Laser-assisted Deposition and Etching for Semiconductor Processing PDF Download

Author: Michael L. Rubin
Publisher:
ISBN:
Category :
Languages : en
Pages : 184

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Book Description

Author: Thorsten Lill
Publisher: John Wiley & Sons
ISBN: 3527346686
Category : Technology & Engineering
Languages : en
Pages : 306

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Book Description
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.

Author: Ian W. Boyd
Publisher: Springer Science & Business Media
ISBN: 3642831362
Category : Science
Languages : en
Pages : 328

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Book Description
This text aims at providing a comprehensive and up to date treatment of the new and rapidly expanding field of laser pro cessing of thin films, particularly, though by no means exclu sively, of recent progress in the dielectrics area. The volume covers all the major aspects of laser processing technology in general, from the background and history to its many potential applications, and from the theory to the necessary experimental considerations. It highlights and compares the vast array of processing conditions now available with intense photon beams, as well as the properties of the films and microstructures pro duced. Separate chapters deal with the fundamentals of laser interactions with matter, and with experimental considerations. Detailed consideration is also given to film deposition, nuclea tion and growth, oxidation and annealing, as well as selective and localized. etching and ablation, not only in terms of the various photon-induced processes, but also with respect to traditional as well as other competing new technologies.

Author: Simeon M. Metev
Publisher: Springer Science & Business Media
ISBN: 3642973272
Category : Technology & Engineering
Languages : en
Pages : 283

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Book Description
Laser-Assisted Microtechnology deals with laser applications to a wide variety of problems in microelectronic design and fabrication. It covers micromachining of thin films, microprocessing of materials, maskless laser micropatterning and laser-assisted synthesis of thin-film systems. The monograph describes fundamental aspects and practical details of the technological processes as well as the optimum conditions for their realization.

Author: Susan D. Allen
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 154

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Book Description

Author: E. Fogarassy
Publisher: Elsevier
ISBN: 0444596682
Category : Science
Languages : en
Pages : 495

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Book Description
The papers in this volume cover all aspects of laser assisted surface processing ranging from the preparation of high-Tc superconducting layer structures to industrial laser applications for device fabrication. The topics presented give recent results in organometallic chemistry and laser photochemistry, and novel surface characterization techniques. The ability to control the surface morphology by digital deposition and etching shows one of the future directions for exciting applications of laser surface processing, some of which may apply UV and VUV excitation. The understanding of elementary proceses is essential for the design of novel deposition methods, with diamond CVD being an outstanding example. The high quality of these contributions once again demonstrates that the E-MRS is an efficient forum for interaction between research workers and industry.

Author: M. Brieger
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 394

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Book Description
Lasers are playing an increasingly important role in various fields of semiconductor and device technology. Of special significance is their contribution to the advanced technologies that are needed for economic solutions in photovoltaics. There, lasers are used in processing and characterization of photovoltaic materials, solar cells and module technology.

Author: Dieter Bäuerle
Publisher: Springer Science & Business Media
ISBN: 3662040743
Category : Science
Languages : en
Pages : 788

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Book Description
Laser Processing and Chemistry gives an overview of the fundamentals and applications of laser-matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas-solid, liquid-solid, and solid-solid interfaces. Starting with the background physics, the book proceeds to examine applications of laser techniques in micro-machining, and the patterning, coating, and modification of material surfaces. This third edition has been revised and enlarged to cover new topics such as the synthesis of nanoclusters and nanocrystalline films, ultrashort-pulse laser processing, laser polishing, cleaning, and lithography. Graduate students, physicists, chemists, engineers, and manufacturers alike will find this book an invaluable reference work on laser processing.

Author: A.J. van Roosmalen
Publisher: Springer Science & Business Media
ISBN: 148992566X
Category : Science
Languages : en
Pages : 247

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Book Description
This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.

Author: Kenichi Iga
Publisher: Springer Science & Business Media
ISBN: 3642795765
Category : Science
Languages : en
Pages : 181

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Book Description
A description of the design principles, seen mainly from the fabrication point of view. Following a review of the historical development and of the materials used in lasing at short to long wavelengths, the book goes on to discuss the basic design principles for semiconductor-laser devices and the epitaxy for laser production. One entire chapter is devoted to the technology of liquid-phase epitaxy, while another treats vapor-phase and beam epitaxies. The whole is rounded off with mode-control techniques and an introduction to surface-emitting lasers.