Author: Joel Thornton IrbyPublisher:
ISBN:
Category : Silicon
Languages : en
Pages : 118
Book Description
In situ B-doped Si epitaxial films grown by remote plasma-enhanced chemical vapor deposition
Author: Joel Thornton IrbyPublisher:
ISBN:
Category : Silicon
Languages : en
Pages : 118
Book Description
In situ P-doped epitaxial films grown by remote plasma-enhanced chemical vapor deposition
Author: Sunil ThomasPublisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 158
Book Description
Improving the electrical properties of in situ doped silicon films grown by remote plasma-enhanced chemical vapor deposition
Author: Pablo MunguiaMicrostructural characterization of epitaxial silicon films grown by remote plasma-enhanced chemical vapor deposition
Author: Ting-Chen HsuPublisher:
ISBN:
Category : Microstructure
Languages : en
Pages : 230
Book Description
Crystallographic and electrical characterization of epitaxial GE[subscript x]Si[subscript 1-x]/Si and in-situ doped films grown by remote plasma chemical vapor deposition
![Crystallographic and electrical characterization of epitaxial GE[subscript x]Si[subscript 1-x]/Si and in-situ doped films grown by remote plasma chemical vapor deposition PDF](https://books.google.com/books/content/images/frontcover/MpbKpwAACAAJ?fife=w80-h100)
Author: Rong-Zhen QianPublisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 396
Book Description
Characterization of the electrical properties of epitaxial silicon films grown by remote plasma-enhanced chemical vapor deposition
Author: Rajan SharmaChemical vapor deposition growth
Author: United States. Department of EnergyPublisher:
ISBN:
Category : Silicon
Languages : en
Pages : 260
Book Description
Plasma Enhanced Chemical Vapor Deposition of In-situ Doped Epitaxial Silicon from Silane at Low Temperatures
Author: James Hartfiel ComfortPublisher:
ISBN:
Category :
Languages : en
Pages : 352
Book Description
Characterization and reduction of defects in epitaxial Si and Si[subscript 1-x] Ge[subscript x]/Si films grown by remote plasma-enhanced chemical vapor deposition
![Characterization and reduction of defects in epitaxial Si and Si[subscript 1-x] Ge[subscript x]/Si films grown by remote plasma-enhanced chemical vapor deposition PDF](https://books.google.com/books/content/images/frontcover/aJTVpwAACAAJ?fife=w80-h100)
Author: David Stephen KinoskyPublisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 244
Book Description
Masters Theses in the Pure and Applied Sciences
Author: Wade H. ShaferPublisher: Springer Science & Business Media
ISBN: 1461524539
Category : Science
Languages : en
Pages : 391
Book Description
Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS)* at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dis semination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the though that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all concerned if the printing and distribution of the volumes were handled by an international publishing house to assure improved service and broader dissemi nation. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Corporation of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 37 (thesis year 1992) a total of 12,549 thesis titles from 25 Canadian and 153 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this impor tant annual reference work. While Volume 37 reports theses submitted in 1992, on occasion, certain uni versities do report theses submitted in previous years but not reported at the time.