Reflective Masks for Extreme Ultraviolet Lithography PDF Download

Author: Khanh Bao Nguyen
Publisher:
ISBN:
Category :
Languages : en
Pages : 332

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Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : ru
Pages : 704

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Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

Author: Harry J. Levinson
Publisher: SPIE Press
ISBN: 9780819456601
Category : Technology & Engineering
Languages : en
Pages : 446

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Book Description
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Author: Ampere A. Tseng
Publisher: World Scientific
ISBN: 9812790896
Category : Technology & Engineering
Languages : en
Pages : 583

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Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. Sample Chapter(s). Chapter 1: Atom, Molecule, and Nanocluster Manipulations for Nanostructure Fabrication Using Scanning Probe Microscopy (3,320 KB). Contents: Atomic Force Microscope Lithography (N Kawasegi et al.); Nanowire Assembly and Integration (Z Gu & D H Gracias); Extreme Ultraviolet Lithography (H Kinoshita); Electron Projection Lithography (T Miura et al.); Electron Beam Direct Writing (K Yamazaki); Electron Beam Induced Deposition (K Mitsuishi); Focused Ion Beams and Interaction with Solids (T Ishitani et al.); Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger); and other papers. Readership: Researchers, professionals, and graduate students in the fields of nanoengineering and nanoscience.

Author:
Publisher: Elsevier
ISBN: 0081003587
Category : Science
Languages : en
Pages : 636

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As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place

Author: Andreas Erdmann
Publisher:
ISBN: 9781510639010
Category :
Languages : en
Pages :

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Author: David Attwood
Publisher: Cambridge University Press
ISBN: 1316810666
Category : Technology & Engineering
Languages : en
Pages :

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With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.

Author: V.N. Litvinenko
Publisher: Gulf Professional Publishing
ISBN: 9780444509390
Category : Medical
Languages : en
Pages : 790

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The 22nd International Free Electron Laser Conference and 7th FEL User Workshop were held August 13-18, 2000 at Washington Duke Inn and Golf Club in Durham, North Carolina, USA. The conference and the workshop were hosted by Duke University's Free Electron laser (FEL) Laboratory. Following tradition, the FEL prize award was announced at the banquet. The year 2000 FEL prize was awarded to three scientists propelling the limits of high power FELs: Steven Benson, Eisuke Minehara and George Neill. The conference program was comprised of traditional oral sessions on First Lasing, FEL theory, storage ring FELs, linac and high power FELs, long wavelength FELs, SASE FELs, accelerator and FEL physics and technology, and new developments and proposals. Two sessions on accelerator and FEL physics and technology reflected the emphasis on the high quality of accelerators and components for modern FELs. The breadth of the applications was presented in the workshop oral sessions on materials processing, biomedical and surgical applications, physics and chemistry as well as on instrumentation and methods for FEL applications. A special oral session was dedicated to FEL center status reports for users to learn more about the opportunities with FELs. As usual, the oral sessions were supplemented by poster sessions with in-depth discussions and communications. The FEL physicists and FEL users had excellent opportunities to interact throughout the duration of the event, culminating a Joint Sessions. The year 2000 was very successful being marked by lasing with two SASE and one storage ring short-wavelength FELs, and by the first human surgery with the use of FEL, to mention but a few. The International Program Committee and chairs of the sessions had the challenging and exciting problem of selecting invived and contributed talks for the conferences and the workshop from the influx of abstracts mentioning new results and ideas. The success of the conference was determined by these contributions. Scientists from 15 countries gave 70 talks, presented 176 posters and submitted 146 papers, which are published in the present volume of proceedings.

Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 692

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Author: Zheng Cui
Publisher: Springer
ISBN: 3319393618
Category : Technology & Engineering
Languages : en
Pages : 442

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This second edition of Nanofabrication is one of the most comprehensive introductions on nanofabrication technologies and processes. A practical guide and reference, this book introduces readers to all of the developed technologies that are capable of making structures below 100nm. The principle of each technology is introduced and illustrated with minimum mathematics involved. Also analyzed are the capabilities of each technology in making sub-100nm structures, and the limits of preventing a technology from going further down the dimensional scale. This book provides readers with a toolkit that will help with any of their nanofabrication challenges.