Author: Karen Jean NordhedenPublisher:
ISBN:
Category :
Languages : en
Pages : 106
Book Description
Predictable Reactive Ion Etching of Gallium Arsenide and Aluminum Gallium Arsenide in Hydrogen Chloride/argon Radio Frequency Discharges
Author: Karen Jean NordhedenPublisher:
ISBN:
Category :
Languages : en
Pages : 106
Book Description
Dissertation Abstracts International
Author: Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 604
Book Description
Reactive Ion Etching of Gallium Arsenide and Aluminum Gallium Arsenide Using Boron Trichloride and Chlorine
Author: Douglas Ray HendricksPublisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 76
Book Description
Optical Spectroscopy Studies of the Reactive Ion Etching of Gallium Arsenide in Dichlorodifloromethane/oxygen/argon Discharges
Author: Hakki Ufuk AlpaySelective Reactive Ion Etching of Gallium Arsenide/aluminum Gallium Arsenide in Silicon Tetrachloride/silicon Tetrafluoride Plasmas
Author: William Harris GugginaPublisher:
ISBN:
Category :
Languages : en
Pages : 92
Book Description
Chlorine Reactive Ion Etching of Gallium Arsenide
Author: Joseph T. TustinPublisher:
ISBN:
Category : Gallium arsenide semiconductors
Languages : en
Pages : 222
Book Description
A Study of Reactive Ion Etching of Gallium Arsenide in Mixtures of Methane and Hydrogen Plasmas
Author: Hossein Fariborz SahafiModeling of the Reactive Ion Etching of Gallium Arsenide Semiconductor
Author: Chandrasekharan KothandaramanPublisher:
ISBN:
Category :
Languages : en
Pages : 88
Book Description
Chemical Abstracts
Author: Deep Anisotropic Etching of Gallium Arsenide with Chlorine-based Chemistries and SU-8 Mask Using Reactive Ion Etching and High Density Inductive Coupled Plasma Etching Methods
Author: Joy Tsz-Kwan LauPublisher:
ISBN:
Category : Anisotropy
Languages : en
Pages : 98
Book Description