Author: Scott M. KozlowskiPublisher:
ISBN:
Category :
Languages : en
Pages : 79
Book Description
The Effect of Substrate Bias on the Growth of Vanadium Oxide Thin Films
Author: Scott M. KozlowskiDependence of Negative Substrate Bias on the Optical and Electrical Properties of W-Doped Vanadium Dioxide Thin Films
Author: Bias and Substrate Effects on the Vapor Phase Growth on Diamond Thin Films
Author: Yong-Hee LeeAdvanced Strategies in Thin Film Engineering by Magnetron Sputtering
Author: Alberto Palmero Publisher: MDPI
ISBN: 3039364294
Category : Science
Languages : en
Pages : 148
Book Description
Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.
Strongly Strained Growth of Vanadium Dioxide Thin Films on Microscale Ruthenium Dioxide Islands
Author: Simon FischerPublisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
Vanadium dioxide exhibits a metal-insulator transition (MIT) which comprises an electronic and a structural component. Accordingly, it is often understood as a cooperative effect of a structure-induced Peierls transition and a electron correlations-induced Mott transition. The structural transition can be exploited by subjecting VO2 thin films to epitaxial stress, which stabilizes either the low temperature insulating or the high temperature metallic phase. Through this strain engineering approach, the transition temperature can be tuned from its bulk value of 68 °C, tailoring the material towards technological applications. In the present thesis, massively strained thin films of VO2 on micron-sized RuO2 islands are grown and analyzed. This is done, in large parts, in a low energy electron microscope (LEEM) instrument. The instrument allows for following surface processes in situ during oxidation and deposition experiments, giving microscopic and structural information on the material. First, the RuO2 islands are fabricated by oxidizing a Ru(0001) surface using atomic oxygen from a thermal cracker. The resulting complex island morphology, which encompasses four different phases of RuO2, is studied during and after growth, assessing the kinetic and thermodynamic aspects that lead to their formation. It is found that a microcrystalline oxide phase serves as a nucleation hub for adjacent (110)- and (101)-oriented RuO2 structures, which then outgrow the incubator phase. The structural registry of a separate RuO2(100) phase to the substrate has been resolved and is found to lead to the distinct growth behavior that this phase exhibits compared to the others. On samples prepared in this way, VO2 was grown, again with the aid of atomic oxygen. This, as confirmed by x-ray absorption spectroscopy (XAS) and x-ray photoelectron spectroscopy (XPS), ensures that the stoichiometry of the films is correct. In situ low energy electron diffraction (LEED) measurements showed that during the growth of VO2 on RuO2(110), the lattice parameters stay constant. This indicates a very high strain near the pseudomorphic case (8.78 %). The VO2(110) surface was also found to exhibit a (2 × 2) reconstruction due to an oxygen-rich surface termination. Conversely, VO2 was found to grow relaxed on the (100)-oriented islands. Its VO2(100) surface is heavily faceted, indicating a high surface energy. Complementary measurement of the x-ray linear dichroism in these films finds that the VO2(110)/RuO2(110) islands exhibit spectra that are characteristic for the metallic phase. This may indicate that the MIT is suppressed in high-strain conditions. On VO2(100)/RuO2(100) islands, indications of a MIT are found. However, the VO2 films experience reduction due to the synchrotron beam, which can also induce the transition into the metallic state. Alongside a deeper understanding of Ru oxidation kinetics using atomic oxygen, this work opens up a remarkably high window of accessible strain for VO2 thin film growth and gives important insights into the surface of VO2, which until recently was often neglected.
Thin Film Metal-Oxides
Author: Shriram RamanathanPublisher: Springer Science & Business Media
ISBN: 1441906649
Category : Technology & Engineering
Languages : en
Pages : 344
Book Description
Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.
Vanadium and Molybdenum Oxide Thin Films on Au(111)
Author: Sebastien GuimondModern Technologies for Creating the Thin-film Systems and Coatings
Author: Nikolay NikitenkovPublisher: BoD – Books on Demand
ISBN: 953513003X
Category : Science
Languages : en
Pages : 446
Book Description
Development of the thin film and coating technologies (TFCT) made possible the technological revolution in electronics and through it the revolution in IT and communications in the end of the twentieth century. Now, TFCT penetrated in many sectors of human life and industry: biology and medicine; nuclear, fusion, and hydrogen energy; protection against corrosion and hydrogen embrittlement; jet engine; space materials science; and many others. Currently, TFCT along with nanotechnologies is the most promising for the development of almost all industries. The 20 chapters of this book present the achievements of thin-film technology in many areas mentioned above but more than any other in medicine and biology and energy saving and energy efficiency.
Author: Sun-Yi Chang
Author: