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Author: Pramod K. Naik Publisher: CRC Press ISBN: 0429995423 Category : Science Languages : en Pages : 261
Book Description
Vacuum plays an important role in science and technology. The study of interaction of charged particles, neutrals and radiation with each other and with solid surfaces requires a vacuum environment for reliable investigations. Vacuum has contributed to major advancements made in nuclear science, space, metallurgy, electrical/electronic technology, chemical engineering, transportation, robotics and many other fields. This book is intended to assist students, scientists, technicians and engineers with understanding the basics of vacuum science and technology for application in their projects. The fundamental theories, concepts, devices, applications, and key inventions are discussed.
Author: Pramod K. Naik Publisher: CRC Press ISBN: 0429995423 Category : Science Languages : en Pages : 261
Book Description
Vacuum plays an important role in science and technology. The study of interaction of charged particles, neutrals and radiation with each other and with solid surfaces requires a vacuum environment for reliable investigations. Vacuum has contributed to major advancements made in nuclear science, space, metallurgy, electrical/electronic technology, chemical engineering, transportation, robotics and many other fields. This book is intended to assist students, scientists, technicians and engineers with understanding the basics of vacuum science and technology for application in their projects. The fundamental theories, concepts, devices, applications, and key inventions are discussed.
Author: R. V. Stuart Publisher: Academic Press ISBN: 0323139159 Category : Technology & Engineering Languages : en Pages : 160
Book Description
Vacuum technology is advancing and expanding so rapidly that a major difficulty for most companies in the field is finding qualified technicians needed for expansion and as replacements. The only recourse for most companies is to hire capable, though untrained, people to train them in-house. One of the problems in this course of action is that it repeatedly draws on the valuable time of experienced personnel to explain fundamental concepts to a trainee. - Provides a variety of exercises in eac
Author: James M. Lafferty Publisher: Wiley-Interscience ISBN: 9780471175933 Category : Science Languages : en Pages : 0
Book Description
An indispensable resource for scientists and engineers concerned with high vacuum technology Vacuum technology has evolved significantly over the past thirty years and is now indispensable to various fields of scientific research as well as the medical technology, food processing, aerospace, and electronics industries. Foundations of Vacuum Science and Technology offers a comprehensive survey of the physical and chemical principles underlying the production, measurement, and use of high vacuums. It also provides a valuable critical survey of important developments that have occurred in the field over the past several decades. Comprising contributions from many of the world's leading specialists in vacuum techniques, Foundations of Vacuum Science and Technology: * Reviews the laws of kinetics, the principles of gas flow over a wide range of pressures, and the behaviors of both compressible and turbulent flows * Features exhaustive coverage of vacuum pump technology, including liquid ring pumps, dry pumps, turbo pumps, getter pumps, and cryo pumps * Describes leak detectors used in industry * Examines all types of pressure measurement techniques, including the latest quadrupole mass spectrometer techniques for partial pressure analysis * Explores the state of the art in calibration and standards.
