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Author: David J. Srolovitz Publisher: ISBN: Category : Science Languages : en Pages : 408
Book Description
A diverse set of materials science communities come together in this volume to review the extraordinary progress made in the development of computer simulation and modeling techniques for the prediction of film morphology, microstructure, composition, profile and structure. These techniques are rapidly moving out of the area of academic research and into technological and production design areas of thin-film-based industries. The book is loosely organized in ascending order of modeling-length scales - from atomic, up to the entire deposition reactor. Topics include: deposition and growth modeling; film morphology and topology; film microstructure; failure mechanisms; etching; process modeling and control and reactor-scale modeling.
Author: David J. Srolovitz Publisher: ISBN: Category : Science Languages : en Pages : 408
Book Description
A diverse set of materials science communities come together in this volume to review the extraordinary progress made in the development of computer simulation and modeling techniques for the prediction of film morphology, microstructure, composition, profile and structure. These techniques are rapidly moving out of the area of academic research and into technological and production design areas of thin-film-based industries. The book is loosely organized in ascending order of modeling-length scales - from atomic, up to the entire deposition reactor. Topics include: deposition and growth modeling; film morphology and topology; film microstructure; failure mechanisms; etching; process modeling and control and reactor-scale modeling.
Author: P.F. Williams Publisher: Springer Science & Business Media ISBN: 9401158843 Category : Technology & Engineering Languages : en Pages : 610
Book Description
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Author: Raymond T. Tung Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 680
Book Description
Tremendous advances have been made in the use of silicides as contacts and interconnects in micro-electronic devices and as active layers in sensors. A flourish of novel fabrication concepts and characterization techniques has led to high-quality silicide devices and a better understanding of the electronic and micrometallurgical properties of their interfaces. However, the shrinking physical dimensions of ULSI devices beyond the deep submicron regime now poses new and serious materials challenges for the development of manufacturable silicide processes. Scientists and engineers from materials science, physics, chemistry, device, processing and other disciplines come together in this book to examine the current issues facing silicide thin-film applications. Topics include: silicide fundamentals - energetics and kinetics; processing of silicide thin films; ULSI issues; CVD silicides; semiconducting silicides; processing of germano-silicide thin films; silicides and analogs for IR detection; interfaces, surfaces and epitaxy; novel structures and techniques and properties of silicide thin films.
Author: Bruce W. Wessels Publisher: ISBN: Category : Science Languages : en Pages : 312
Book Description
The combination of electro-optic (EO) thin films with silicon-integrated circuits provides a promising approach to creating optoelectronic integrated circuits (OEICs) capable of sending information at data rates greater than 1 Gbit/second with low power consumption. These devices are of two basic types - very highly parallel (64K channels or greater) or very high speed (Gbits/ second/channel). Materials scientists, chemists and physicists come together in this new volume to discuss EO thin-film materials and devices, and to learn about advances in fields outside of their specific areas. Electro-optic materials featured include organic polymers and/or multilayers, liquid crystals, and inorganic thin films. Materials design, processing, and device issues are addressed. Topics include: nonlinear organics; liquid crystals for integrated optics; ferroelectric thin films; Er-doped inorganic thin films; inorganic thin film waveguides.
Author: Robert C. Sundahl Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 312
Book Description
The dynamic nature of the microelectronics industry, in particular within the area of packaging, requires a continuous updating and revision of priorities. In an effort to communicate these priorities to researchers and engineers in the field, the National Technology Road Map was developed. This proceedings volume, the eighth in a series on electronic packaging, focuses on the materials research, development and processing issues identified in the road map. Topics include: an overview of the National Technology Road Map for Semiconductors; institutional and industrial perspectives; impact on materials needs and materials science issues; and research responses. Technical subtopics include polymers, ceramics, solder and composites.
Author: James S. Speck Publisher: ISBN: Category : Science Languages : en Pages : 588
Book Description
Our understanding and control of epitaxial oxide heterostructures has progressed along multiple frontiers including magnetic, dielectric, ferroelectric, and superconducting oxide materials. This has resulted in both independent rediscovery and the successful borrowing of ideas from ceramic science, solid-state physics, and semiconductor epitaxy. A new field of materials science has emerged which aims at the use of the intrinsic properties of various oxide materials in single-crystal thin-film form. Exploiting the potential of these materials, however, will only be possible if many fundamental and engineering questions can be answered. This book represents continued progress toward fulfilling that promise. Technical information on epitaxial oxide thin films from industry, academia and government laboratories is presented. Topics include: dielectrics; ferroelectrics; optics; superconductors; magnetics; magnetoresistance.
Author: H. A. Atwater Publisher: ISBN: Category : Science Languages : en Pages : 472
Book Description
With over 16 countries represented, this book represents international developments in the field of film synthesis and growth using energetic beams. It focuses on pulsed-laser deposition. Fundamental issues pertaining to the generation of laser ablation plumes, temperature distributions and collisional effects are described. Ion-assisted pulsed-laser deposition, pulsed-ion deposition, applications of hyperthermal beams and aspects of surface dynamics are discussed. The inclusion of an ion beam with the ablation process leads to some unique modifications in the thin-film growth mechanisms, and hence, film properties. Likewise, the collision of high-mass metal cluster ions with substrates shows promise for growth of novel structures. Also featured are new developments of optoelectronic materials, nitrides and carbon films using a variety of techniques. The effects of beam-induced defects on growth and surface morphology, chemical effects during growth, and characterization of film growth and film properties are addressed.
Author: Efthimios Kaxiras Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 642
Book Description
Significant advances have been made towards understanding the properties of materials through theoretical approaches. These approaches are based either on first-principles quantum mechanical formulations or semi-empirical formulations, and have benefitted from increases in computational power. The advent of parallel computing has propelled the theoretical approaches to a new level of realism in modelling physical systems of interest. The theoretical methods and simulation techniques that are cur- rently under development are certain to become powerful tools in understanding, exploring and predicting the properties of existing and novel materials. This book discusses critically current developments in computations and simulational approaches specifically aimed at addressing real materials problems, with an emphasis on parallel computing and shows the most successful applications of computational and simulational work to date. Topics include: advances in computational methods; parallel algorithms and applications; fracture, brittle/ductile behavior and large-scale defects; thermodynamic stability of materials; surfaces and interfaces of materials; and complex materials simulations.
Author: Scott T. Dunham Publisher: ISBN: Category : Technology & Engineering Languages : en Pages : 296
Book Description
Highlights recent advances in technology computer-aided design (TCAD) and identifies critical areas for future emphasis. The 39 contributions from the December 1997 symposium cover four main topics--bulk process modeling, equipment modeling, topography modeling, and characterization and device modeling. Paper topics include arsenic deactivation in silicon; defect reactions induced by reactive ion etching; optimization of AMT barrel reactors for silicon epitaxy; grain structure evolution and the reliability of Al(Cu) thin film interconnects; and improved quantitative mobility spectrum analysis. Annotation copyrighted by Book News, Inc., Portland, OR
Author: David J. Srolovitz
Author: David J. Srolovitz
Author: P.F. Williams
Author: Raymond T. Tung
Author: Bruce W. Wessels
Author: G. R. Srinivasan
Author: Robert C. Sundahl
Author: James S. Speck
Author: H. A. Atwater
Author: Efthimios Kaxiras
Author: Scott T. Dunham