Author: Tongsan Xiao
Publisher:
ISBN:
Category : Laser-plasma interactions
Languages : en
Pages : 94
Book Description
Laser Induced Chemical Vapor Deposition in Synthesis of Ge-Se Thin Films
Author: Tongsan Xiao
Publisher:
ISBN:
Category : Laser-plasma interactions
Languages : en
Pages : 94
Book Description
Publisher:
ISBN:
Category : Laser-plasma interactions
Languages : en
Pages : 94
Book Description
Laser Induced Chemical Vapor Deposition of Thin Films
Author: Joseph Zahavi
Publisher:
ISBN:
Category :
Languages : en
Pages : 60
Book Description
This report results from a contract tasking Technion as follows: Investigate the characteristics of thin silicon nitride films deposited on substrates via the use of chemical laser deposition techniques. This report summarized the research activities during the first year of work as was planned in the proposal. It completes the information which was given in the previous two progress reports. Basically, the aim of the first year was to study the possibility of deposition of silicon nitride thin films from silane and ammonia at low temperatures. The investigation was carried out by studying the effect of substrate temperature on deposition rate and film quality. In addition, the photochemical reaction was studied by analyzing the composition of gas molecules prior and during laser irradiation. At the end of the first year it was also possible to start doing experiments for deposition of silicon carbide from silane and acetylene.
Publisher:
ISBN:
Category :
Languages : en
Pages : 60
Book Description
This report results from a contract tasking Technion as follows: Investigate the characteristics of thin silicon nitride films deposited on substrates via the use of chemical laser deposition techniques. This report summarized the research activities during the first year of work as was planned in the proposal. It completes the information which was given in the previous two progress reports. Basically, the aim of the first year was to study the possibility of deposition of silicon nitride thin films from silane and ammonia at low temperatures. The investigation was carried out by studying the effect of substrate temperature on deposition rate and film quality. In addition, the photochemical reaction was studied by analyzing the composition of gas molecules prior and during laser irradiation. At the end of the first year it was also possible to start doing experiments for deposition of silicon carbide from silane and acetylene.
Low Temperature Growth of Semiconductor Thin Films by Ultraviolet Laser Induced Chemical Vapor Deposition
Author: James Frederick Osmundsen
Publisher:
ISBN:
Category :
Languages : en
Pages : 146
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 146
Book Description
Film Synthesis and Growth Using Energetic Beams: Volume 388
Author: H. A. Atwater
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 472
Book Description
With over 16 countries represented, this book represents international developments in the field of film synthesis and growth using energetic beams. It focuses on pulsed-laser deposition. Fundamental issues pertaining to the generation of laser ablation plumes, temperature distributions and collisional effects are described. Ion-assisted pulsed-laser deposition, pulsed-ion deposition, applications of hyperthermal beams and aspects of surface dynamics are discussed. The inclusion of an ion beam with the ablation process leads to some unique modifications in the thin-film growth mechanisms, and hence, film properties. Likewise, the collision of high-mass metal cluster ions with substrates shows promise for growth of novel structures. Also featured are new developments of optoelectronic materials, nitrides and carbon films using a variety of techniques. The effects of beam-induced defects on growth and surface morphology, chemical effects during growth, and characterization of film growth and film properties are addressed.
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 472
Book Description
With over 16 countries represented, this book represents international developments in the field of film synthesis and growth using energetic beams. It focuses on pulsed-laser deposition. Fundamental issues pertaining to the generation of laser ablation plumes, temperature distributions and collisional effects are described. Ion-assisted pulsed-laser deposition, pulsed-ion deposition, applications of hyperthermal beams and aspects of surface dynamics are discussed. The inclusion of an ion beam with the ablation process leads to some unique modifications in the thin-film growth mechanisms, and hence, film properties. Likewise, the collision of high-mass metal cluster ions with substrates shows promise for growth of novel structures. Also featured are new developments of optoelectronic materials, nitrides and carbon films using a variety of techniques. The effects of beam-induced defects on growth and surface morphology, chemical effects during growth, and characterization of film growth and film properties are addressed.
Laser Surface Processing and Characterization
Author: I.W. Boyd
Publisher: Elsevier
ISBN: 0444596801
Category : Technology & Engineering
Languages : en
Pages : 552
Book Description
The contributions in this volume reflect not only the growing understanding of the underlying mechanisms controlling the various reactions in laser surface processing, but also the potential of several developing applications of direct processing. The most notable trend in the field currently is the technique of laser ablation, which is reported in almost a quarter of the papers in this volume. Whilst by no means a new phenomenon, attention has until recent years remained in the area of lithography and UV-sensitive materials. The growth in interest lies in the use of the technique to grow multi-component thin films and multi-layers. A number of papers on the topic of process diagnostics and in-situ measurements are also included. The theme of these annual meetings is centred around the physical and chemical modification of thin films and surfaces induced by the action of photon, ion, neutral, or electron beams in a variety of environments. Consequently these proceedings provide a comprehensive and unified presentation of the latest developments in this field.
Publisher: Elsevier
ISBN: 0444596801
Category : Technology & Engineering
Languages : en
Pages : 552
Book Description
The contributions in this volume reflect not only the growing understanding of the underlying mechanisms controlling the various reactions in laser surface processing, but also the potential of several developing applications of direct processing. The most notable trend in the field currently is the technique of laser ablation, which is reported in almost a quarter of the papers in this volume. Whilst by no means a new phenomenon, attention has until recent years remained in the area of lithography and UV-sensitive materials. The growth in interest lies in the use of the technique to grow multi-component thin films and multi-layers. A number of papers on the topic of process diagnostics and in-situ measurements are also included. The theme of these annual meetings is centred around the physical and chemical modification of thin films and surfaces induced by the action of photon, ion, neutral, or electron beams in a variety of environments. Consequently these proceedings provide a comprehensive and unified presentation of the latest developments in this field.
Synthesis of Thin Films in Boron-carbon-nitrogen Ternary System by Microwave Plasma Enhanced Chemical Vapor Deposition
Synthesis and Characterization of Precursors for Chemical Vapor Deposition of Metal Oxide Thin Films
Author: May Nyman
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 354
Book Description
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 354
Book Description
Nucleation and Growth of Silicon Thin Film Microstructures by Localized Laser Chemical Vapor Deposition
Author: David Edward Kotecki
Publisher:
ISBN:
Category :
Languages : en
Pages : 452
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 452
Book Description
Laser-induced Chemical Vapor Deposition of Silicon Nitride Films
Principles of Vapor Deposition of Thin Films
Author: Professor K.S. K.S Sree Harsha
Publisher: Elsevier
ISBN: 0080480314
Category : Technology & Engineering
Languages : en
Pages : 1173
Book Description
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
Publisher: Elsevier
ISBN: 0080480314
Category : Technology & Engineering
Languages : en
Pages : 1173
Book Description
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.