Microstructural Comparisons of Ultra-Thin Cu Films Deposited by Ion-Beam and Dc-Magnetron Sputtering PDF Download
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Author: W. Prater Publisher: ISBN: Category : Languages : en Pages :
Book Description
We report and contrast both the electrical resistance and the microstructure of copper thin films deposited in an oxygen containing atmosphere by ion-beam and dc-magnetron sputtering. For films with thicknesses 5 nm or less, the resistivity of the Cu films is minimized at oxygen concentrations ranging from 0.2% to 1% for dc-magnetron sputtering and 6% to 10% for ion beam sputtering. Films sputtered under both conditions show a similar decrease of interface roughness with increasing oxygen concentration, although the magnetron deposited films are smoother. The dc-magnetron produced films have higher resistivity, have smaller Cu grains, and contain a higher concentration of cuprous oxide particles. We discuss the mechanisms leading to the grain refinement and the consequent reduced resistivity in both types of films.
Author: W. Prater Publisher: ISBN: Category : Languages : en Pages :
Book Description
We report and contrast both the electrical resistance and the microstructure of copper thin films deposited in an oxygen containing atmosphere by ion-beam and dc-magnetron sputtering. For films with thicknesses 5 nm or less, the resistivity of the Cu films is minimized at oxygen concentrations ranging from 0.2% to 1% for dc-magnetron sputtering and 6% to 10% for ion beam sputtering. Films sputtered under both conditions show a similar decrease of interface roughness with increasing oxygen concentration, although the magnetron deposited films are smoother. The dc-magnetron produced films have higher resistivity, have smaller Cu grains, and contain a higher concentration of cuprous oxide particles. We discuss the mechanisms leading to the grain refinement and the consequent reduced resistivity in both types of films.
Author: Publisher: ISBN: Category : Aeronautics Languages : en Pages : 1460
Book Description
Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Author: Sabu Thomas Publisher: Elsevier ISBN: 012820883X Category : Technology & Engineering Languages : en Pages : 610
Book Description
Design, Fabrication, and Characterization of Multifunctional Nanomaterials covers major techniques for the design, synthesis, and development of multifunctional nanomaterials. The chapters highlight the main characterization techniques, including X-ray diffraction, scanning electron microscopy, high-resolution transmission electron microscopy, energy dispersive X-ray spectroscopy, and scanning probe microscopy.The book explores major synthesis methods and functional studies, including: - Brillouin spectroscopy; - Temperature-dependent Raman spectroscopic studies; - Magnetic, ferroelectric, and magneto-electric coupling analysis; - Organ-on-a-chip methods for testing nanomaterials; - Magnetron sputtering techniques; - Pulsed laser deposition techniques; - Positron annihilation spectroscopy to prove defects in nanomaterials; - Electroanalytic techniques. This is an important reference source for materials science students, scientists, and engineers who are looking to increase their understanding of design and fabrication techniques for a range of multifunctional nanomaterials. - Explains the major design and fabrication techniques and processes for a range of multifunctional nanomaterials; - Demonstrates the design and development of magnetic, ferroelectric, multiferroic, and carbon nanomaterials for electronic applications, energy generation, and storage; - Green synthesis techniques and the development of nanofibers and thin films are also emphasized.
Author: Daniel Lundin Publisher: Elsevier ISBN: 0128124547 Category : Technology & Engineering Languages : en Pages : 398
Book Description
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
Author: Boris Ildusovich Kharisov Publisher: CRC Press ISBN: 1466505230 Category : Science Languages : en Pages : 586
Book Description
Researchers and engineers working in nuclear laboratories, nuclear electric plants, and elsewhere in the radiochemical industries need a comprehensive handbook describing all possible radiation-chemistry interactions between irradiation and materials, the preparation of materials under distinct radiation types, the possibility of damage of material
Author: Kiyotaka Wasa Publisher: William Andrew ISBN: 1437734847 Category : Technology & Engineering Languages : en Pages : 657
Book Description
This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Author: W. Prater
Author: W. Prater
Author: Sun-Yi Chang
Author: 
Author: Sabu Thomas
Author: 
Author: Daniel Lundin
Author: Chimin Hu Simpson
Author: Yukiko Kubota
Author: Boris Ildusovich Kharisov
Author: Kiyotaka Wasa