame CVD can enhance the deposition process of diamond films. In this thesis work, efforts were made to explore the capability of a laser-assisted combustion flame CVD technique with krypton fluoride (KrF) excimer laser irradiation for improving diamond thin film quality and deposition rate. The research efforts mainly focus on following activities, including: 1) studying the influence of the gap distance between the inner flame and the substrates on crystallographic orientations, quality and deposition rate of the diamond film to determine the optimal parameters for the deposition; 2) conducting in-situ KrF excimer laser irradiation during the deposition process to increase the quality and the growth rate of the diamond film with the optimal deposition parameters, which includes excimer laser irradiation on the diamond film and on the combustion flame; 3) applying post-growth KrF excimer laser irradiation on diamond films, which is aiming to understand and verify the effect of KrF excimer laser irradiation on the diamond film during the deposition. A multi-torch combustion flame CVD was also developed for increasing the efficiency of depositing large-area diamond thin films. Diamond thin films have been deposited on tungsten carbide (WC) by the laser-assisted combustion-flame CVD technique in open atmosphere. A KrF excimer laser was used in the process to: 1) achieve energy coupling into combustion flame; 2) influence species proportions in the combustion flame; 3) promote seeding and nucleation process during diamond film deposition; 4) increase the diamond thin film quality and deposition rate through non-diamond carbon removal. Observations from experimental results confirmed that excimer laser irradiation could promote seeding and nucleation of diamond, growth rate and diamond quality. Furthermore, by changing the gap distance, the crystallographic orientations of diamond films can be controlled successfully and the optimal gap distance for diamond deposition can also be found. With applying a multi-torch setup in laser-assisted combustion flame CVD method, large-area diamond thin films were synthesized efficiently.
Publisher:
ISBN:
Category :
Languages : en
Pages : 100
Book Description
Diamond, due to its unique properties, has been studied for decades. Many diamond synthesis methods have been developed as well. As one of the synthesis methods, combustion flame chemical vapor deposition (CVD) is considered as the most flexible way. Combined with laser irradiation, laser-assisted combustion flame CVD can enhance the deposition process of diamond films. In this thesis work, efforts were made to explore the capability of a laser-assisted combustion flame CVD technique with krypton fluoride (KrF) excimer laser irradiation for improving diamond thin film quality and deposition rate. The research efforts mainly focus on following activities, including: 1) studying the influence of the gap distance between the inner flame and the substrates on crystallographic orientations, quality and deposition rate of the diamond film to determine the optimal parameters for the deposition; 2) conducting in-situ KrF excimer laser irradiation during the deposition process to increase the quality and the growth rate of the diamond film with the optimal deposition parameters, which includes excimer laser irradiation on the diamond film and on the combustion flame; 3) applying post-growth KrF excimer laser irradiation on diamond films, which is aiming to understand and verify the effect of KrF excimer laser irradiation on the diamond film during the deposition. A multi-torch combustion flame CVD was also developed for increasing the efficiency of depositing large-area diamond thin films. Diamond thin films have been deposited on tungsten carbide (WC) by the laser-assisted combustion-flame CVD technique in open atmosphere. A KrF excimer laser was used in the process to: 1) achieve energy coupling into combustion flame; 2) influence species proportions in the combustion flame; 3) promote seeding and nucleation process during diamond film deposition; 4) increase the diamond thin film quality and deposition rate through non-diamond carbon removal. Observations from experimental results confirmed that excimer laser irradiation could promote seeding and nucleation of diamond, growth rate and diamond quality. Furthermore, by changing the gap distance, the crystallographic orientations of diamond films can be controlled successfully and the optimal gap distance for diamond deposition can also be found. With applying a multi-torch setup in laser-assisted combustion flame CVD method, large-area diamond thin films were synthesized efficiently.
