Author: Warren Crittenden Browne
Publisher:
ISBN:
Category : Lithography
Languages : en
Pages : 264
Book Description
Practical Text Book of Lithography
Author: Warren Crittenden Browne
Publisher:
ISBN:
Category : Lithography
Languages : en
Pages : 264
Book Description
Publisher:
ISBN:
Category : Lithography
Languages : en
Pages : 264
Book Description
Fundamental Principles of Optical Lithography
Author: Chris Mack
Publisher: John Wiley & Sons
ISBN: 1119965071
Category : Technology & Engineering
Languages : en
Pages : 503
Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Publisher: John Wiley & Sons
ISBN: 1119965071
Category : Technology & Engineering
Languages : en
Pages : 503
Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Practical Lithographic Printmaking
Author: Manly Banister
Publisher: Dover Publications
ISBN:
Category : Lithography
Languages : en
Pages : 136
Book Description
Publisher: Dover Publications
ISBN:
Category : Lithography
Languages : en
Pages : 136
Book Description
Practical Lithography
Author: Alfred Seymour
Publisher:
ISBN:
Category : Lithography
Languages : en
Pages : 160
Book Description
Publisher:
ISBN:
Category : Lithography
Languages : en
Pages : 160
Book Description
Practical Printmaking
Author: Colin Gale
Publisher: A&C Black
ISBN: 0713688092
Category : Art
Languages : en
Pages : 161
Book Description
A comprehensive reference guide to a wide range of printmaking techniques.
Publisher: A&C Black
ISBN: 0713688092
Category : Art
Languages : en
Pages : 161
Book Description
A comprehensive reference guide to a wide range of printmaking techniques.
Stone Lithography
Author: Paul Croft
Publisher: A & C Black
ISBN:
Category : Art
Languages : en
Pages : 168
Book Description
"In this practical handbook, Paul Croft offers a comprehensive approach to the many aspects of lithography. Through simplified steps the information is presented in a logical and meaningful manner. This lavishly illustrated guide is also teeming with examples of prints from an international group of artists, showing the beautiful work that is being produced around the world today."--BOOK JACKET.Title Summary field provided by Blackwell North America, Inc. All Rights Reserved
Publisher: A & C Black
ISBN:
Category : Art
Languages : en
Pages : 168
Book Description
"In this practical handbook, Paul Croft offers a comprehensive approach to the many aspects of lithography. Through simplified steps the information is presented in a logical and meaningful manner. This lavishly illustrated guide is also teeming with examples of prints from an international group of artists, showing the beautiful work that is being produced around the world today."--BOOK JACKET.Title Summary field provided by Blackwell North America, Inc. All Rights Reserved
The Art of Lithography
Author: Henry John Rhodes
Publisher:
ISBN:
Category : Lithography
Languages : en
Pages : 376
Book Description
"The work is the result of long experience both in the workshop and the technical classroom, and the author has sought to make it comprehensive, thoroughly up-to-date, and, above all, practical." -preface.
Publisher:
ISBN:
Category : Lithography
Languages : en
Pages : 376
Book Description
"The work is the result of long experience both in the workshop and the technical classroom, and the author has sought to make it comprehensive, thoroughly up-to-date, and, above all, practical." -preface.
Computational Lithography
Author: Xu Ma
Publisher: John Wiley & Sons
ISBN: 111804357X
Category : Technology & Engineering
Languages : en
Pages : 225
Book Description
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.
Publisher: John Wiley & Sons
ISBN: 111804357X
Category : Technology & Engineering
Languages : en
Pages : 225
Book Description
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.
Plate Lithography
Author: Paul Croft
Publisher: A&C Black
ISBN: 9780713657975
Category : Lithography
Languages : en
Pages : 160
Book Description
This Printmaking Handbook is a companion volume to Paul Croft's previous book, Stone Lithography. The author guides the reader through all aspects of plate lithography with step-by-step instructions accompanied by clear, colour photographs. The author also includes amazing work by well-known practitioners from around the world. This beautifully illustrated, yet practical guide, is essential for all those interested in lithography.
Publisher: A&C Black
ISBN: 9780713657975
Category : Lithography
Languages : en
Pages : 160
Book Description
This Printmaking Handbook is a companion volume to Paul Croft's previous book, Stone Lithography. The author guides the reader through all aspects of plate lithography with step-by-step instructions accompanied by clear, colour photographs. The author also includes amazing work by well-known practitioners from around the world. This beautifully illustrated, yet practical guide, is essential for all those interested in lithography.
Handbook of Microlithography, Micromachining, and Microfabrication: Micromachining and microfabrication
Author: P. Rai-Choudhury
Publisher: SPIE Press
ISBN: 9780819423795
Category : Technology & Engineering
Languages : en
Pages : 706
Book Description
Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Publisher: SPIE Press
ISBN: 9780819423795
Category : Technology & Engineering
Languages : en
Pages : 706
Book Description
Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.