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High Pressure in Semiconductor Physics II

High Pressure in Semiconductor Physics II PDF Author:
Publisher: Academic Press
ISBN: 9780127521633
Category : Science
Languages : en
Pages : 461

Book Description
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The "Willardson and Beer" Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise indeed that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry. Volumes 54 and 55 present contributions by leading researchers in the field of high pressure semiconductors. Edited by T. Suski and W. Paul, these volumes continue the tradition of well-known but outdated publications such as Brigman's The Physics of High Pressure (1931 and 1949) and High Pressure Physics and Chemistry edited by Bradley. Volumes 54 and 55 reflect the industrially important recent developments in research and applications of semiconductor properties and behavior under desirable risk-free conditions at high pressures. These developments include the advent of the diamond anvil cell technique and the availability of commercial piston–cylinder apparatus operating at high hydrostatic pressures. These much-needed books will be useful to both researchers and practitioners in applied physics, materials science, and engineering.

High Pressure in Semiconductor Physics II

High Pressure in Semiconductor Physics II PDF Author:
Publisher: Academic Press
ISBN: 9780127521633
Category : Science
Languages : en
Pages : 461

Book Description
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The "Willardson and Beer" Series, as it is widely known, has succeeded in publishing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise indeed that this tradition will be maintained and even expanded. Reflecting the truly interdisciplinary nature of the field that the series covers, the volumes in Semiconductors and Semimetals have been and will continue to be of great interest to physicists, chemists, materials scientists, and device engineers in modern industry. Volumes 54 and 55 present contributions by leading researchers in the field of high pressure semiconductors. Edited by T. Suski and W. Paul, these volumes continue the tradition of well-known but outdated publications such as Brigman's The Physics of High Pressure (1931 and 1949) and High Pressure Physics and Chemistry edited by Bradley. Volumes 54 and 55 reflect the industrially important recent developments in research and applications of semiconductor properties and behavior under desirable risk-free conditions at high pressures. These developments include the advent of the diamond anvil cell technique and the availability of commercial piston–cylinder apparatus operating at high hydrostatic pressures. These much-needed books will be useful to both researchers and practitioners in applied physics, materials science, and engineering.

High Pressure Food Science, Bioscience and Chemistry

High Pressure Food Science, Bioscience and Chemistry PDF Author: N S Isaacs
Publisher: Elsevier
ISBN: 1845698371
Category : Technology & Engineering
Languages : en
Pages : 525

Book Description
The application of high pressures to serve scientific ends is an ever-growing area of research. With sections on chemistry, food science, biochemistry and physics, this book contains a variety of original work.

Semiconductors and Semimetals

Semiconductors and Semimetals PDF Author:
Publisher: Academic Press
ISBN: 0080863906
Category : Technology & Engineering
Languages : en
Pages : 513

Book Description
Semiconductors and Semimetals

Ultrahigh-pressure Mineralogy

Ultrahigh-pressure Mineralogy PDF Author: Russell Julian Hemley
Publisher: de Gruyter
ISBN:
Category : Science
Languages : en
Pages : 700

Book Description
Volume 37 of Reviews in Mineralogy moves from the complexity of rocks to their mineral components and finally to fundamental properties arising directly from the play of electrons and nuclei. This volume was prepared for a short course by the same t

High-Pressure Chemistry and Physics of Polymers

High-Pressure Chemistry and Physics of Polymers PDF Author: A.L. Kovarskii
Publisher: CRC Press
ISBN: 9780849342394
Category : Technology & Engineering
Languages : en
Pages : 446

Book Description
High-Pressure Chemistry and Physics of Polymers is devoted to covering all areas of high-pressure polymer materials science. Topics addressed include the synthesis of polymers, changes in reactivity, structural transformations, molecular dynamics, relaxation processes, deformational properties, chemical modification, and the effect of shock waves and shear stresses. The authors' contributions reflect over 60 years of Soviet study in the field of physico-chemistry conducted at the major former Soviet Institutes of Chemical Physics, Organic Chemistry, Polymer Chemistry, and Physical Chemistry. Fundamental topics such as compressibility of polymers, polymerization under pressure, viscoelastic/deformational properties, and polymer modification are discussed with an eye toward materials development for improving physical models and methods of calculating the changing parameters of materials under pressure. The book is a valuable reference to data on mechanisms of physical and chemical processes, in addition to new experimental data for improving physical models and methods of calculating changes in material characteristics under compression loads. High-Pressure Chemistry and Physics of Polymers will be an important reference for graduate students and practicing professionals in polymer chemistry and polymeric materials.

