Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 8
Book Description
The mechanisms associated with Si/SiO2 interface annealing and Thermal oxidation conditions were studied by spectroscopic immersion ellipsometry. Essentially, this surface sensitive ellipsometry technique uses liquids that refractive index match with the films, thereby optically removing the films. With the use of an optical model, it is shown that at annealing temperatures viscous relaxation dominates, while at low annealing temperatures the suboxide reduction is apparent. It is also shown that with the thickening SiO2 Overlayer, the thickness of the suboxide layer at the interface increases and the average radius of the crystalline silicon protrusions decreases for the three different orientation studied. These results are consistent with the commonly accepted Si oxidation model ... Spectroscopic immersion ellipsometry.
Si/SiO2 Interfere Studies by Immersion Ellipsometry
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 8
Book Description
The mechanisms associated with Si/SiO2 interface annealing and Thermal oxidation conditions were studied by spectroscopic immersion ellipsometry. Essentially, this surface sensitive ellipsometry technique uses liquids that refractive index match with the films, thereby optically removing the films. With the use of an optical model, it is shown that at annealing temperatures viscous relaxation dominates, while at low annealing temperatures the suboxide reduction is apparent. It is also shown that with the thickening SiO2 Overlayer, the thickness of the suboxide layer at the interface increases and the average radius of the crystalline silicon protrusions decreases for the three different orientation studied. These results are consistent with the commonly accepted Si oxidation model ... Spectroscopic immersion ellipsometry.
Publisher:
ISBN:
Category :
Languages : en
Pages : 8
Book Description
The mechanisms associated with Si/SiO2 interface annealing and Thermal oxidation conditions were studied by spectroscopic immersion ellipsometry. Essentially, this surface sensitive ellipsometry technique uses liquids that refractive index match with the films, thereby optically removing the films. With the use of an optical model, it is shown that at annealing temperatures viscous relaxation dominates, while at low annealing temperatures the suboxide reduction is apparent. It is also shown that with the thickening SiO2 Overlayer, the thickness of the suboxide layer at the interface increases and the average radius of the crystalline silicon protrusions decreases for the three different orientation studied. These results are consistent with the commonly accepted Si oxidation model ... Spectroscopic immersion ellipsometry.
Kurtze Geschichte der Stadt und Sittung Hameln an der Weser
SI/SIO2 Interface Studies by Spectroscopic Immersion Ellipsometry and Atomic Force Microscopy
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 23
Book Description
The dependence of the Si/Sio2 interface characteristics on the thickness and oxidation temperature for Sio2 films grown on different Si orientations was studied by spectroscopic immersion ellipsometry (SIE) and atomic force microscopy (AFM). Essentially, SIE uses liquids that-match to the refractive index of the films, thereby optically removing the films and consequently increasing the sensitivity to the interface. We show that as the thickness of the thermally grown SiO2 overlayer increases, the thickness of the suboxide layer at the interface also increases, and the average radius of the crystalline silicon protrusions (roughness) at the interface decreases for the three different Si orientations (100), (110) and (111), and two different oxidation temperatures (800 deg C and 1000 deg C) studied. The dependence of the interface roughness on the thickness of the SiO2 overlayer was confirmed by AFM. The results include unintentionally and intentionally roughened Si samples and are shown to be consistent with the commonly accepted Si oxidation model. Thickness, Oxidation, Atomic, Immersion.
Publisher:
ISBN:
Category :
Languages : en
Pages : 23
Book Description
The dependence of the Si/Sio2 interface characteristics on the thickness and oxidation temperature for Sio2 films grown on different Si orientations was studied by spectroscopic immersion ellipsometry (SIE) and atomic force microscopy (AFM). Essentially, SIE uses liquids that-match to the refractive index of the films, thereby optically removing the films and consequently increasing the sensitivity to the interface. We show that as the thickness of the thermally grown SiO2 overlayer increases, the thickness of the suboxide layer at the interface also increases, and the average radius of the crystalline silicon protrusions (roughness) at the interface decreases for the three different Si orientations (100), (110) and (111), and two different oxidation temperatures (800 deg C and 1000 deg C) studied. The dependence of the interface roughness on the thickness of the SiO2 overlayer was confirmed by AFM. The results include unintentionally and intentionally roughened Si samples and are shown to be consistent with the commonly accepted Si oxidation model. Thickness, Oxidation, Atomic, Immersion.
Scientific and Technical Aerospace Reports
Si/SiO2 Interface Roughness Studies
Author: Wing Ling Liliean Lai
Publisher:
ISBN:
Category : Atomic force microscopy
Languages : en
Pages : 502
Book Description
Publisher:
ISBN:
Category : Atomic force microscopy
Languages : en
Pages : 502
Book Description
SiO2 and Its Interfaces: Volume 105
Author: S. T. Pantelides
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 360
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 360
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
The Physics and Chemistry of SiO2 and the Si-SiO2 Interface
Author: Electrochemical Society. Meeting
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 584
Book Description
Proceedings of the symposium on [title], May 1988, at the 173rd meeting of the Electromechanical Society in Atlanta, Ga. Sixty articles cover: growth mechanisms of films; thermal and structural properties; atomic and electronic structure; defects, impurities, and damage mechanisms in systems; effects of preoxidation substrate quality, surface treatments, and oxidation induced point defect generation; and electron and hole transport and tunneling. Annotation copyrighted by Book News, Inc., Portland, OR
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 584
Book Description
Proceedings of the symposium on [title], May 1988, at the 173rd meeting of the Electromechanical Society in Atlanta, Ga. Sixty articles cover: growth mechanisms of films; thermal and structural properties; atomic and electronic structure; defects, impurities, and damage mechanisms in systems; effects of preoxidation substrate quality, surface treatments, and oxidation induced point defect generation; and electron and hole transport and tunneling. Annotation copyrighted by Book News, Inc., Portland, OR
Physics Briefs
Government Reports Announcements & Index
Spectroscopic Ellipsometry
Author: Harland G. Tompkins
Publisher: Momentum Press
ISBN: 1606507281
Category : Technology & Engineering
Languages : en
Pages : 138
Book Description
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
Publisher: Momentum Press
ISBN: 1606507281
Category : Technology & Engineering
Languages : en
Pages : 138
Book Description
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.