In Situ Real-Time Characterization of Thin Films PDF Download

Author: Orlando Auciello
Publisher: John Wiley & Sons
ISBN: 9780471241416
Category : Science
Languages : en
Pages : 282

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Book Description
An in-depth look at the state of the art of in situ real-time monitoring and analysis of thin films With thin film deposition becoming increasingly critical in the production of advanced electronic and optical devices, scientists and engineers working in this area are looking for in situ, real-time, structure-specific analytical tools for characterizing phenomena occurring at surfaces and interfaces during thin film growth. This volume brings together contributed chapters from experts in the field, covering proven methods for in situ real-time analysis of technologically important materials such as multicomponent oxides in different environments. Background information and extensive references to the current literature are also provided. Readers will gain a thorough understanding of the growth processes and become acquainted with both emerging and more established methods that can be adapted for in situ characterization. Methods and their most useful applications include: * Low-energy time-of-flight ion scattering and direct recoil spectroscopy (TOF-ISRAS) for studying multicomponent oxide film growth processes * Reflection high-energy electron diffraction (RHEED) for determining the nature of chemical reactions at film surfaces * Spectrometric ellipsometry (SE) for use in the analysis of semiconductors and other multicomponent materials * Reflectance spectroscopy and transmission electron microscopy for monitoring epitaxial growth processes * X-ray fluorescence spectroscopy for studying surface and interface structures * And other cost-effective techniques for industrial application

Author: Gertjan Koster
Publisher: Elsevier
ISBN: 0857094955
Category : Technology & Engineering
Languages : en
Pages : 295

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Book Description
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. - Chapters review electron diffraction techniques, including the methodology for observations and measurements - Discusses the principles and applications of photoemission techniques - Examines alternative in situ characterisation techniques

Author: Daniel Abou-Ras
Publisher: John Wiley & Sons
ISBN: 3527699015
Category : Science
Languages : de
Pages : 760

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Book Description
The book focuses on advanced characterization methods for thin-film solar cells that have proven their relevance both for academic and corporate photovoltaic research and development. After an introduction to thin-film photovoltaics, highly experienced experts report on device and materials characterization methods such as electroluminescence analysis, capacitance spectroscopy, and various microscopy methods. In the final part of the book simulation techniques are presented which are used for ab-initio calculations of relevant semiconductors and for device simulations in 1D, 2D and 3D. Building on a proven concept, this new edition also covers thermography, transient optoelectronic methods, and absorption and photocurrent spectroscopy.

Author: Alexander Ziegler
Publisher: Springer Science & Business Media
ISBN: 3642451527
Category : Science
Languages : en
Pages : 265

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Book Description
The behavior of nanoscale materials can change rapidly with time either because the environment changes rapidly or because the influence of the environment propagates quickly across the intrinsically small dimensions of nanoscale materials. Extremely fast time resolution studies using X-rays, electrons and neutrons are of very high interest to many researchers and is a fast-evolving and interesting field for the study of dynamic processes. Therefore, in situ structural characterization and measurements of structure-property relationships covering several decades of length and time scales (from atoms to millimeters and femtoseconds to hours) with high spatial and temporal resolutions are crucially important to understand the synthesis and behavior of multidimensional materials. The techniques described in this book will permit access to the real-time dynamics of materials, surface processes and chemical and biological reactions at various time scales. This book provides an interdisciplinary reference for research using in situ techniques to capture the real-time structural and property responses of materials to surrounding fields using electron, optical and x-ray microscopies (e.g. scanning, transmission and low-energy electron microscopy and scanning probe microscopy) or in the scattering realm with x-ray, neutron and electron diffraction.

Author: Hiroyuki Fujiwara
Publisher: John Wiley & Sons
ISBN: 9780470060186
Category : Technology & Engineering
Languages : en
Pages : 388

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Book Description
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.

Author: Harland G. Tompkins
Publisher: Momentum Press
ISBN: 1606507281
Category : Technology & Engineering
Languages : en
Pages : 138

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Book Description
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.

Author: V. Alexander Stefan
Publisher: Stefan University Press
ISBN: 1889545287
Category : Ferroelectric crystals
Languages : en
Pages : 218

