Author: Cambridge University Press
Publisher:
ISBN: 9780521046848
Category :
Languages : en
Pages :
Book Description
Treatise on Photoelasticity
A Treatise on Photo-Elasticity, by E.G. Coker and L.N.G. Filon
Author: Ernest George Coker
Publisher:
ISBN:
Category : Photoelasticity
Languages : en
Pages : 720
Book Description
Publisher:
ISBN:
Category : Photoelasticity
Languages : en
Pages : 720
Book Description
Photoelasticity
Author: M. M. Leven
Publisher: Elsevier
ISBN: 1483158543
Category : Technology & Engineering
Languages : en
Pages : 494
Book Description
Photoelasticity presents the development of photoelasticity. This book discusses the principle of optical equivalence of stressed isotropic bodies. Organized into 29 chapters, this book begins with an overview of the progress in three-dimensional photoelasticity. This text then summarizes the approximate theoretical analysis by the strain-energy technique and derives the basic equations for the evaluation of P and Q by graphical integration. Other chapters consider the importance of stress concentrations in the domain of strength of materials, particularly where fatigue is present. This book discusses a well the various instructive fractures and indicates that the strength of bakelite is determined by the maximum tensile stresses as computed by advanced methods of stress analysis. The final chapter deals with the two fundamental problems in three-dimensional photoplasticity and explains the general stress-optic law under plastic flow without unloading. This book is a valuable resource for designers as well as mechanical and civil engineers.
Publisher: Elsevier
ISBN: 1483158543
Category : Technology & Engineering
Languages : en
Pages : 494
Book Description
Photoelasticity presents the development of photoelasticity. This book discusses the principle of optical equivalence of stressed isotropic bodies. Organized into 29 chapters, this book begins with an overview of the progress in three-dimensional photoelasticity. This text then summarizes the approximate theoretical analysis by the strain-energy technique and derives the basic equations for the evaluation of P and Q by graphical integration. Other chapters consider the importance of stress concentrations in the domain of strength of materials, particularly where fatigue is present. This book discusses a well the various instructive fractures and indicates that the strength of bakelite is determined by the maximum tensile stresses as computed by advanced methods of stress analysis. The final chapter deals with the two fundamental problems in three-dimensional photoplasticity and explains the general stress-optic law under plastic flow without unloading. This book is a valuable resource for designers as well as mechanical and civil engineers.
Digital Photoelasticity
Author: K. Ramesh
Publisher: Springer Science & Business Media
ISBN: 3642597238
Category : Science
Languages : en
Pages : 425
Book Description
A straightforward introduction to basic concepts and methodologies for digital photoelasticity, providing a foundation on which future researchers and students can develop their own ideas. The book thus promotes research into the formulation of problems in digital photoelasticity and the application of these techniques to industries. In one volume it provides data acquisition by DIP techniques, its analysis by statistical techniques, and its presentation by computer graphics plus the use of rapid prototyping technologies to speed up the entire process. The book not only presents the various techniques but also provides the relevant time-tested software codes. Exercises designed to support and extend the treatment are found at the end of each chapter.
Publisher: Springer Science & Business Media
ISBN: 3642597238
Category : Science
Languages : en
Pages : 425
Book Description
A straightforward introduction to basic concepts and methodologies for digital photoelasticity, providing a foundation on which future researchers and students can develop their own ideas. The book thus promotes research into the formulation of problems in digital photoelasticity and the application of these techniques to industries. In one volume it provides data acquisition by DIP techniques, its analysis by statistical techniques, and its presentation by computer graphics plus the use of rapid prototyping technologies to speed up the entire process. The book not only presents the various techniques but also provides the relevant time-tested software codes. Exercises designed to support and extend the treatment are found at the end of each chapter.
Photoelasticity for Designers
Author: R. B. Heywood
Publisher: Elsevier
ISBN: 1483151956
Category : Technology & Engineering
Languages : en
Pages : 462
Book Description
Photoelasticity for Designers covers the fundamental principles and techniques of photoelasticity, with an emphasis on its value as an aid to engineering design. This book is divided into 12 chapters, and begins with an introduction to the essential optical effects necessary for an understanding of the photoelastic phenomena. The next chapters describe the concept and features of polariscopes; the characterization of photoelastic materials; the formulation and testing of two-dimensional models of photoelasticity; and the application of model stresses to prototypes for the analysis of stresses occurring in the plane of the model, effectively of uniform thickness. These topics are followed by a discussion of the frozen stress technique and a comparison of the various materials that can be used for models in the technique. The ending chapters deal with the principles and application of the birefringent coating and distorted model techniques. This book will prove useful to photoelasticians, design engineers, and students.
Publisher: Elsevier
ISBN: 1483151956
Category : Technology & Engineering
Languages : en
Pages : 462
Book Description
Photoelasticity for Designers covers the fundamental principles and techniques of photoelasticity, with an emphasis on its value as an aid to engineering design. This book is divided into 12 chapters, and begins with an introduction to the essential optical effects necessary for an understanding of the photoelastic phenomena. The next chapters describe the concept and features of polariscopes; the characterization of photoelastic materials; the formulation and testing of two-dimensional models of photoelasticity; and the application of model stresses to prototypes for the analysis of stresses occurring in the plane of the model, effectively of uniform thickness. These topics are followed by a discussion of the frozen stress technique and a comparison of the various materials that can be used for models in the technique. The ending chapters deal with the principles and application of the birefringent coating and distorted model techniques. This book will prove useful to photoelasticians, design engineers, and students.
