Author: JEFFREY L. DUPUIEPublisher:
ISBN:
Category :
Languages : en
Pages : 396
Book Description
deposition scheme holds much promise for low temperature film growth.
THE LOW-TEMPERATURE THERMAL CHEMICAL VAPOR DEPOSITION AND CATALYZED CHEMICAL VAPOR DEPOSITION OF ALUMINUM NITRIDE AND SILICON NITRIDE (CHEMICAL VAPOR DEPOSITION).
Author: JEFFREY L. DUPUIEPublisher:
ISBN:
Category :
Languages : en
Pages : 396
Book Description
deposition scheme holds much promise for low temperature film growth.
Catalytic Chemical Vapor Deposition
Author: Hideki MatsumuraPublisher: John Wiley & Sons
ISBN: 352734523X
Category : Technology & Engineering
Languages : en
Pages : 438
Book Description
The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
Handbook of Chemical Vapor Deposition
Author: Hugh O. PiersonPublisher: William Andrew
ISBN: 0815517432
Category : Technology & Engineering
Languages : en
Pages : 507
Book Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Scientific and Technical Aerospace Reports
Author: An Examination of the Kinetics and Mechanisms of the Chemical Vapor Deposition of Aluminum Nitride
Author: Scott Arnold HansonLow-pressure Chemical Vapor Deposition of Silicon Nitride
Author: David L. PearsonCatalytic Chemical Vapor Deposition
Author: Hideki MatsumuraPublisher: John Wiley & Sons
ISBN: 3527818669
Category : Technology & Engineering
Languages : en
Pages : 604
Book Description
The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
Thin film transistors. 1. Amorphous silicon thin film transistors
Author: Yue KuoPublisher: Springer Science & Business Media
ISBN: 9781402075056
Category : Thin film transistors
Languages : en
Pages : 538
Book Description
This is the first reference on amorphous silicon and polycrystalline silicon thin film transistors that gives a systematic global review of all major topics in the field. These volumes include sections on basic materials and substrates properties, fundamental device physics, critical fabrication processes (structures, a-Si: H, dielectric, metallization, catalytic CVD), and existing and new applications. The chapters are written by leading researchers who have extensive experience with reputed track records. Thin Film Transistors provides practical information on preparing individual functional a-Si: H TFTs and poly-Si TFTs as well as large-area TFT arrays. Also covered are basic theories on the a-Si: H TFT operations and unique material characteristics. Readers are also exposed to a wide range of existing and new applications in industries.
Characterization of Metals and Alloys
Author: Paul HollowayPublisher: Momentum Press
ISBN: 1606500473
Category : Science
Languages : en
Pages : 330
Book Description
A better understanding of the microstructure of metals and alloys has led to great advances in the performance and useful applications of these, the oldest of mankind's engineered materials. This book in the Materials Characterizations series focuses on the particular molecular and atomistic properties of metals insofar as how they affect the different techniques for measuring and analyzing internal structure, surface structure, and chemical/physical properties. It provides a vital connection between commonly used characterization techniques like Scanning Electron Microscopy and how such can be used in the various ways that metals are processed, machined, and used. Review of relevant mechanical and chemical properties of metals and how they affect characterization techniques Characterization techniques used for melting and casting, machining, and metallic thin films processes Concise summaries of major characterization technologies for metals and alloys, including Auger Electron Spectroscopy, Energy-Dispersive X-Ray Spectroscopy, Neutron Activation Analysis, Scanning Electron Microscopy, and Transmission Electron Spectroscopy
Metalorganic Chemical Vapor Deposition of Aluminum Nitride
Author: Herng LiuPublisher:
ISBN:
Category : Aluminum nitride
Languages : en
Pages : 392
Book Description