Methods for Improved Growth of Group III Nitride Buffer Layers PDF Download

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Category :
Languages : en
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Book Description
Methods are disclosed for growing high crystal quality group III-nitride epitaxial layers with advanced multiple buffer layer techniques. In an embodiment, a method includes forming group III-nitride buffer layers that contain aluminum on suitable substrate in a processing chamber of a hydride vapor phase epitaxy processing system. A hydrogen halide or halogen gas is flowing into the growth zone during deposition of buffer layers to suppress homogeneous particle formation. Some combinations of low temperature buffers that contain aluminum (e.g., AlN, AlGaN) and high temperature buffers that contain aluminum (e.g., AlN, AlGaN) may be used to improve crystal quality and morphology of subsequently grown group III-nitride epitaxial layers. The buffer may be deposited on the substrate, or on the surface of another buffer. The additional buffer layers may be added as interlayers in group III-nitride layers (e.g., GaN, AlGaN, AlN).

Author: Rositsa Gergova
Publisher:
ISBN:
Category : Afterglow (Physics)
Languages : en
Pages : 298

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"The work presented in this thesis investigates the growth and properties of group III- nitride semiconductors that were grown using the Migration Enhanced Afterglow Epitaxy (MEAglow) method. This work was to enhance the understanding of the MEAglow growth process towards the improvement of quality of the layers grown using this technique. The MEAglow technique applies the migration enhanced epitaxy method in a low pressure plasma-based CVD reactor, which has a potential of producing high quality epitaxial group III-nitride layers at relatively low growth temperatures on large deposition areas. The low temperature pulse growth in metal-rich regime, comprising the MME method was employed under growth pressures between 500 mTorr and 3000 mTorr. As the MME method up to this point has been used only for MBE systems, study of the impact of the growth pressure on the materials properties was necessary. In this work the pressure dependence was mapped to an existing surface phase diagram for MBE systems by calculating the number of nitrogen gas phase collisions and the metalorganic bombardment rate, for the specific to the prototype reactor parameters, to a first approximation. This was done in order to achieve an intermediate regime free of metal droplets for growth in metal-rich regime. High quality epitaxial InN layers were accomplished on extremely thin and smooth Ga2O3 buffer layers. These results indicate a potential for the application of Ga2O3 buffers in InN growth. The MEAglow InN layers were further optimized for growth on commercially available GaN buffer layers and excellent two-dimensional growth was achieved for layers grown under metal-rich conditions at 512 °C. Post-growth annealing studies were carried out for InN layers grown at temperatures below 400 °C to study the limiting processes of the removal of excess nitrogen, believed to be a dominant defect in InN films grown in plasma-based systems at very low temperatures. Variations in GaN stoichiometry under certain growth conditions and the effect of similar growth conditions on MEAglow grown InGaN were also examined. The growth of MEAglow InGaN samples on sapphire substrates was optimized to reduce the indium surface segregation and phase separation of the material."-- from abstract.

Author: M Razeghi
Publisher: Elsevier
ISBN: 9780080444260
Category : Science
Languages : en
Pages : 602

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Tremendous progress has been made in the last few years in the growth, doping and processing technologies of the wide bandgap semiconductors. As a result, this class of materials now holds significant promis for semiconductor electronics in a broad range of applications. The principal driver for the current revival of interest in III-V Nitrides is their potential use in high power, high temperature, high frequency and optical devices resistant to radiation damage. This book provides a wide number of optoelectronic applications of III-V nitrides and covers the entire process from growth to devices and applications making it essential reading for those working in the semiconductors or microelectronics. Broad review of optoelectronic applications of III-V nitrides

Author: Zhe Chuan Feng
Publisher: Imperial College Press
ISBN: 1860949037
Category : Technology & Engineering
Languages : en
Pages : 442

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Book Description
III-Nitride semiconductor materials OCo (Al, In, Ga)N OCo are excellent wide band gap semiconductors very suitable for modern electronic and optoelectronic applications. Remarkable breakthroughs have been achieved recently, and current knowledge and data published have to be modified and upgraded. This book presents the new developments and achievements in the field. Written by renowned experts, the review chapters in this book cover the most important topics and achievements in recent years, discuss progress made by different groups, and suggest future directions. Each chapter also describes the basis of theory or experiment. The III-Nitride-based industry is building up and new economic developments from these materials are promising. It is expected that III-Nitride-based LEDs may replace traditional light bulbs to realize a revolution in lighting. This book is a valuable source of information for engineers, scientists and students working towards such goals. Sample Chapter(s). Chapter 1: Hydride Vapor Phase Epitaxy of Group III Nitride Materials (540 KB). Contents: Hydride Vapor Phase Epitaxy of Group III Nitride Materials (V Dmitriev & A Usikov); Planar MOVPE Technology for Epitaxy of III-Nitride Materials (M Dauelsberg et al.); Close-Coupled Showerhead MOCVD Technology for the Epitaxy of GaN and Related Materials (E J Thrush & A R Boyd); Molecular Beam Epitaxy for III-N Materials (H Tang & J Webb); Growth and Properties of Nonpolar GaN Films and Heterostructures (Y J Sun & O Brandt); Indium-Nitride Growth by High-Pressure CVD: Real-Time and Ex-Situ Characterization (N Dietz); A New Look on InN (L-W Tu et al.); Growth and Optical/Electrical Properties of Al x Ga 1-x N Alloys in the Full Composition Range (F Yun); Optical Investigation of InGaN/GaN Quantum Well Structures Grown by MOCVD (T Wang); Clustering Nanostructures and Optical Characteristics in InGaN/GaN Quantum-Well Structures with Silicon Doping (Y-C Cheng et al.); III-Nitrides Micro- and Nano-Structures (H M Ng & A Chowdhury); New Developments in Dilute Nitride Semiconductor Research (W Shan et al.). Readership: Scientists; material growers and evaluators; device design, processing engineers; postgraduate and graduate students in electrical & electronic engineering and materials engineering.

