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Author: Christian Gontrand Publisher: Elsevier ISBN: 0081026730 Category : Technology & Engineering Languages : en Pages : 282
Book Description
Micro-nanoelectronics Devices: Modeling of Diffusion and Operation Processes concentrates on the modeling of diffusion processes and the behavior of modern integrated components, from material, to architecture. It goes through the process, the device and the circuit regarding today's widely discussed nano-electronics, both from an industry perspective and that of public entities. - Seeks to provide the core of modeling in micro (nano) electronics - Introduces the equations underlying the modelizations and, ultimately, the related simulations - Proposes what modifications should be made with respect to modeling
Author: Christian Gontrand Publisher: Elsevier ISBN: 0081026730 Category : Technology & Engineering Languages : en Pages : 282
Book Description
Micro-nanoelectronics Devices: Modeling of Diffusion and Operation Processes concentrates on the modeling of diffusion processes and the behavior of modern integrated components, from material, to architecture. It goes through the process, the device and the circuit regarding today's widely discussed nano-electronics, both from an industry perspective and that of public entities. - Seeks to provide the core of modeling in micro (nano) electronics - Introduces the equations underlying the modelizations and, ultimately, the related simulations - Proposes what modifications should be made with respect to modeling
Author: Wolfgang Fahrner Publisher: Springer Science & Business Media ISBN: 3540266216 Category : Technology & Engineering Languages : en Pages : 277
Book Description
Split a human hair thirty thousand times, and you have the equivalent of a nanometer. The aim of this work is to provide an introduction into nanotechnology for the s- entifically interested. However, such an enterprise requires a balance between comprehensibility and scientific accuracy. In case of doubt, preference is given to the latter. Much more than in microtechnology – whose fundamentals we assume to be known – a certain range of engineering and natural sciences are interwoven in nanotechnology. For instance, newly developed tools from mechanical engine- ing are essential in the production of nanoelectronic structures. Vice versa, - chanical shifts in the nanometer range demand piezoelectric-operated actuators. Therefore, special attention is given to a comprehensive presentation of the matter. In our time, it is no longer sufficient to simply explain how an electronic device operates; the materials and procedures used for its production and the measuring instruments used for its characterization are equally important. The main chapters as well as several important sections in this book end in an evaluation of future prospects. Unfortunately, this way of separating coherent - scription from reflection and speculation could not be strictly maintained. So- times, the complete description of a device calls for discussion of its inherent - tential; the hasty reader in search of the general perspective is therefore advised to study this work’s technical chapters as well.
Author: Fuccio Cristiano Publisher: Woodhead Publishing ISBN: 0128202564 Category : Technology & Engineering Languages : en Pages : 428
Book Description
Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. - Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena - Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations - Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors
Author: Valentijn De Smedt Publisher: Springer ISBN: 3319090038 Category : Technology & Engineering Languages : en Pages : 422
Book Description
This book investigates the possible circuit solutions to overcome the temperature and supply voltage-sensitivity of fully-integrated time references for ultra-low-power communication in wireless sensor networks. The authors provide an elaborate theoretical introduction and literature study to enable full understanding of the design challenges and shortcomings of current oscillator implementations. Furthermore, a closer look to the short-term as well as the long-term frequency stability of integrated oscillators is taken. Next, a design strategy is developed and applied to 5 different oscillator topologies and 1 sensor interface. All 6 implementations are subject to an elaborate study of frequency stability, phase noise and power consumption. In the final chapter all blocks are compared to the state of the art.
Author: Eitan N. Shauly Publisher: CRC Press ISBN: 1000631354 Category : Technology & Engineering Languages : en Pages : 831
Book Description
Nowadays over 50% of integrated circuits are fabricated at wafer foundries. This book presents a foundry-integrated perspective of the field and is a comprehensive and up-to-date manual designed to serve process, device, layout, and design engineers. It comprises chapters carefully selected to cover topics relevant for them to deal with their work. The book provides an insight into the different types of design rules (DRs) and considerations for setting new DRs. It discusses isolation, gate patterning, S/D contacts, metal lines, MOL, air gaps, and so on. It explains in detail the layout rules needed to support advanced planarization processes, different types of dummies, and related utilities as well as presents a large set of guidelines and layout-aware modeling for RF CMOS and analog modules. It also discusses the layout DRs for different mobility enhancement techniques and their related modeling, listing many of the dedicated rules for static random-access memory (SRAM), embedded polyfuse (ePF), and LogicNVM. The book also provides the setting and calibration of the process parameters set and describes the 28~20 nm planar MOSFET process flow for low-power and high-performance mobile applications in a step-by-step manner. It includes FEOL and BEOL physical and environmental tests for qualifications together with automotive qualification and design for automotive (DfA). Written for the professionals, the book belongs to the bookshelf of microelectronic discipline experts.
Author: Mike Melloch Publisher: CRC Press ISBN: 9780750305563 Category : Compound semiconconductors Languages : en Pages : 706
Book Description
The 24th Symposium attracted over 250 submissions, predominantly on growth and characterization. Compound semiconductors have become pervasive in applications that are unique and could not be addressed in any other viable manner, such as laser diodes in compact disk players, high brightness LEDs in automotive tail lights, low noise and low power amplifiers in cellular phones, infra-red diodes in remote controls, low noise amplifier front ends in televisions, and the recent high-brightness blue LEDs. Many of the contributions that engendered these novel products were first reported at the International Symposium on Compound Semiconductors. The procceedings of this conferences are an essential reference for all researchers in semiconductor physics, optoelectronics, electronic and electrical engineering, researching the properties and applications of compound materials.
Author: Publisher: Academic Press ISBN: 0080577652 Category : Technology & Engineering Languages : en Pages : 353
Book Description
Advances in Imaging & Electron Physics merges two long-running serials--Advances in Electronics & Electron Physics and Advances in Optical & Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Author: Eric Garfunkel Publisher: Springer Science & Business Media ISBN: 9780792350071 Category : Technology & Engineering Languages : en Pages : 528
Book Description
An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.
Author: Christian Gontrand
Author: Christian Gontrand
Author: Wolfgang Fahrner
Author: Fuccio Cristiano
Author: Valentijn De Smedt
Author: Eitan N. Shauly
Author: Peter L. F. Hemment
Author: Mike Melloch
Author: 
Author: Eric Garfunkel
Author: British Library. Document Supply Centre