Laser-assisted Diamond Deposition in Open Atmosphere
Author: Yaoxuan Han
Publisher: ProQuest
ISBN: 9780549615514
Category : Diamond thin films
Languages : en
Pages :
Book Description
Publisher: ProQuest
ISBN: 9780549615514
Category : Diamond thin films
Languages : en
Pages :
Book Description
Ultraviolet Laser-assisted Deposition and Etching by Photogenerated Free Radicals
Author: Robert K. Montgomery
Publisher:
ISBN:
Category :
Languages : en
Pages : 146
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 146
Book Description
Low-Pressure Synthetic Diamond
Author: Bernhard Dischler
Publisher: Springer Science & Business Media
ISBN: 3642719929
Category : Science
Languages : en
Pages : 383
Book Description
A comprehensive presentation of the complete spectrum of methods for CVD-diamond deposition and an overview of the most important applications.
Publisher: Springer Science & Business Media
ISBN: 3642719929
Category : Science
Languages : en
Pages : 383
Book Description
A comprehensive presentation of the complete spectrum of methods for CVD-diamond deposition and an overview of the most important applications.
Handbook of Liquids-Assisted Laser Processing
Author: Arvi Kruusing
Publisher: Elsevier
ISBN: 0080555047
Category : Technology & Engineering
Languages : en
Pages : 465
Book Description
Laser processing of solid materials has been commonly performed in gas ambient. Having the workpiece immersed into liquid, having a liquid film on it, or soaking the material with liquid gives several advantages such as removal of the debris, lowering the heat load on the workpiece, and confining the vapour and plasma, resulting in higher shock pressure on the surface. Introduced in the 1980s, neutral liquids assisted laser processing (LALP) has proved to be advantageous in the cutting of heat-sensitive materials, shock peening of machine parts, cleaning of surfaces, fabrication of micro-optical components, and for generation of nanoparticles in liquids. The liquids used range from water through organic solvents to cryoliquids. The primary aim of Handbook of Liquids-Assisted Laser Processing is to present the essentials of previous research (tabulated data of experimental conditions and results), and help researchers develop new processing and diagnostics techniques (presenting data of liquids and a review of physical phenomena associated with LALP). Engineers can use the research results and technological innovation information to plan their materials processing tasks. Laser processing in liquids has been applied to a number of different tasks in various fields such as mechanical engineering, microengineering, chemistry, optics, and bioscience. A comprehensive glossary with definitions of the terms and explanations has been added. The book covers the use of chemically inert liquids under normal conditions. Laser chemical processing examples are presented for comparison only. - First book in this rapidly growing field impacting mechanical and micro/nano-engineering - Covers different kinds of liquid-assisted laser processing of a large variety of materials - Covers lasers emitting from UV to IR with pulse lengths down to femtoseconds - Reviews over 500 scientific articles and 300 inventions and tabulates their main features - Gives a qualitative and quantitative description of the physical phenomena associated with LALP - Tabulates 61 parameters for 100 liquids - Glossary of over 200 terms and abbreviations
Publisher: Elsevier
ISBN: 0080555047
Category : Technology & Engineering
Languages : en
Pages : 465
Book Description
Laser processing of solid materials has been commonly performed in gas ambient. Having the workpiece immersed into liquid, having a liquid film on it, or soaking the material with liquid gives several advantages such as removal of the debris, lowering the heat load on the workpiece, and confining the vapour and plasma, resulting in higher shock pressure on the surface. Introduced in the 1980s, neutral liquids assisted laser processing (LALP) has proved to be advantageous in the cutting of heat-sensitive materials, shock peening of machine parts, cleaning of surfaces, fabrication of micro-optical components, and for generation of nanoparticles in liquids. The liquids used range from water through organic solvents to cryoliquids. The primary aim of Handbook of Liquids-Assisted Laser Processing is to present the essentials of previous research (tabulated data of experimental conditions and results), and help researchers develop new processing and diagnostics techniques (presenting data of liquids and a review of physical phenomena associated with LALP). Engineers can use the research results and technological innovation information to plan their materials processing tasks. Laser processing in liquids has been applied to a number of different tasks in various fields such as mechanical engineering, microengineering, chemistry, optics, and bioscience. A comprehensive glossary with definitions of the terms and explanations has been added. The book covers the use of chemically inert liquids under normal conditions. Laser chemical processing examples are presented for comparison only. - First book in this rapidly growing field impacting mechanical and micro/nano-engineering - Covers different kinds of liquid-assisted laser processing of a large variety of materials - Covers lasers emitting from UV to IR with pulse lengths down to femtoseconds - Reviews over 500 scientific articles and 300 inventions and tabulates their main features - Gives a qualitative and quantitative description of the physical phenomena associated with LALP - Tabulates 61 parameters for 100 liquids - Glossary of over 200 terms and abbreviations
Diamond Film Deposition Using Laser-assisted Combustion Flames
Author: Lisha Fan
Publisher:
ISBN: 9781321409871
Category : Chemical vapor deposition
Languages : en
Pages : 179
Book Description
Optical emission spectroscopy and mass spectrometry were performed to achieve an in-depth understanding of laser effects on diamond deposition and to identify active species roles in diamond formation.
