Author: Joseph M. Proud Publisher: Springer Science & Business Media ISBN: 146845305X Category : Technology & Engineering Languages : en Pages : 589
Book Description
An Advanced Study Institute on Radiative Processes in Discharge Plasmas was held at the Atholl Palace Hotel, Pitlochry, Perthshire, Scotland, June 23 through July 5, 1985. This publication is the Pro ceedings from that Institute. The Institute was attended by eighty-five Participants and Lecturers representing the United States, Canada, France, West Germany, Greece, The Netherlands, Portugal, Turkey, the United Kingdom, and Switzerland. A distinguished faculty of eighteen Lecturers was assembled and the topical program organized with the assistance of an Advisory Committee composed of: Dr. John Waymouth, USA; Dr. Timm Teich, Switzerland; Dr. Arthur Phelps, USA; Dr. Nicol Peacock, England; Professor Erich Kunhardt, USA; Dr. Anthony Hyder, USA; and Dr. Arthur Guenther, USA. The underlying theme and objective of the Institute was the enhance ment of scientific communication and exchange among academic, industrial, and national laboratory groups having a common concern for radiative processes in discharge plasmas. The program was organized into four major sessions sequentially treating: the fundamental science of visible and near-visible radiation in plasmas; the technology of discharge light sources; recent and novel methods for the generation of plasmas; and an update on advances in laser-based diagnostics. Each major session culmi nated in a panel discussion comprised of the Lecturers for that session.
Author: Boris M. Smirnov Publisher: Springer ISBN: 3319110659 Category : Science Languages : en Pages : 424
Book Description
This book presents the theory of gas discharge plasmas in a didactical way. It explains the processes in gas discharge plasmas. A gas discharge plasma is an ionized gas which is supported by an external electric field. Therefore its parameters are determined by processes in it. The properties of a gas discharge plasma depend on its gas component, types of external fields, their geometry and regimes of gas discharge. Fundamentals of a gas discharge plasma include elementary, radiative and transport processes which are included in its kinetics influence. They are represented in this book together with the analysis of simple gas discharges. These general principles are applied to stationary gas discharge plasmas of helium and argon. The analysis of such plasmas under certain conditions is theoretically determined by numerical plasma parameters for given regimes and conditions.
Author: Andreas F. Molisch Publisher: Oxford University Press ISBN: 9780198538660 Category : Science Languages : en Pages : 540
Book Description
Radiation can be absorbed and re-emitted many times in atomic vapors before it reaches the boundaries of the container encasing the vapor. This effect is known as radiation trapping. It plays an important role practically everywhere atomic vapors occur, whether in spectroscopy, gas lasers, atomic line filters, the determination of atomic lifetimes, measurements of atomic interaction potentials, or electric discharge lamps. This book is the first to assemble all of the information necessary to handle practical problems related to radiation trapping, and it emphasizes both physical insights and mathematical methods. The introduction reviews resonance radiation and collision processes in atomic vapors. This is followed by detailed explanations of the physical effects and mathematical methods for various types of problems (e.g., with or without saturation, particle diffusion, reflecting cell walls). The last part of the book describes the applications of these methods to a variety of practical problems, such as cross-section measurements and the design of discharge lamps.
Author: Publisher: Academic Press ISBN: 0123855098 Category : Science Languages : en Pages : 562
Book Description
Advances in Atomic, Molecular, and Optical Physics publishes reviews of recent developments in a field which is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered include related applied areas, such as atmospheric science, astrophysics, surface physics and laser physics. Articles are written by distinguished experts, and contain both relevant review material and detailed descriptions of important recent developments. - International experts - Comprehensive articles - New developments
Author: Paul R. Berman Publisher: Academic Press ISBN: 012385508X Category : Science Languages : en Pages : 562
Book Description
Advances in Atomic, Molecular, and Optical Physics publishes reviews of recent developments in a field which is in a state of rapid growth, as new experimental and theoretical techniques are used on many old and new problems. Topics covered include related applied areas, such as atmospheric science, astrophysics, surface physics and laser physics. Articles are written by distinguished experts, and contain both relevant review material and detailed descriptions of important recent developments. International experts Comprehensive articles New developments
Author: J. Leon Shohet Publisher: CRC Press ISBN: 1351204939 Category : Technology & Engineering Languages : en Pages : 2883
Book Description
Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]
Author: H. Schlüter Publisher: Springer Science & Business Media ISBN: 9401706336 Category : Science Languages : en Pages : 580
Book Description
This book draws together three areas of work on plasma technologies: advanced efforts based on wave generated, high frequency plasmas, plasma assisted ion implantation, and electron beam generated plasma. It lays a foundation for the application of sources in industry and various research areas
Author: P.F. Williams Publisher: Springer Science & Business Media ISBN: 9401158843 Category : Technology & Engineering Languages : en Pages : 610
Book Description
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Author: Vladimir N. Ochkin Publisher: John Wiley & Sons ISBN: 3527627510 Category : Science Languages : en Pages : 630
Book Description
Written by a distinguished plasma scientist and experienced author, this up-to-date work comprehensively covers current methods and new developments and techniques, including non-equilibrium atomic and molecular plasma states, as well as such new applications as gas lasers. Containing numerous appendices with reference data indispensable for plasma spectroscopy, such as statistical weights and partition sums and diatomic molecules. For plasmaphysicists, spectroscopists, materials scientists and physical chemists. Appendix H is only available online.
Author: Joseph M. Proud
Author: Boris M. Smirnov
Author: Carlos M. Ferreira
Author: Andreas F. Molisch
Author: 
Author: Paul R. Berman
Author: J. Leon Shohet
Author: H. Schlüter
Author: P.F. Williams
Author: Vladimir N. Ochkin