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Book Description
CONTENTS Preface, XI List of Contributors, XIII Part I. REPORTS. Materials Parameters Determining the Performance of 3-3 Piezocomposites C.R. Bowen, A. Perry, R. Stevens, and S. Mahon.............................................. 3 Dielectric Permittivity and Hysteresis of PZT Aerogels Stefan Geis, Jochen Fricke................................................................................ 23 Superfine Anomalies of the Cubic-Tetragonal Transition in the Perovskite-Type Ferroelectrics Detected by “mk-stabilized cell” Akira Kojima, Yukio Yoshimura, Hiroshi Iwasaki, and Ken-ichi Tozaki.......................................................................................... 33 NMR Study on m3h(seo4)2 (m: k, rb) Yasumitsu Matsuo, Keisuke Takahashi, and Seiichiro Ikehata............................. 51 Photovoltaic Effect in Pb(Zr,Ti)O3 (PZT)-Based Ceramics and Development for Photostrictor Application Kazuhiro Nonaka, Morito Akiyama, Chao-Nan Xu, Tsuyoshi Hagio, and Akira Takase.................................................................... 65 Novel Electronic Phase Transition in ii-vi Ferroelectric Semiconductor znO A. Onodera and H. Satoh................................................................................. 93 Brillouin Scattering Study of Structural Phase Transition in the kno3 Crystal Yasunari Takagi............................................................................................... 113 New Technologies for Future FeRAMs K. Uchiyama, M. Kazumura, Y. Shimada, T. Otsuki, N. Solayappan, V. Joshi, and C.A. Paz de Araujo............................................... 125 NANOCRYSTALLINE PEROVSKITE FILMS: FERROELECTRICS AND RELAXORS C. Ziebert, J.K. Krüger, H. Schmitt, A. Sternberg K.-H. Ehses, M. Marx................................................................................... 135 Part II. BRIEF REPORTS Studies of Ferroelectric Thin Film and Film-Based Device Processes via In Situ Analytic Techniques O. Auciello, S.K. Streiffer, G.B. Stephenson, J.A. Eastman, G. Bai, A.R. Krauss, J. Im, A.M. Dhote, C. Thompson, E.A. Irene, Y. Gao, A.H. Muller, M.J. Bedzyk, A. Kazimirov, D. Marasco, V.P. Dravid, A. Gruverman, S. Aggarwal, R. Ramesh, S.-H. Kim, A.I. Kingon, and C.B. Eom.................................................................................................. 155 The Spherical Random Bond – Random Field Model of Relaxor Ferroelectrics: Theory and Experiments R. Blinc, R. Pirc, B. Zalar, and A. Gregorovic.................................................... 159 Stabilization of Ferroelectricity in Quantum Paraelectrics by Isotopic Substitution A. Bussmann-Holder, H. Buttner, and A.R. Bishop............................................ 165 New Understanding of the Phases Transition Mechanism of Hydrogen-Bonded Ferroelectrics A. Bussmann-Holder, Naresh Dalal, Riqiang Fu, and Ricardo Migoni................... 167 Two Dimensional Ferroelectrics V.M. Fridkin, L.M. Blinov, S.P. Palto, S.G. Yudin, S. Ducharme, P.A. Dowben, and A.V. Bune.......................................................................... 169 Ferroelastic Twinning in Some Extremely Plastic Crystals Lyubov Kirpichnikova....................................................................................... 171 Investigation of the Anisotropy of srbi2ta2o9 and srbi2nb2o9 Through Epitaxial Growth J. Lettieri, M.A. Zurbuchen, Y. Jia, D.G. Schlom, S.K. Streiffer, and M.E. Hawley............................................................................................. 173 New Ideas in Relaxor Theory R.F. Mamin..................................................................................................... 179 Evaluation of Ferroelectric Domains in Lead Zirconate Titanate Ceramics by Poling Fields Toshio Ogawa.................................................................................................. 181 Metal-Organic Chemical Vapor Deposited Ceramic Thin Films for Future Memory Applications M. Schumacher, J. Lindner, F. Schienle, D. Burgess, P. Strzyzewski, M. Dauelsberg, E. Merz, and H. Juergensen............................... 185 Dynamic and Static Aspects of the Antiferroelectric Phase Transition in rb3h1-xdx(so4)2 Crystals: An 87rb-nmr Study Andreas Titze and Roland Boehmer.................................................................. 187 Key Word Index………………………………………………………………………. 189 Contents of FERROELECTRICS.Vol.2. Frontier in Science and Technology Series. List of Titles. FSRC BOOKS of ABSTRACTS in Science and Technology Conference Series. List of Titles. F S R C. A Brief Info.

Author: Irving P. Herman
Publisher: Elsevier
ISBN: 0080538088
Category : Technology & Engineering
Languages : en
Pages : 815

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Book Description
This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. - The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing - Useful as an introduction to the subject or as a resource handbook - Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing - Examples emphasize applications in microelectronics and optoelectronics - Introductory chapter serves as a guide to all optical diagnostics and their applications - Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic

Author: Harland Tompkins
Publisher: William Andrew
ISBN: 0815517475
Category : Science
Languages : en
Pages : 887

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Book Description
The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.

Author: Hari Singh Nalwa
Publisher: Elsevier
ISBN: 0080533248
Category : Technology & Engineering
Languages : en
Pages : 3436

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Book Description
This five-volume handbook focuses on processing techniques, characterization methods, and physical properties of thin films (thin layers of insulating, conducting, or semiconductor material). The editor has composed five separate, thematic volumes on thin films of metals, semimetals, glasses, ceramics, alloys, organics, diamonds, graphites, porous materials, noncrystalline solids, supramolecules, polymers, copolymers, biopolymers, composites, blends, activated carbons, intermetallics, chalcogenides, dyes, pigments, nanostructured materials, biomaterials, inorganic/polymer composites, organoceramics, metallocenes, disordered systems, liquid crystals, quasicrystals, and layered structures.Thin films is a field of the utmost importance in today's materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices.Advanced, high-performance computers, high-definition TV, digital camcorders, sensitive broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are but a few examples of miniaturized device technologies that depend the utilization of thin film materials. The Handbook of Thin Films Materials is a comprehensive reference focusing on processing techniques, characterization methods, and physical properties of these thin film materials.