Author: F. RenPublisher: The Electrochemical Society
ISBN: 9781566771528
Category : Technology & Engineering
Languages : en
Pages : 294
Book Description
Proceedings of the Twenty-fourth State-of-the-Art Program on Compound Semiconductors
Author: F. RenPublisher: The Electrochemical Society
ISBN: 9781566771528
Category : Technology & Engineering
Languages : en
Pages : 294
Book Description
Proceedings of the Twenty-First State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXI)
Author: S. N. G. ChuPublisher: The Electrochemical Society
ISBN: 9781566770934
Category : Technology & Engineering
Languages : en
Pages : 324
Book Description
III-Nitride Based Semiconductor Electronics and Optical Devices and Thirty-Fourth State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXXIV)
Author: F. RenPublisher: The Electrochemical Society
ISBN: 9781566773072
Category : Technology & Engineering
Languages : en
Pages : 336
Book Description
Index of Conference Proceedings
Author: British Library. Document Supply CentrePublisher:
ISBN:
Category : Conference proceedings
Languages : en
Pages : 696
Book Description
Compound Semiconductors 1996, Proceedings of the Twenty-Third INT Symposium on Compound Semiconductors held in St Petersburg, Russia, 23-27 September 1996
Author: M.S. ShurPublisher: CRC Press
ISBN: 1000157121
Category : Science
Languages : en
Pages : 1096
Book Description
Providing a comprehensive overview of developments to both the academic and industrial communities, Compound Semiconductors 1996 covers all types of compound semiconducting materials and devices. The book includes results on blue and green lasers, heterostructure devices, nanoelectronics, and novel wide band gap semiconductors. With invited review papers and research results in current topics of interest, this volume is part of a well-known series of conferences for the dissemination of research results in the field.
Compound Semiconductors 1997, Proceedings of the IEEE Twenty-Fourth INT Symposium on Compound Semiconductors held in San Diego, California, 8-11 September 1997
Author: Mike MellochPublisher: CRC Press
ISBN: 9780750305563
Category : Compound semiconconductors
Languages : en
Pages : 706
Book Description
The 24th Symposium attracted over 250 submissions, predominantly on growth and characterization. Compound semiconductors have become pervasive in applications that are unique and could not be addressed in any other viable manner, such as laser diodes in compact disk players, high brightness LEDs in automotive tail lights, low noise and low power amplifiers in cellular phones, infra-red diodes in remote controls, low noise amplifier front ends in televisions, and the recent high-brightness blue LEDs. Many of the contributions that engendered these novel products were first reported at the International Symposium on Compound Semiconductors. The procceedings of this conferences are an essential reference for all researchers in semiconductor physics, optoelectronics, electronic and electrical engineering, researching the properties and applications of compound materials.
Proceedings of the Thirteenth State-of-the Art Program on Compound Semiconductors (SOTAPOCS XIII) and the Symposium on Metallization of III-V Compound Semiconductors
Author: Hong H. LeePublisher:
ISBN:
Category : Compound semiconductors
Languages : en
Pages : 380
Book Description
State-of-the-Art Program on Compound Semiconductors (SOTAPOCs XXX)
Author: C. R. AbernathyPublisher: The Electrochemical Society
ISBN: 9781566772266
Category : Technology & Engineering
Languages : en
Pages : 278
Book Description
State-of-the-Art Program on Compound Semiconductors : (SOTAPOCS XLII) and Processes at the Compound-Semiconductor/Solution Interface
Author: P. C. ChangPublisher: The Electrochemical Society
ISBN: 9781566774628
Category : Technology & Engineering
Languages : en
Pages : 500
Book Description
Handbook of Advanced Plasma Processing Techniques
Author: R.J. ShulPublisher: Springer Science & Business Media
ISBN: 3642569897
Category : Technology & Engineering
Languages : en
Pages : 664
Book Description
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.