Author: B. R. AppletonPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 426
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Ion Beam Processes in Advanced Electronic Materials and Device Technology: Volume 45
Author: B. R. AppletonPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 426
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Energy Research Abstracts
Author: Scientific and Technical Aerospace Reports
Author: Advanced Materials and Processing
Author: Federal Coordinating Council for Science, Engineering, and Technology. Committee on Industry and TechnologyPublisher:
ISBN:
Category : Materials science
Languages : en
Pages : 228
Book Description
Advanced Materials and Processing
Author: Materials Processing by Cluster Ion Beams
Author: Isao YamadaPublisher: CRC Press
ISBN: 1498711766
Category : Science
Languages : en
Pages : 258
Book Description
Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing. Written by the originator of the gas cluster ion beam (GCIB) concept, this book:Offers an overview of ion beam technologies, f
Rapid Thermal Processing
Author: Richard B. FairPublisher: Academic Press
ISBN: 0323139809
Category : Technology & Engineering
Languages : en
Pages : 441
Book Description
This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
Ion Beam Processing of Materials and Deposition Processes of Protective Coatings
Author: P.L.F. HemmentPublisher: Newnes
ISBN: 0444596313
Category : Technology & Engineering
Languages : en
Pages : 630
Book Description
Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.
Surface Modeling Engineering
Author: Ram KossowskyPublisher: CRC Press
ISBN: 9780849347696
Category : Technology & Engineering
Languages : en
Pages : 348
Book Description
These volumes present the general parctitioners in engineering with a comprehensive discussion of technological surfaces, their interactions with environments, and the various modification techniques available to improve their performance. In each subject, applications to metals, ceramics, and polymers are emphasized. The interactions with the environment are described: corrosion (chemical), friction and waer (mechanical), and bioreactivity (physiological). Reviews of major modification schemes such as chemical vapor deposition, physical vapor deposition, laser beam interactions, chemical infusion, and ion implantation are presented. In summary, reviews of applications of the modification techniques to optimize the performances of structural components, tools, electronic devices, and implantable medical devices, manufactured out of metals, ceramic, and polymers, are described.
Proceedings of the Second International Symposium on Process Physics and Modeling in Semiconductor Technology
Author: G. R. SrinivasanPublisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 826
Book Description