Publisher:
ISBN: 9781321409871
Category : Chemical vapor deposition
Languages : en
Pages : 179
Book Description
Optical emission spectroscopy and mass spectrometry were performed to achieve an in-depth understanding of laser effects on diamond deposition and to identify active species roles in diamond formation.
Surface Processing and Laser Assisted Chemistry
Author: E. Fogarassy
Publisher: Elsevier
ISBN: 0444596682
Category : Science
Languages : en
Pages : 495
Book Description
The papers in this volume cover all aspects of laser assisted surface processing ranging from the preparation of high-Tc superconducting layer structures to industrial laser applications for device fabrication. The topics presented give recent results in organometallic chemistry and laser photochemistry, and novel surface characterization techniques. The ability to control the surface morphology by digital deposition and etching shows one of the future directions for exciting applications of laser surface processing, some of which may apply UV and VUV excitation. The understanding of elementary proceses is essential for the design of novel deposition methods, with diamond CVD being an outstanding example. The high quality of these contributions once again demonstrates that the E-MRS is an efficient forum for interaction between research workers and industry.
Publisher: Elsevier
ISBN: 0444596682
Category : Science
Languages : en
Pages : 495
Book Description
The papers in this volume cover all aspects of laser assisted surface processing ranging from the preparation of high-Tc superconducting layer structures to industrial laser applications for device fabrication. The topics presented give recent results in organometallic chemistry and laser photochemistry, and novel surface characterization techniques. The ability to control the surface morphology by digital deposition and etching shows one of the future directions for exciting applications of laser surface processing, some of which may apply UV and VUV excitation. The understanding of elementary proceses is essential for the design of novel deposition methods, with diamond CVD being an outstanding example. The high quality of these contributions once again demonstrates that the E-MRS is an efficient forum for interaction between research workers and industry.
Pulsed Laser Deposition of Thin Films
Author: Robert Eason
Publisher: John Wiley & Sons
ISBN: 0470052112
Category : Science
Languages : en
Pages : 754
Book Description
Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.
Publisher: John Wiley & Sons
ISBN: 0470052112
Category : Science
Languages : en
Pages : 754
Book Description
Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.
Laser Induced Damage in Optical Materials
Laser Processing and Chemistry
Author: Dieter Bäuerle
Publisher: Springer Science & Business Media
ISBN: 3642176135
Category : Science
Languages : en
Pages : 846
Book Description
Laser Processing and Chemistry gives an overview of the fundamentals and applications of laser-matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas-solid, liquid-solid, and solid-solid interfaces. Starting with the background physics, the book proceeds to examine applications of laser techniques in micro-machining, and the patterning, coating, and modification of material surfaces. This fourth edition has been revised and enlarged to cover new topics such as 3D microfabrication, advances in nanotechnology, ultrafast laser technology and laser chemical processing (LCP). Graduate students, physicists, chemists, engineers, and manufacturers alike will find this book an invaluable reference work on laser processing.
Publisher: Springer Science & Business Media
ISBN: 3642176135
Category : Science
Languages : en
Pages : 846
Book Description
Laser Processing and Chemistry gives an overview of the fundamentals and applications of laser-matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas-solid, liquid-solid, and solid-solid interfaces. Starting with the background physics, the book proceeds to examine applications of laser techniques in micro-machining, and the patterning, coating, and modification of material surfaces. This fourth edition has been revised and enlarged to cover new topics such as 3D microfabrication, advances in nanotechnology, ultrafast laser technology and laser chemical processing (LCP). Graduate students, physicists, chemists, engineers, and manufacturers alike will find this book an invaluable reference work on laser processing.