Author: Michael Kneissl
Publisher: Springer
ISBN: 3319241001
Category : Technology & Engineering
Languages : en
Pages : 454

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Book Description
This book provides a comprehensive overview of the state-of-the-art in group III-nitride based ultraviolet LED and laser technologies, covering different substrate approaches, a review of optical, electronic and structural properties of InAlGaN materials as well as various optoelectronic components. In addition, the book gives an overview of a number of key application areas for UV emitters and detectors, including water purification, phototherapy, sensing, and UV curing. The book is written for researchers and graduate level students in the area of semiconductor materials, optoelectronics and devices as well as developers and engineers in the various application fields of UV emitters and detectors.

Author: Mool C. Gupta
Publisher: CRC Press
ISBN: 1420004697
Category : Science
Languages : en
Pages : 1040

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Book Description
Reflecting changes in the field in the ten years since the publication of the first edition, The Handbook of Photonics, Second Edition explores recent advances that have affected this technology. In this new, updated second edition editor Mool Gupta is joined by John Ballato, strengthening the handbook with their combined knowledge and the continued contributions of world-class researchers. New in the Second Edition: Information on optical fiber technology and the economic impact of photonics Coverage of emerging technologies in nanotechnology Sections on optical amplifiers, and polymeric optical materials The book covers photonics materials, devices, and systems, respectively. An introductory chapter, new to this edition, provides an overview of photonics technology, innovation, and economic development. Resting firmly on the foundation set by the first edition, this new edition continues to serve as a source for introductory material and a collection of published data for research and training in this field, making it the reference of first resort.

Author: Hadis Morkoç
Publisher: John Wiley & Sons
ISBN: 3527628460
Category : Technology & Engineering
Languages : en
Pages : 1311

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Book Description
The three volumes of this handbook treat the fundamentals, technology and nanotechnology of nitride semiconductors with an extraordinary clarity and depth. They present all the necessary basics of semiconductor and device physics and engineering together with an extensive reference section. Volume 1 deals with the properties and growth of GaN. The deposition methods considered are: hydride VPE, organometallic CVD, MBE, and liquid/high pressure growth. Additionally, extended defects and their electrical nature, point defects, and doping are reviewed.

Author: Jinmin Li
Publisher: Springer Nature
ISBN: 9811579490
Category : Technology & Engineering
Languages : en
Pages : 295

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Book Description
The book provides an overview of III-nitride-material-based light-emitting diode (LED) technology, from the basic material physics to the latest advances in the field, such as homoepitaxy and heteroepitaxy of the materials on different substrates. It also includes the latest advances in the field, such as approaches to improve quantum efficiency and reliability as well as novel structured LEDs. It explores the concept of material growth, chip structure, packaging, reliability and application of LEDs. With spectra coverage from ultraviolet (UV) to entire visible light wavelength, the III-nitride-material-based LEDs have a broad application potential, and are not just limited to illumination. These novel applications, such as health & medical, visible light communications, fishery and horticulture, are also discussed in the book.

Author: Bernard Gil
Publisher: OUP Oxford
ISBN: 0191503959
Category : Science
Languages : en
Pages : 661

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Book Description
This book is dedicated to GaN and its alloys AlGaInN (III-V nitrides), semiconductors with intrinsic properties well suited for visible and UV light emission and electronic devices working at high temperature, high frequency, and harsh environments. There has been a rapid growth in the industrial activity relating to GaN, with GaN now ranking at the second position (after Si) among all semiconductors. This is mainly thanks to LEDs, but also to the emergence of lasers and high power and high frequency electronics. GaN-related research activities are also diversifying, ranging from advanced optical sources and single electron devices to physical, chemical, and biological sensors, optical detectors, and energy converters. All recent developments of nitrides and of their technology are gathered here in a single volume, with chapters written by world leaders in the field. This third book of the series edited by B. Gil is complementary to the preceding two, and is expected to offer a modern vision of nitrides and of their devices to a large audience of readers.

Author: Stephen J. Pearton
Publisher: CRC Press
ISBN: 9789056996864
Category : Science
Languages : en
Pages : 724

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Book Description
The first GaN and Related Materials covered topics such as a historical survey of past research, optical electrical and microstructural characterization, theory of defects, bulk crystal growth, and performance of electronic and photonic devices. This new volume updates old research where warranted and explores new areas such as UV detectors, microwave electronics, and Er-doping. This unique follow-up features contributions from leading experts that cover the full spectrum of growth.