Silicides, Germanides, and Their Interfaces: Volume 320 PDF Download
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Author: Bernhard Kramer Publisher: Springer Science & Business Media ISBN: 3540420002 Category : Science Languages : en Pages : 637
Book Description
The 2001 Spring Meeting of the 65th Deutsche Physikalische Gesellschaft was held together with the 65. Physikertagung, in Hamburg, during the pe riod March 26 30 2001. With more than 3500 conference attendees, a record has again been achieved after several years of stabilisation in participation. This proves the continuing and now even increasing, attraction of solid state physics, especially for young colleagues who often discuss for the first time their scientific results in public at this meeting. More than 2600 scientific pa pers were presented orally, as well as posters, among them about 120 invited lectures from Germany and from abroad. This Volume 41 of "Advances in Solid State Physics" contains the written versions of half of the latter. We nevertheless hope that the book truly reflects the current state of the field. Amazingly enough, the majority of the papers as well as the discussions at the meeting, concentrated on the nanostructured solid state. This re flects the currently extremely intensive quest for developing the electronic and magnetic device generations of the future, which stimulates science be sides the challenge of the unknown as has always been the case since the very beginning of Solid State Physics about 100 years ago.
Author: Raymond T. Tung Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 680
Book Description
Tremendous advances have been made in the use of silicides as contacts and interconnects in micro-electronic devices and as active layers in sensors. A flourish of novel fabrication concepts and characterization techniques has led to high-quality silicide devices and a better understanding of the electronic and micrometallurgical properties of their interfaces. However, the shrinking physical dimensions of ULSI devices beyond the deep submicron regime now poses new and serious materials challenges for the development of manufacturable silicide processes. Scientists and engineers from materials science, physics, chemistry, device, processing and other disciplines come together in this book to examine the current issues facing silicide thin-film applications. Topics include: silicide fundamentals - energetics and kinetics; processing of silicide thin films; ULSI issues; CVD silicides; semiconducting silicides; processing of germano-silicide thin films; silicides and analogs for IR detection; interfaces, surfaces and epitaxy; novel structures and techniques and properties of silicide thin films.
Author: Materials Research Society. Meeting Symposium D.
Author: Materials Research Society. Meeting Symposium D.
Author: Robert W. Fathauer
Author: Bernhard Kramer
Author: Raymond T. Tung
Author: Materials Research Society. Meeting Symposium F.
Author: Marvin J. Weber
Author: Charles W. Tu
Author: Eric Peter Kvam
Author: S. P. Murarka
Author: Mark Alper