Author: Matthew A. Evanko
Publisher:
ISBN:
Category :
Languages : en
Pages : 124
Book Description
Parameters Affecting Deposition of Boron Nitride Films in a Microwave-assisted Plasma-enhanced Chemical Vapor Deposition Apparatus
Plasma-enhanced Chemical Vapor Deposition of Boron Nitride
Cubic Boron Nitride Film Deposition and Process Diagnostics in a Supersonic Plasma Jet Chemical Vapor Deposition System with Substrate Bias
Deposition of Cubic Boron Nitride Thin Films by Supersonic D.C. Plasma-enhanced Chemical Vapor Deposition
Microwave Plasma-enhanced Chemical Vapor Deposition and Characterization of Diamond and Silicon Nitride Thin Films
Synthesis of Thin Films in Boron-carbon-nitrogen Ternary System by Microwave Plasma Enhanced Chemical Vapor Deposition
Plasma-enhanced Chemical Vapor Deposition of Silicon Nitride from 1,1,3,3,5,5,-hexamethylcyclotrisilazane
Preparation of Chemical Vapor-deposited Materials for Use in Field-enhanced Electron Emission Studies
Author: David G. MCMaster
Publisher:
ISBN:
Category :
Languages : en
Pages : 44
Book Description
The general principles of chemical vapor deposition (CVD) are described and specific experimental results on the deposition of pyrolytic graphite, of CVD boron nitride, and of CVD tungsten on tungsten substrates are discussed. In order to obtain uniform anisotropic, thin films of pyrolytic graphite and CVD boron nitride, the deposition parameters such as deposition temperature, concentration of the gaseous reactants, and gas flow pattern were varied, and their influence on the deposits was studied. It was found that the uniformity of pyrolytic graphite can be increased by using high total gas flow rates and low methane concentrations. The most uniform CVD-boron nitride deposits were obtained under the following conditions: Temperature: 1600C; Gas flow rate (cc/min): ammonia 10, boron trichloride 6, nitrogen 4. The deposits of pyrolytic graphite and CVD boron nitride exhibited a high degree of anisotropy. Thin-film sandwich structures of pyrolytic graphite and CVD boron nitride were successfully produced. Preliminary tests have been performed with CVD tungsten. (Author).
Publisher:
ISBN:
Category :
Languages : en
Pages : 44
Book Description
The general principles of chemical vapor deposition (CVD) are described and specific experimental results on the deposition of pyrolytic graphite, of CVD boron nitride, and of CVD tungsten on tungsten substrates are discussed. In order to obtain uniform anisotropic, thin films of pyrolytic graphite and CVD boron nitride, the deposition parameters such as deposition temperature, concentration of the gaseous reactants, and gas flow pattern were varied, and their influence on the deposits was studied. It was found that the uniformity of pyrolytic graphite can be increased by using high total gas flow rates and low methane concentrations. The most uniform CVD-boron nitride deposits were obtained under the following conditions: Temperature: 1600C; Gas flow rate (cc/min): ammonia 10, boron trichloride 6, nitrogen 4. The deposits of pyrolytic graphite and CVD boron nitride exhibited a high degree of anisotropy. Thin-film sandwich structures of pyrolytic graphite and CVD boron nitride were successfully produced. Preliminary tests have been performed with CVD tungsten. (Author).
Ceramic Abstracts
Microwave Plasma Assisted Chemical Vapor Deposition of Ultra-nanocrystalline Diamond Films
Author: Wen-Shin Huang
Publisher:
ISBN:
Category : Chemical vapor
Languages : en
Pages : 798
Book Description
Publisher:
ISBN:
Category : Chemical vapor
Languages : en
Pages : 798
Book Description