Third-Order Aberrations of Magnetic Quadrupole Lens PDF Download

Author: Atomic Energy of Canada Limited
Publisher:
ISBN:
Category :
Languages : en
Pages : 5

View

Book Description

Author: G. E. Lee-Whiting
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

View

Book Description

Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

View

Book Description
A comparison has been made of the third-order (spherical) abberrations in magnetic quadrupole lenses for use in conventional charged particle beam transport systems. An analytical description of the abberrations is presented and this is compared with the results of high order numerical integration. The dependence of the aberration strength on the system geometry and f number is given and a comparison of doublet and triplet systems made. The reduction of the aberrations in both doublet and triplet systems using embedded magnetic octupole lenses is also discussed and analytical predictions are given.

Author: Peter W. Hawkes
Publisher: Elsevier
ISBN: 0443193215
Category : Technology & Engineering
Languages : en
Pages : 376

View

Book Description
Advances in Imaging and Electron Physics, Volume 227 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains. Provides the authority and expertise of leading contributors from an international board of authors Presents the latest release in the Advances in Imaging and Electron Physics series

Author: Jon Orloff
Publisher: CRC Press
ISBN: 1420045555
Category : Science
Languages : en
Pages : 666

View

Book Description
With the growing proliferation of nanotechnologies, powerful imaging technologies are being developed to operate at the sub-nanometer scale. The newest edition of a bestseller, the Handbook of Charged Particle Optics, Second Edition provides essential background information for the design and operation of high resolution focused probe instruments. The book’s unique approach covers both the theoretical and practical knowledge of high resolution probe forming instruments. The second edition features new chapters on aberration correction and applications of gas phase field ionization sources. With the inclusion of additional references to past and present work in the field, this second edition offers perfectly calibrated coverage of the field’s cutting-edge technologies with added insight into how they work. Written by the leading research scientists, the second edition of the Handbook of Charged Particle Optics is a complete guide to understanding, designing, and using high resolution probe instrumentation.

Author:
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 640

View

Book Description

Author: Kirby Gannett Vosburgh
Publisher:
ISBN:
Category : Electron optics
Languages : en
Pages : 244

View

Book Description

Author: Miklos Szilagyi
Publisher: Springer Science & Business Media
ISBN: 1461309239
Category : Technology & Engineering
Languages : en
Pages : 550

View

Book Description
The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so.

Author: Rolf Erni
Publisher: World Scientific Publishing Company
ISBN: 1783265302
Category : Technology & Engineering
Languages : en
Pages : 432

View

Book Description
Aberration-Corrected Imaging in Transmission Electron Microscopy provides an introduction to aberration-corrected atomic-resolution electron microscopy imaging in materials and physical sciences. It covers both the broad beam transmission mode (TEM; transmission electron microscopy) and the scanning transmission mode (STEM; scanning transmission electron microscopy). The book is structured in three parts. The first part introduces the basics of conventional atomic-resolution electron microscopy imaging in TEM and STEM modes. This part also describes limits of conventional electron microscopes and possible artefacts which are caused by the intrinsic lens aberrations that are unavoidable in such instruments. The second part introduces fundamental electron optical concepts and thus provides a brief introduction to electron optics. Based on the first and second parts of the book, the third part focuses on aberration correction; it describes the various aberrations in electron microscopy and introduces the concepts of spherical aberration correctors and advanced aberration correctors, including correctors for chromatic aberration. This part also provides guidelines on how to optimize the imaging conditions for atomic-resolution STEM and TEM imaging.This second edition has been completely revised and updated in order to incorporate the very recent technological and scientific achievements that have been realized since the first edition appeared in 2010.

Author:
Publisher:
ISBN:
Category : Electron microscopes
Languages : en
Pages : 212

View

Book Description