Simulation of Thin Film Deposition, Microstructure Evolution, and Properties in Complex Oxide Systems PDF Download

Author: Christopher Paul Burmester
Publisher:
ISBN:
Category :
Languages : en
Pages : 272

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Author: Matthew Pelliccione
Publisher: Springer Science & Business Media
ISBN: 0387751092
Category : Technology & Engineering
Languages : en
Pages : 206

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Book Description
The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes.

Author: John Sanchez, Jr
Publisher: Cambridge University Press
ISBN: 9781107412170
Category : Technology & Engineering
Languages : en
Pages : 508

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Book Description
A wide variety of materials systems and deposition strategies have been developed to produce epitaxial and polycrystalline thin films. In particular, controlling the morphology and microstructure of metal films at the nanometer and/or micron scale has become crucial for applications such as giant magnetoresistive devices, contacts and diffusion barriers in integrated circuits and photovoltaics, and multilayer X-ray mirrors. This book, first published in 2001, focuses on the interactions between different mechanisms of microstructure evolution and film-growth conditions. Two sections of the volume, including a joint effort with Symposium R, Morphology and Dynamics of Crystal Surfaces in Molecular and Colloid Systems, highlight the fundamental mechanisms of epitaxial growth. Additional topics include: multilayers - stress in thin films; early stages of film growth - mechanical properties; texture in polycrystalline films; grain growth - barrier layers; and silicides and organic thin films - pulsed laser deposition.

Author: James A. Stewart (Jr)
Publisher:
ISBN:
Category : Microstructure
Languages : en
Pages : 312

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Book Description
The focus of this research is to develop, implement, and utilize phase-field models to study microstructure evolution in thin films during physical vapor deposition (PVD). There are four main goals to this dissertation. First, a phase-field model is developed to simulate PVD of a single-phase polycrystalline material by coupling previous modeling efforts on deposition of single-phase materials and grain evolution in polycrystalline materials. Second, a phase-field model is developed to simulate PVD of a polymorphic material by coupling previous modeling efforts on PVD of a single-phase material, evolution in multiphase materials, and phase nucleation. Third, a novel free energy functional is proposed that incorporates appropriate energetics and dynamics for simultaneous modeling of PVD and grain evolution in single-phase polycrystalline materials. Finally, these phase-field models are implemented into custom simulation codes and utilized to illustrate these models' capabilities in capturing PVD thin film growth, grain and grain boundary (GB) evolution, phase evolution and nucleation, and temperature evolution. In general, these simulations show: grain coarsening through grain rotation and GB migration such that grains tend to align with the thin film surface features and GBs migrate to locations between these features so that each surface feature has a distinct grain and orientation; the incident vapor flux rate controls the density of the thin film and the formation of surface and subsurface features; the substrate phase distribution initially acts as a template for the growing microstructure until the thin film becomes sufficiently thick; latent heat released during PVD increases the surface temperature of the thin film creating a temperature gradient within the thin film influencing phase evolution and nucleation; and temperature distributions lead to regions within the thin film that allow for multiple phases to be stable and coexist. Further, this work shows the sequential approach for coupling phase-field models, described in goals (i) and (ii) is sufficient to capture first-order features of the growth process, such as the stagnation of GBs at the valleys of the surface roughness, but to capture higher-order features, such as orientation gradients within columnar grains, the single free energy functional approach developed in goal (iii) is necessary.

Author: Nini Pryds
Publisher: Elsevier
ISBN: 0081017529
Category : Technology & Engineering
Languages : en
Pages : 562

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Book Description
Metal Oxide-Based Thin Film Structures: Formation, Characterization and Application of Interface-Based Phenomena bridges the gap between thin film deposition and device development by exploring the synthesis, properties and applications of thin film interfaces. Part I deals with theoretical and experimental aspects of epitaxial growth, the structure and morphology of oxide-metal interfaces deposited with different deposition techniques and new developments in growth methods. Part II concerns analysis techniques for the electrical, optical, magnetic and structural properties of thin film interfaces. In Part III, the emphasis is on ionic and electronic transport at the interfaces of Metal-oxide thin films. Part IV discusses methods for tailoring metal oxide thin film interfaces for specific applications, including microelectronics, communication, optical electronics, catalysis, and energy generation and conservation. This book is an essential resource for anyone seeking to further their knowledge of metal oxide thin films and interfaces, including scientists and engineers working on electronic devices and energy systems and those engaged in research into electronic materials. - Introduces the theoretical and experimental aspects of epitaxial growth for the benefit of readers new to the field - Explores state-of-the-art analysis techniques and their application to interface properties in order to give a fuller understanding of the relationship between macroscopic properties and atomic-scale manipulation - Discusses techniques for tailoring thin film interfaces for specific applications, including information, electronics and energy technologies, making this book essential reading for materials scientists and engineers alike

Author: Jacques G. Amar
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 526

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The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2001, focuses on the interactions between different mechanisms of microstructure evolution and film-growth conditions.

Author: Y. Pauleau
Publisher: Springer Science & Business Media
ISBN: 940100353X
Category : Technology & Engineering
Languages : en
Pages : 372

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Book Description
An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Author: Shriram Ramanathan
Publisher: Springer Science & Business Media
ISBN: 1441906649
Category : Technology & Engineering
Languages : en
Pages : 344

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Book Description
Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.

Author: G Koster
Publisher: Woodhead Publishing
ISBN: 9781782422457
Category : Technology & Engineering
Languages : en
Pages : 0

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Book Description
The atomic arrangement and subsequent properties of a material are determined by the type and conditions of growth leading to epitaxy, making control of these conditions key to the fabrication of higher quality materials. Epitaxial Growth of Complex Metal Oxides reviews the techniques involved in such processes and highlights recent developments in fabrication quality which are facilitating advances in applications for electronic, magnetic and optical purposes. Part One reviews the key techniques involved in the epitaxial growth of complex metal oxides, including growth studies using reflection high-energy electron diffraction, pulsed laser deposition, hybrid molecular beam epitaxy, sputtering processes and chemical solution deposition techniques for the growth of oxide thin films. Part Two goes on to explore the effects of strain and stoichiometry on crystal structure and related properties, in thin film oxides. Finally, the book concludes by discussing selected examples of important applications of complex metal oxide thin films in Part Three.

Author: American Association for Crystal Growth (AACG)
Publisher: Coe Truman International, LLC
ISBN: 1613300085
Category : Medical
Languages : en
Pages : 208

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Book Description
A collection of abstracts for the 20th American Conference on Crystal Growth and Epitaxy (ACCGE-20) and 17th U.S. Biennial Workshop on Organometallic Vapor Phase Epitaxy (OMVPE-17) and The Second 2D Electronic Materials Symposium.