Author: Vivek Bakshi Publisher: SPIE Press ISBN: 0819469645 Category : Art Languages : en Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: Stephen Pearton Publisher: Elsevier ISBN: 0128145226 Category : Technology & Engineering Languages : en Pages : 510
Book Description
Gallium Oxide: Technology, Devices and Applications discusses the wide bandgap semiconductor and its promising applications in power electronics, solar blind UV detectors, and in extreme environment electronics. It also covers the fundamental science of gallium oxide, providing an in-depth look at the most relevant properties of this materials system. High quality bulk Ga2O3 is now commercially available from several sources and n-type epi structures are also coming onto the market. As researchers are focused on creating new complex structures, the book addresses the latest processing and synthesis methods. Chapters are designed to give readers a complete picture of the Ga2O3 field and the area of devices based on Ga2O3, from their theoretical simulation, to fabrication and application. - Provides an overview of the advantages of the gallium oxide materials system, the advances in in bulk and epitaxial crystal growth, device design and processing - Reviews the most relevant applications, including photodetectors, FETs, FINFETs, MOSFETs, sensors, catalytic applications, and more - Addresses materials properties, including structural, mechanical, electrical, optical, surface and contact
Author: Donald M. Mattox Publisher: William Andrew ISBN: 0128130857 Category : Technology & Engineering Languages : en Pages : 383
Book Description
The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. - History and detailed descriptions of Vacuum Deposition Technologies - Review of Enabling Technologies and their importance to current applications - Extensively referenced text - Patents are referenced as part of the history - Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology - Glossary of Terms for vacuum coating
Author: Alexander Roth Publisher: Springer Science & Business Media ISBN: 9781563962592 Category : Science Languages : en Pages : 868
Book Description
Market: Scientists, engineers, and graduate students in vacuum technology. This volume presents numerous techniques developed in the early 1960s for the efficient construction of reliable vacuum seals, and provides critical insights into the design, construction, and assembly of vacuum systems. Extensively researched, this work covers a variety of sealing techniques and design concepts that remain as technologically relevant now as they were nearly three decades ago.
Author: Ram Gupta Publisher: Elsevier ISBN: 0323996604 Category : Technology & Engineering Languages : en Pages : 524
Book Description
Handbook of Advanced Ceramic Coatings: Fundamentals, Manufacturing and Classification introduces ceramic coating materials, methods of fabrication, characterizations, the interaction between fillers, reinforcers, and environmental impact, and the functional classification of ceramic coatings. The book is one of four volumes that together provide a comprehensive resource in the field of Advanced Ceramic Coatings, also including titles covering energy, biomedical and emerging applications. These books will be extremely useful for academic and industrial researchers and practicing engineers who need to find reliable and up-to-date information about recent progresses and new developments in the field of advanced ceramic coatings. Smart ceramic coatings containing multifunctional components are now finding application in transportation and automotive industries, in electronics, and energy sectors, in aerospace and defense, and in industrial goods and healthcare. Their wide application and stability in harsh environments are only possible due to the stability of the inorganic components used. Ceramic coatings are typically silicon nitride, chromia, hafnia, alumina, alumina-magnesia, silica, silicon carbide, titania, and zirconia-based compositions. The increased demand for these materials and their application in energy, transportation, and the automotive industry, are considered, to be the main drivers. - Comprehensively covers the production, characterization and properties of advanced ceramic coatings - Features the latest manufacturing processes - Covers basic principles of surface chemistry, along with the fundamentals of ceramic materials and engineering - Features the latest progress and recent technological developments - Discusses basic science relevant to both the materials and preparation methods
Author: Nicolas Posseme Publisher: Elsevier ISBN: 0081005903 Category : Technology & Engineering Languages : en Pages : 123
Book Description
This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions.This book focuses on back end of line (BEOL) for high performance device realization and presents an overview of all etch challenges for interconnect realization as well as the current etch solutions proposed in the semiconductor industry. The choice of copper/low-k interconnect architecture is one of the keys for integrated circuit performance, process manufacturability and scalability. Today, implementation of porous low-k material is mandatory in order to minimize signal propagation delay in interconnections. In this context, the traditional plasma process issues (plasma-induced damage, dimension and profile control, selectivity) and new emerging challenges (residue formation, dielectric wiggling) are critical points of research in order to control the reliability and reduce defects in interconnects. These issues and potential solutions are illustrated by the authors through different process architectures available in the semiconductor industry (metallic or organic hard mask strategies). - Presents the difficulties encountered for interconnect realization in very large-scale integrated (VLSI) circuits - Focused on plasma-dielectric surface interaction - Helps you further reduce the dielectric constant for the future technological nodes
Author: Pramod K. Naik
Author: Pramod K. Naik
Author: American Vacuum Society
Author: R. V. Stuart
Author: James M. Lafferty
Author: Vivek Bakshi
Author: Stephen Pearton
Author: Donald M. Mattox
Author: Alexander Roth
Author: Ram Gupta
Author: Nicolas Posseme