High-Temperature and High Pressure Crystal Chemistry

High-Temperature and High Pressure Crystal Chemistry PDF Author: Robert M. Hazen
Publisher: Walter de Gruyter GmbH & Co KG
ISBN: 1501508709
Category : Science
Languages : en
Pages : 604

Book Description
Volume 41 of Reviews in Mineralogy and Geochemistry introduces to the field of high-temperature and high-pressure crystal chemistry, both as a guide to the dramatically improved techniques and as a summary of the voluminous crystal chemical literature on minerals at high temperature and pressure. The three parts of the book introduces crystal chemical considerations of special relevance to non-ambient crystallographic studies, reviews the temperature- and pressure-variation of structures in major mineral groups and presents experimental techniques for high-temperature and high-pressure studies of single crystals and polycrystalline samples as well as special considerations relating to diffractometry on samples at non-ambient conditions.

An Introduction to High-Pressure Science and Technology

An Introduction to High-Pressure Science and Technology PDF Author: Jose Manuel Recio
Publisher: CRC Press
ISBN: 1498736238
Category : Science
Languages : en
Pages : 514

Book Description
An Introduction to High-Pressure Science and Technology provides you with an understanding of the connections between the different areas involved in the multidisciplinary science of high pressure. The book reflects the deep interdisciplinary nature of the field and its close relationship with industrial applications.Thirty-nine specialists in high

Supercritical and Other High-pressure Solvent Systems

Supercritical and Other High-pressure Solvent Systems PDF Author: Andrew J Hunt
Publisher: Royal Society of Chemistry
ISBN: 1788015185
Category : Technology & Engineering
Languages : en
Pages : 700

Book Description
Exploring the range and utility of high-pressure solvent systems across a variety of different chemical applications, this book brings together recent advances in supercritical technology and other pressurised-solvent systems. It provides an in-depth overview of the latest advances and developments and discusses the limitations and drawbacks that need to be addressed. Wherever possible, the greenness and economic viability of the different solvent systems is highlighted. This book is ideal for researchers and industrialists working in environmental science, green chemistry and biorefineries.

High Pressure Technology

High Pressure Technology PDF Author: Spain
Publisher: CRC Press
ISBN: 9780824765910
Category : Science
Languages : en
Pages : 564

Book Description
High pressure technology is used so extensively that it is almost impossible to catalogue the manyways in which our lives are enhanced by it. From pneumatic tires and household water supplies tomaterials such as crystals, plastics, and even synthetic diamond, there are countless materialsfabricated or shaped using high pressure technology. High Pressure Technology (in two volumes)presents the most up-to-date information available on the main features of this broad technology andthe processes which utilize it.Volume I: Equipment Design, Materials, and Properties covers three broad areas: the general operationof high pressure systems, including standard operating procedures and safety codes and measures;the technology of high pressure systems, such as components, vessel design, and materials of construction;and applied science at high pressure, including the properties of fluids and solids andmechanical properties. Volume II: Applications and Processes covers processes at high pressure andencompasses such topics as: catalytic chemical synthesis; polymerization; phase changes; criticalphenomena; liquefaction of gases; synthesis of single-crystal materials, diamond, and superhardmaterials; isostatic compacting; isostatic hot-pressing; hydrostatic forming of metals; hydraulic cutting;and applications of shock techniques.Written by recognized authorities in industry, government laboratories, and universities, High PressureTechnology is essential reading for the industrial practitioner, high pressure engineer, and researchscientist. In addition, it is a valuable textbook for students in mechanical, chemical, and materialsengineering courses.

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 PDF Author: B.E. Deal
Publisher: Springer Science & Business Media
ISBN: 1489915885
Category : Science
Languages : en
Pages : 505

Book Description
The first international symposium on the subject "The Physics and Chemistry of Si02 and the Si-Si02 Interface," organized in association with the Electrochemical Society, Inc. , was held in Atlanta, Georgia on May 15- 20, 1988. This symposium contained sixty papers and was so successful that the sponsoring divisions decided to schedule it on a regular basis every four years. Thus, the second symposium on "The Physics and Chemistry of Si02 and the Si02 Interface was held May 18-21, 1992 in St. Louis, Missouri, again sponsored by the Electronics and Dielectrics Science and Technology Divisions of The Electrochemical Society. This volume contains manuscripts of most of the fifty nine papers presented at the 1992 symposium, and is divided into eight chapters - approximating the organization of the symposium. Each chapter is preceded with an introduction by the session organizers. It is appropriate to provide a general assessment of the current status and understanding of the physics and chemistry of Si02 and the Si02 interface before proceeding with a brief overview of the individual chapters. Semiconductor devices have continued to scale down in both horizontal and vertical dimensions. This has resulted in thinner gate and field oxides as well as much closer spacing of individual device features. As a result, surface condition, native oxide composition, and cleaning and impurity effects now provide a much more significant contribution to the properties of oxides and their interfaces.