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Author: Luc Van den Hove Publisher: SPIE-International Society for Optical Engineering ISBN: Category : Science Languages : en Pages : 1114
Book Description
A study of optical microlithography. It contains papers on subjects such as phase-shifting masks, CD control scanners, process optimization, and advanced masks.
Author: Luc Van den Hove Publisher: SPIE-International Society for Optical Engineering ISBN: Category : Science Languages : en Pages : 1114
Book Description
A study of optical microlithography. It contains papers on subjects such as phase-shifting masks, CD control scanners, process optimization, and advanced masks.
Author: Alfred Kwok-Kit Wong Publisher: SPIE Press ISBN: 9780819458292 Category : Technology & Engineering Languages : en Pages : 280
Book Description
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Author: Bruce W. Smith Publisher: CRC Press ISBN: 1351643444 Category : Technology & Engineering Languages : en Pages : 913
Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Author: Luciano Lavagno Publisher: CRC Press ISBN: 1351837583 Category : Technology & Engineering Languages : en Pages : 704
Book Description
Presenting a comprehensive overview of the design automation algorithms, tools, and methodologies used to design integrated circuits, the Electronic Design Automation for Integrated Circuits Handbook is available in two volumes. The second volume, EDA for IC Implementation, Circuit Design, and Process Technology, thoroughly examines real-time logic to GDSII (a file format used to transfer data of semiconductor physical layout), analog/mixed signal design, physical verification, and technology CAD (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability at the nanoscale, power supply network design and analysis, design modeling, and much more. Save on the complete set.
Author: Luciano Lavagno Publisher: CRC Press ISBN: 1351831003 Category : Technology & Engineering Languages : en Pages : 893
Book Description
The second of two volumes in the Electronic Design Automation for Integrated Circuits Handbook, Second Edition, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology thoroughly examines real-time logic (RTL) to GDSII (a file format used to transfer data of semiconductor physical layout) design flow, analog/mixed signal design, physical verification, and technology computer-aided design (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability (DFM) at the nanoscale, power supply network design and analysis, design modeling, and much more. New to This Edition: Major updates appearing in the initial phases of the design flow, where the level of abstraction keeps rising to support more functionality with lower non-recurring engineering (NRE) costs Significant revisions reflected in the final phases of the design flow, where the complexity due to smaller and smaller geometries is compounded by the slow progress of shorter wavelength lithography New coverage of cutting-edge applications and approaches realized in the decade since publication of the previous edition—these are illustrated by new chapters on 3D circuit integration and clock design Offering improved depth and modernity, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology provides a valuable, state-of-the-art reference for electronic design automation (EDA) students, researchers, and professionals.
Author: Andrew Sarangan Publisher: CRC Press ISBN: 1315353423 Category : Technology & Engineering Languages : en Pages : 299
Book Description
This book is designed to introduce typical cleanroom processes, techniques, and their fundamental principles. It is written for the practicing scientist or engineer, with a focus on being able to transition the information from the book to the laboratory. Basic theory such as electromagnetics and electrochemistry is described in as much depth as necessary to understand and explain the current practice and their limitations. Examples from various areas of interest will be covered, such as the fabrication of photonic devices including photo detectors, waveguides, and optical coatings, which are not commonly found in other fabrication texts.
Author: Charles J. Alpert Publisher: CRC Press ISBN: 1420013483 Category : Computers Languages : en Pages : 1043
Book Description
The physical design flow of any project depends upon the size of the design, the technology, the number of designers, the clock frequency, and the time to do the design. As technology advances and design-styles change, physical design flows are constantly reinvented as traditional phases are removed and new ones are added to accommodate changes in
Author: Ronald G. Driggers Publisher: CRC Press ISBN: 9780824742515 Category : Science Languages : en Pages : 1130
Book Description
Compiled by 330 of the most widely respected names in the electro-optical sciences, the Encyclopedia is destined to serve as the premiere guide in the field with nearly 2000 figures, 560 photographs, 260 tables, and 3800 equations. From astronomy to x-ray optics, this reference contains more than 230 vivid entries examining the most intriguing technological advances and perspectives from distinguished professionals around the globe. The contributors have selected topics of utmost importance in areas including digital image enhancement, biological modeling, biomedical spectroscopy, and ocean optics, providing thorough coverage of recent applications in this continually expanding field.
Author: Luc Van den Hove
Author: Luc Van den Hove
Author: Alfred Kwok-Kit Wong
Author: 
Author: Bruce W. Smith
Author: Luciano Lavagno
Author: Luciano Lavagno
Author: Andrew Sarangan
Author: Charles J. Alpert
Author: 
Author: Ronald G. Driggers