Author: Toshiaki Makabe
Publisher: CRC Press
ISBN: 1420012274
Category : Science
Languages : en
Pages : 355
Book Description
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
Plasma Electronics
Author: Toshiaki Makabe
Publisher: CRC Press
ISBN: 1420012274
Category : Science
Languages : en
Pages : 355
Book Description
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
Publisher: CRC Press
ISBN: 1420012274
Category : Science
Languages : en
Pages : 355
Book Description
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
Plasma Electronics, Second Edition
Author: Toshiaki Makabe
Publisher: CRC Press
ISBN: 1482222051
Category : Science
Languages : en
Pages : 414
Book Description
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
Publisher: CRC Press
ISBN: 1482222051
Category : Science
Languages : en
Pages : 414
Book Description
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory. Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences. A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency. The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor. Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
Plasma Electronics
Author: Toshiaki Makabe
Publisher: CRC Press
ISBN: 1482222108
Category : Science
Languages : en
Pages : 406
Book Description
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental
Publisher: CRC Press
ISBN: 1482222108
Category : Science
Languages : en
Pages : 406
Book Description
Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental
Plasma Physics and Magnetohydrodynamics
Author:
Publisher:
ISBN:
Category : Magnetohydrodynamics
Languages : en
Pages : 188
Book Description
Publisher:
ISBN:
Category : Magnetohydrodynamics
Languages : en
Pages : 188
Book Description
Plasma Physics and Magnetohydrodynamics
Author: Defense Documentation Center (U.S.)
Publisher:
ISBN:
Category : Magnetohydrodynamics
Languages : en
Pages : 290
Book Description
Publisher:
ISBN:
Category : Magnetohydrodynamics
Languages : en
Pages : 290
Book Description
Routledge German Dictionary of Electrical Engineering and Electronics Worterbuch Elektrotechnik and Elektronik Englisch
Author: Peter-Klaus Budig
Publisher: Routledge
ISBN: 1000142957
Category : Computers
Languages : en
Pages : 734
Book Description
This book presents the vocabulary of a continually evolving and fundamental technical field which is finding ever broad applications in industry. It provides special attention to the language of national and international standards and recommendations, as well as appropriate field indications.
Publisher: Routledge
ISBN: 1000142957
Category : Computers
Languages : en
Pages : 734
Book Description
This book presents the vocabulary of a continually evolving and fundamental technical field which is finding ever broad applications in industry. It provides special attention to the language of national and international standards and recommendations, as well as appropriate field indications.
Plasma Cathode Electron Sources
Author: Efim Oks
Publisher: John Wiley & Sons
ISBN: 3527609245
Category : Science
Languages : en
Pages : 181
Book Description
This book fills the gap for a textbook describing this kind of electron beam source in a systematic and thorough manner: from physical processes of electron emission to examples of real plasma electron sources and their applications.
Publisher: John Wiley & Sons
ISBN: 3527609245
Category : Science
Languages : en
Pages : 181
Book Description
This book fills the gap for a textbook describing this kind of electron beam source in a systematic and thorough manner: from physical processes of electron emission to examples of real plasma electron sources and their applications.
Controlled Fusion and Plasma Research
Plasma Processing of Materials
Author: National Research Council
Publisher: National Academies Press
ISBN: 0309045975
Category : Technology & Engineering
Languages : en
Pages : 88
Book Description
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Publisher: National Academies Press
ISBN: 0309045975
Category : Technology & Engineering
Languages : en
Pages : 88
Book Description
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Plasma and High Frequency Processes for Obtaining and Processing Materials in the Nuclear Fuel Cycle
Author: I. N. Toumanov
Publisher: Nova Publishers
ISBN: 9781590330098
Category : Business & Economics
Languages : en
Pages : 628
Book Description
Plasma & High Frequency Processes for Obtaining & Processing Materials in the Nuclear Fuel Cycle
Publisher: Nova Publishers
ISBN: 9781590330098
Category : Business & Economics
Languages : en
Pages : 628
Book Description
Plasma & High Frequency Processes for Obtaining & Processing Materials in the Nuclear Fuel Cycle