Plasma Enhanced Chemical Vapor Deposition of Silicon Epitaxial Layers PDF Download

Author: Rafael Reif
Publisher:
ISBN:
Category : Silicon crystals
Languages : en
Pages : 13

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Author: Jeffrey S. Lillé
Publisher:
ISBN:
Category : Silicon polymers
Languages : en
Pages : 414

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Author: James Hartfiel Comfort
Publisher:
ISBN:
Category :
Languages : en
Pages : 352

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Author: Arthur Sherman
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240

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Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Author: McD. Robinson
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 828

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Author: R. Reif
Publisher:
ISBN:
Category : Autodoping
Languages : en
Pages : 3

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This paper reviews the most recent results obtained using a very low pressure, plasma enhanced chemical vapor deposition technique for low temperature (650-800°C) silicon epitaxy. Initial results on autodoping studies and on p-n junctions and MOS transistors fabricated in these films are briefly discussed.

Author: S Neralla
Publisher: BoD – Books on Demand
ISBN: 9535125729
Category : Science
Languages : en
Pages : 292

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Book Description
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.

Author: David A. Brass
Publisher:
ISBN:
Category :
Languages : en
Pages : 189

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Author:
Publisher: Elsevier
ISBN: 0080541003
Category : Science
Languages : en
Pages : 514

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Book Description
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.

Author: Matthew W. Deming
Publisher:
ISBN:
Category : Erbium
Languages : en
Pages : 170

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