Modelling and Control of Silicon and Germanium Thin Film Chemical Vapor Deposition PDF Download

Author: Scott Anderson Middlebrooks
Publisher:
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Category :
Languages : en
Pages : 220

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Category : Aeronautics
Languages : en
Pages : 704

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Author: Mark Donald Allendorf
Publisher: The Electrochemical Society
ISBN: 9781566772785
Category : Technology & Engineering
Languages : en
Pages : 826

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Category : Dissertations, Academic
Languages : en
Pages : 854

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Author: Wade H. Shafer
Publisher: Springer Science & Business Media
ISBN: 1461303931
Category : Science
Languages : en
Pages : 427

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Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS)* at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dis semination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all concerned if the printing and distribution of the volumes were handled by an international publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Corporation of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 39 (thesis year 1994) a total of 13,953 thesis titles from 21 Canadian and 159 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this impor tant annual reference work. While Volume 39 reports theses submitted in 1994, on occasion, certain uni versities do report theses submitted in previous years but not reported at the time.

Author: Arno Smets
Publisher: Bloomsbury Publishing
ISBN: 1906860750
Category : Technology & Engineering
Languages : en
Pages : 488

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This book provides a broad overview on the different aspects of solar energy, with a focus on photovoltaics, which is the technology that allows light energy to be converted into electric energy. Renewable energy sources have become increasingly popular in recent years, and solar is one of the most adaptable and attractive types – from solar farms to support the National Grid to roof panels/tiles used for solar thermal heating systems, and small solar garden lights. Written by Delft University researchers, Solar Energy uniquely covers both the physics of photovoltaic (PV) cells and the design of PV systems for real-life applications, from a concise history of solar cells components and location issues of current systems. The book is designed to make this complicated subject accessible to all, and is packed with fascinating graphs and charts, as well as useful exercises to cement the topics covered in each chapter. Solar Energy outlines the fundamental principles of semiconductor solar cells, as well as PV technology: crystalline silicon solar cells, thin-film cells, PV modules, and third-generation concepts. There is also background on PV systems, from simple stand-alone to complex systems connected to the grid. This is an invaluable reference for physics students, researchers, industrial engineers and designers working in solar energy generation, as well those with a general interest in renewable energy.

Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266

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Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Author: Hideki Matsumura
Publisher: John Wiley & Sons
ISBN: 352734523X
Category : Technology & Engineering
Languages : en
Pages : 438

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The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.

Author:
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Category : Solar energy
Languages : en
Pages : 856

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Author: Dimitra Vernardou
Publisher: MDPI
ISBN: 3039439235
Category : Science
Languages : en
Pages : 94

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Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.