Author: Guofu FengPublisher:
ISBN:
Category : Semiconductor doping
Languages : en
Pages : 338
Book Description
Optical Studies of Ion-bombarded Gallium Arsenide
Author: Guofu FengPublisher:
ISBN:
Category : Semiconductor doping
Languages : en
Pages : 338
Book Description
Optical Spectroscopy Studies of Ion Bombarded Gallium Arsenide and Vanadium Carbide Thin Films
Author: Kudakwashe JakataPublisher:
ISBN:
Category : Gallium arsenide
Languages : en
Pages : 168
Book Description
Optical Spectroscopy Studies of the Reactive Ion Etching of Gallium Arsenide in Dichlorodifloromethane/oxygen/argon Discharges
Author: Hakki Ufuk AlpayNuclear Science Abstracts
Author: Optical Spectroscopy Studies of the Reactive Ion Etching of Silicon and Gallium Arsenide in Halomethane-based Discharges
Author: Robert Edward KlingerPublisher:
ISBN:
Category :
Languages : en
Pages : 244
Book Description
Nonstoichiometric Gallium Arsenide Obtained by Ion Implantation - Structural, Electrical and Optical Studies
Author: Jacek Jasiński (fizyka)Scientific and Technical Aerospace Reports
Author: Energy Research Abstracts
Author: STAR
Author: Auger Electron Spectroscopy
Author: Donald T. HawkinsPublisher: Springer Science & Business Media
ISBN: 1468413872
Category : Science
Languages : en
Pages : 305
Book Description
Auger electron spectroscopy is rapidly developing into the single most powerful analytical technique in basic and applied science.for investigating the chemical and structural properties of solids. Its ex plosive growth beginning in 1967 was triggered by the development of Auger analyzers capable of de tecting one atom layer of material in a fraction of a second. Continued growth was guaranteed firstly by the commercial availability of apparatus which combined the capabilities of scanning electron mi croscopy and ion-mill depth profiling with Auger analysis, and secondly by the increasing need to know the atomistics of many processes in fundamental research and engineering applications. The expanding use of Auger analysis was accompanied by an increase in the number of publications dealing with it. Because of the developing nature of Auger spectroscopy, the articles have appeared in many different sources covering diverse disciplines, so that it is extremely difficult to discover just what has or has not been subjected to Auger analysis. In this situation, a comprehensive bibliography is obviou-sly useful to those both inside and outside the field. For those in the field, this bibliography should be a wonderful time saver for locating certain references, in researching a particular topic, or when considering various aspects of instrumentation or data analysis. This bibliography not only provides the most complete listing of references pertinent to surface Auger analysis available today, but it is also a basis for extrapolating from past trends to future expectations.