Photoelasticity of Glass
Author: Hillar Aben
Publisher:
ISBN: 9783642500725
Category :
Languages : en
Pages : 272
Book Description
This book presents a sytematic approach to contemporary phototelasticity with particular emphasis on stress analysis in glass. A review of different kinds of residual stresses in glass is presented. Besides traditional photoelastic techniques, differential refractrometry for stress determination on the surface of flat glass and integrated photoelasticity for stress determination in glass articles ofcomplicated shape are considered in detail. Original photoelastic apparatus and corresponding measurement techniques as well as stress calculation algorithms are described. Many practical examples illustrate the possibilities of modern photoelasticity for stress measurement in flat glass, containers, tumblers, tubes, optical fibres and fibre performs etc. The book can be considered as a textbook for a specialist in glass industry who wants to check the quality of products or tries to optimize theproduction process parameters from the point of view of the residual stresses. Furthermore, the book gives a number of new nondestructive methodswhich have not been described in earlier books on photoelasticity.
Publisher:
ISBN: 9783642500725
Category :
Languages : en
Pages : 272
Book Description
This book presents a sytematic approach to contemporary phototelasticity with particular emphasis on stress analysis in glass. A review of different kinds of residual stresses in glass is presented. Besides traditional photoelastic techniques, differential refractrometry for stress determination on the surface of flat glass and integrated photoelasticity for stress determination in glass articles ofcomplicated shape are considered in detail. Original photoelastic apparatus and corresponding measurement techniques as well as stress calculation algorithms are described. Many practical examples illustrate the possibilities of modern photoelasticity for stress measurement in flat glass, containers, tumblers, tubes, optical fibres and fibre performs etc. The book can be considered as a textbook for a specialist in glass industry who wants to check the quality of products or tries to optimize theproduction process parameters from the point of view of the residual stresses. Furthermore, the book gives a number of new nondestructive methodswhich have not been described in earlier books on photoelasticity.
Integrated Photoelasticity
Author: Hillar Aben
Publisher: McGraw-Hill International Book Company
ISBN:
Category : Science
Languages : en
Pages : 232
Book Description
Publisher: McGraw-Hill International Book Company
ISBN:
Category : Science
Languages : en
Pages : 232
Book Description
A Treatise on Photo-elasticity
Designing by Photoelasticity
Author: Roland Bryon Heywood
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 458
Book Description
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 458
Book Description
Photoelasticity
Author: Masataka Nisida
Publisher: Springer Science & Business Media
ISBN: 443168039X
Category : Science
Languages : en
Pages : 302
Book Description
Thirty-five papers were presented at the International Symposium on Photoelasticity, Tokyo, 1986, representing fifty-five authors. Eighteen of these papers were presented by Japanese photoelasticians and seventeen by leading foreign authorities from eleven countries (Austria, Canada, Czechoslovakia, F.R. of Germany, France, Greece, India, Switzerland, UK, USA and USSR) • This is the first symposium on photoelasticity of international scope held in Japan. The primary objectives of this symposium are to help bridge the gap between photoelastic researchers around the world, to promote mutual understanding and communications and to facilitate exchange of newly acquired knowledge in theories and techniques. In addition, it is important that these valuable results are communicated effectively to engineers who can apply them in practice in industry. The papers presented at this symposium cover all branches of photo elasticity in a broad sense, including, in addition to long estab lished photoelasticity, newly developed moire, interferometric, and holographic photoelasticity, caustics and speckle. Therefore, from an optical stress analysis pe~spective, this volume is the latest compre hensive collection of photoelastic expertises.
Publisher: Springer Science & Business Media
ISBN: 443168039X
Category : Science
Languages : en
Pages : 302
Book Description
Thirty-five papers were presented at the International Symposium on Photoelasticity, Tokyo, 1986, representing fifty-five authors. Eighteen of these papers were presented by Japanese photoelasticians and seventeen by leading foreign authorities from eleven countries (Austria, Canada, Czechoslovakia, F.R. of Germany, France, Greece, India, Switzerland, UK, USA and USSR) • This is the first symposium on photoelasticity of international scope held in Japan. The primary objectives of this symposium are to help bridge the gap between photoelastic researchers around the world, to promote mutual understanding and communications and to facilitate exchange of newly acquired knowledge in theories and techniques. In addition, it is important that these valuable results are communicated effectively to engineers who can apply them in practice in industry. The papers presented at this symposium cover all branches of photo elasticity in a broad sense, including, in addition to long estab lished photoelasticity, newly developed moire, interferometric, and holographic photoelasticity, caustics and speckle. Therefore, from an optical stress analysis pe~spective, this volume is the latest compre hensive collection of photoelastic expertises.