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Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 3035734178 Category : Technology & Engineering Languages : en Pages : 339
Book Description
14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018) Selected, peer reviewed papers from the 14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018), September 3-5, 2018, Leuven, Belgium
Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 3035734178 Category : Technology & Engineering Languages : en Pages : 339
Book Description
14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018) Selected, peer reviewed papers from the 14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018), September 3-5, 2018, Leuven, Belgium
Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 3038132829 Category : Science Languages : en Pages : 396
Book Description
UCPSS 2008 Selected, peer reviewed papers from the 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), held in Bruges, Belgium, September 22-24, 2008
Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 3038137006 Category : Technology & Engineering Languages : en Pages : 365
Book Description
Selected, peer reviewed papers from the 10th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 20-22, 2010, Ostend, Belgium
Author: Takeshi Hattori Publisher: Springer Science & Business Media ISBN: 3662035359 Category : Technology & Engineering Languages : en Pages : 634
Book Description
A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Author: Paul Mertens Publisher: Trans Tech Publications Ltd ISBN: 3038131954 Category : Technology & Engineering Languages : en Pages : 383
Book Description
Selected, peer reviewed papers from the 8th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) held in Antwerp, Belgium, September 18-20, 2006
Author: Michael Liehr Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 440
Book Description
Wafer cleaning, microcontamination and surface passivation are the key focus of this proceedings volume, the 3rd in a successful series from MRS. It is a field in which control of surface chemistry and surface morphology, as well as particle and molecular contamination removal, are of critical importance. This volume expands the scope of the topic to include ultraclean technology in a broader sense, emphasizing the identification and characterization of trace contamination, strategies for removal, and equipment considerations, as well as critical limits for impact on devices. Novel processes, such as chemical mechanical polishing (CMP), and their ramifications for contamination removal are also addressed.
Author: Paul W. Mertens Publisher: Trans Tech Publications Ltd ISBN: 3035730849 Category : Technology & Engineering Languages : en Pages : 395
Book Description
Selected, peer reviewed papers from the 13th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 12-14, 2016, Knokke, Belgium
Author: Paul Mertens Publisher: ISBN: 9783035714173 Category : Semiconductors Languages : en Pages : 0
Book Description
The 14th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (14th UCPSS 2018, Leuven, Belgium, September 3-5, 2018) was organized by IMEC and the scope of this symposium includes all issues related to contamination, cleaning and surface preparation in mainstream large-scale Integrated Circuit manufacturing. This collection will be interesting and useful for experts in the field of microelectronics. Microelectronics, Semiconductors, Surface Cleaning, Surface Functionalization, Particle Removal, Etching, Wetting Drying, Pattern Collapse, Interconnects, Contamination Materials Science.
Author: Paul Mertens
Author: Paul Mertens
Author: Paul Mertens
Author: Paul Mertens
Author: Takeshi Hattori
Author: Paul Mertens
Author: Michael Liehr
Author: 
Author: Paul W. Mertens
Author: Jerzy Rużyłło
Author: Paul Mertens