Author: Peter V. Schwartz
Publisher:
ISBN:
Category :
Languages : en
Pages : 270
Book Description
Oxygen Incorporation During Low-temperature Chemical Vapor Deposition and Its Effects on the Electronic Properties of Epitaxial Si and Si[1-x]Ge[x] Films
Dissertation Abstracts International
Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 792
Book Description
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 792
Book Description
Journal of the Physical Society of Japan
Author: Nihon Butsuri Gakkai
Publisher:
ISBN:
Category : Electronic journals
Languages : en
Pages : 1136
Book Description
Publisher:
ISBN:
Category : Electronic journals
Languages : en
Pages : 1136
Book Description
Characterization of the electrical properties of epitaxial silicon films grown by remote plasma-enhanced chemical vapor deposition
Electronic and Material Characterization of SiGe and SiGeC Epitaxial Layers
Chemical vapor deposition growth
Author: United States. Department of Energy
Publisher:
ISBN:
Category : Silicon
Languages : en
Pages : 260
Book Description
Publisher:
ISBN:
Category : Silicon
Languages : en
Pages : 260
Book Description
Science Abstracts
Author:
Publisher:
ISBN:
Category : Electric engineering
Languages : en
Pages : 2332
Book Description
Publisher:
ISBN:
Category : Electric engineering
Languages : en
Pages : 2332
Book Description
Low Temperature Epitaxial Growth of Semiconductors
Author: Takashi Hariu
Publisher: World Scientific
ISBN: 9789971508395
Category : Technology & Engineering
Languages : en
Pages : 356
Book Description
Low temperature processes for semiconductors have been recently under intensive development to fabricate controlled device structures with minute dimensions in order to achieve the highest device performance and new device functions as well as high integration density. Comprising reviews by experts long involved in the respective pioneering work, this volume makes a useful contribution toward maturing the process of low temperature epitaxy as a whole.
Publisher: World Scientific
ISBN: 9789971508395
Category : Technology & Engineering
Languages : en
Pages : 356
Book Description
Low temperature processes for semiconductors have been recently under intensive development to fabricate controlled device structures with minute dimensions in order to achieve the highest device performance and new device functions as well as high integration density. Comprising reviews by experts long involved in the respective pioneering work, this volume makes a useful contribution toward maturing the process of low temperature epitaxy as a whole.
Abstracts
Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Materials science
Languages : en
Pages : 504
Book Description
Publisher:
ISBN:
Category : Materials science
Languages : en
Pages : 504
Book Description
Low temperature in situ clean and Si and Si[subscript 1-x] and Ge[subscript x] epitaxy by remote plasma-enhanced chemical vapor deposition
Author: Ting-Chen Hsu
Publisher:
ISBN:
Category : Silicon
Languages : en
Pages : 258
Book Description
Publisher:
ISBN:
Category : Silicon
Languages : en
Pages : 258
Book Description