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Author: Paul W. Mertens Publisher: Trans Tech Publications Ltd ISBN: 3035738017 Category : Science Languages : en Pages : 325
Book Description
Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) Selected, peer-reviewed papers from the 15-th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), April 12-15, 2021, Mechelen, Belgium
Author: Paul W. Mertens Publisher: Trans Tech Publications Ltd ISBN: 3035738017 Category : Science Languages : en Pages : 325
Book Description
Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) Selected, peer-reviewed papers from the 15-th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), April 12-15, 2021, Mechelen, Belgium
Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 303641312X Category : Science Languages : en Pages : 363
Book Description
Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023) Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023), September 12-14, 2023, Brugge, Belgium
Author: Takeshi Hattori Publisher: Springer Science & Business Media ISBN: 3662035359 Category : Technology & Engineering Languages : en Pages : 634
Book Description
A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 3038131954 Category : Technology & Engineering Languages : en Pages : 383
Book Description
Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) held in Antwerp, Belgium, September 18-20, 2006
Author: Michael Liehr Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 440
Book Description
Wafer cleaning, microcontamination and surface passivation are the key focus of this proceedings volume, the 3rd in a successful series from MRS. It is a field in which control of surface chemistry and surface morphology, as well as particle and molecular contamination removal, are of critical importance. This volume expands the scope of the topic to include ultraclean technology in a broader sense, emphasizing the identification and characterization of trace contamination, strategies for removal, and equipment considerations, as well as critical limits for impact on devices. Novel processes, such as chemical mechanical polishing (CMP), and their ramifications for contamination removal are also addressed.
Author: Paul W. Mertens Publisher: Trans Tech Publications Ltd ISBN: 3035730849 Category : Technology & Engineering Languages : en Pages : 395
Book Description
Selected, peer reviewed papers from the 13th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 12-14, 2016, Knokke, Belgium
Author: Takeshi Hattori Publisher: The Electrochemical Society ISBN: 156677568X Category : Microelectronics Languages : en Pages : 497
Book Description
This issue covers topics related to the removal of contaminants from and conditioning of Si (SOI), SiC, Ge, SiGe, and III-V semiconductor surfaces; cleaning media, including non-aqueous cleaning methods and tools; front- and back-end cleaning operations; integrated cleaning; cleaning of MEMS; photomasks (reticles); porous low-k dielectrics; post-CMP cleaning; wafer bevel cleaning and polishing; characterization, evaluation, and monitoring of cleaning; correlation with device performance as well as cleaning of equipment and storage and handling hardware. The hardcover edition includes a bonus CD-ROM of Cleaning Technology in Semiconductor Device Manufacturing 1989?2007: Proceedings from the ECS Semiconductor Cleaning Symposia 1?10. This bonus material is not available with the PDF edition.
Author: Paul W. Mertens
Author: Paul W. Mertens
Author: Paul Mertens
Author: Takeshi Hattori
Author: Paul Mertens
Author: Michael Liehr
Author: E. R. Simoen
Author: Paul W. Mertens
Author: 
Author: Takeshi Hattori
Author: Hisham Z. Massoud