Author: Publisher:
ISBN:
Category : Electron beams
Languages : en
Pages : 1048
Book Description
Proceedings of the Symposium on Electron and Ion Beam Science and Technology; International Conference
Author: Proceedings of the Symposium on Electron and Ion Beam Science and Technology
Author: Robert BakishPublisher: The Electrochemical Society
ISBN:
Category : Electron beam welding
Languages : en
Pages : 644
Book Description
Proceedings of the ... Symposium on Electron, Ion and Laser Beam Technology
Author: Proceedings of The...Symposium on Electron, Ion, and Photon Beam Technology
Author: Proceedings of the ... Symposium on Electron, Ion, and Laser Beam Technology ...
Author: Symposium on Electron, Ion, and Laser Beam TechnologyPublisher:
ISBN:
Category :
Languages : en
Pages : 11
Book Description
Application of Particle and Laser Beams in Materials Technology
Author: P. MisaelidesPublisher: Springer Science & Business Media
ISBN: 9401584591
Category : Technology & Engineering
Languages : en
Pages : 668
Book Description
The development of advanced materials with preselected properties is one of the main goals of materials research. Of especial interest are electronics, high-temperature and supemard materials for various applications, as well as alloys with improved wear, corrosion and mechanical resistance properties. The technical challenge connected with the production of these materials is not only associated with the development of new specialised preparation techniques but also with quality control. The energetic charged particle, electron and photon beams offer the possibility of modifying the properties of the near-surface regions of materials without seriously affecting their bulk, and provide unique analytical tools for testing their qUality. This volume includes most of the lectures and contributions delivered at the NATO-funded Advanced Study Institute "Application of Particle and Laser Beams in Materials Technology", which was held in Kallithea, Chalkidiki, in Northern Greece, from the 8th to the 21st of May, 1994 and attended by 73 participants from 21 countries. The aim of this ASI was to provide to the participants an overview of this rapidly expanding field. Fundamental aspects concerning the interactions and collisions on atomic, nuclear and solid state scale were presented in a didactic way, along with the application of a variety of techniques for the solution of problems ranging from the development of electronics materials to corrosion research and from archaeometry to environmental protection.
Argonne List of Serials
Author: Argonne National Laboratory. Library Services DepartmentPublisher:
ISBN:
Category : Periodicals
Languages : en
Pages : 344
Book Description
Introduction to Integrated Optics
Author: Michael BarnoskiPublisher: Springer Science & Business Media
ISBN: 1468420828
Category : Science
Languages : en
Pages : 522
Book Description
The material presented in this volume is based on a series of lectures presented at an annual short course entitled "Integrated Optics" sponsored by the University of Cali fornia, Santa Barbara, in March of 1973. Each chapter has been authored by the individual lecturing on the particular subject matter con tained in that chapter. The primary intent of this book is to pro vide the students with a written version of the lecture material. The text treats a large variety of the basic structures and analysis techniques currently being employed in the rapidly growing area of technology termed "Integrated Optics." The volume contains both material that has previously been published in scientific journals and material which has not been published elsewhere. Since the field of integrated optics is in a stage of rapid expansion, a complete coverage of all the experimental results is difficult. As a result the emphasis is placed on the funda mental theoretical ideas and experimental results. The editor gratefully acknowledges the con tributing authors and the institutions with which they are associated for their wholehearted cooperation in the preparation of this book. Particular thanks are extended to the Hughes Research Laboratories, a division of the Hughes Aircraft Company.
Radiation Acoustics
Author: Leonid M. LyamshevPublisher: CRC Press
ISBN: 0203402707
Category : Science
Languages : en
Pages : 381
Book Description
Radiation acoustics is a developing field lying at the intersection of acoustics, high-energy physics, nuclear physics, and condensed matter physics. Radiation Acoustics is among the first books to address this promising field of study, and the first to collect all of the most significant results achieved since research in this area began in earnest in the 1970s. The book begins by reviewing the data on elementary particles, absorption of penetrating radiation in a substance, and the mechanisms of acoustic radiation excitation. The next seven chapters present a theoretical treatment of thermoradiation sound generation in condensed media under the action of modulated penetrating radiation and radiation pulses. The author explores particular features of the acoustic fields of moving thermoradiation sound sources, sound excitation by single high-energy particles, and the efficiency and optimal conditions of thermoradiation sound generation. Experimental results follow the theoretical discussions, and these clearly demonstrate the validity of the thermoradiation theory. The book concludes with discussions on applications, including the large-scale DUMAND and GENIUS projects now on the horizon. Radiation acoustics holds enormous potential for applications in areas such as microelectronics, geophysics, and astrophysics. This book offers a unique opportunity to benefit from the approach and extensive experience of author Leonid N. Lyamshev, who in this, his last book, shows how he left an indelible mark on the world of acoustics.
EUV Lithography
Author: Vivek BakshiPublisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : en
Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.