Author: G. McGuire
Publisher: Springer Science & Business Media
ISBN: 1475717024
Category : Science
Languages : en
Pages : 144
Book Description
Auger electron spectroscopy (AES) is based on the Auger total secondary electron energy distribution, and an ion gun to process, which involves the core-level ionization of an atom with provide depth profiling capability. subsequent deexcitation occurring by an outer-level electron de The high surface sensitivity of Auger spectroscopy which dictates caying to fill the core hole. The excess energy is transferred to the need for an ultrahigh-vacuum system is due to the limited and causes the ejection of another electron, which is by definition mean free path of electrons in the 0-3000 e V kinetic energy an Auger electron. The Auger electron transition, denoted by range. The Auger peaks decay exponentially with overlayer cov the electron levels involved, is independent of the excitation erage, which is consistent with an exponential dependence of source and leaves the atom with a constant kinetic energy. The escape probability on the depth of the parent atom. A compila kinetic energy is given by the differences in binding energies for tion of data from a variety of sources has been used to generate the three levels (for example, EK-E L, - EL ) minus a correction 2 an escape depth curve which falls in the range of 5-30 A in the term for the work function and electron wave function relaxation. energy range from 0 to 3000 eV. The observed escape depth does When the Auger transition occurs within a few angstroms of the not show a strong dependence on the matrix.
Auger Electron Spectroscopy Reference Manual
Author: G. McGuire
Publisher: Springer Science & Business Media
ISBN: 1475717024
Category : Science
Languages : en
Pages : 144
Book Description
Auger electron spectroscopy (AES) is based on the Auger total secondary electron energy distribution, and an ion gun to process, which involves the core-level ionization of an atom with provide depth profiling capability. subsequent deexcitation occurring by an outer-level electron de The high surface sensitivity of Auger spectroscopy which dictates caying to fill the core hole. The excess energy is transferred to the need for an ultrahigh-vacuum system is due to the limited and causes the ejection of another electron, which is by definition mean free path of electrons in the 0-3000 e V kinetic energy an Auger electron. The Auger electron transition, denoted by range. The Auger peaks decay exponentially with overlayer cov the electron levels involved, is independent of the excitation erage, which is consistent with an exponential dependence of source and leaves the atom with a constant kinetic energy. The escape probability on the depth of the parent atom. A compila kinetic energy is given by the differences in binding energies for tion of data from a variety of sources has been used to generate the three levels (for example, EK-E L, - EL ) minus a correction 2 an escape depth curve which falls in the range of 5-30 A in the term for the work function and electron wave function relaxation. energy range from 0 to 3000 eV. The observed escape depth does When the Auger transition occurs within a few angstroms of the not show a strong dependence on the matrix.
Publisher: Springer Science & Business Media
ISBN: 1475717024
Category : Science
Languages : en
Pages : 144
Book Description
Auger electron spectroscopy (AES) is based on the Auger total secondary electron energy distribution, and an ion gun to process, which involves the core-level ionization of an atom with provide depth profiling capability. subsequent deexcitation occurring by an outer-level electron de The high surface sensitivity of Auger spectroscopy which dictates caying to fill the core hole. The excess energy is transferred to the need for an ultrahigh-vacuum system is due to the limited and causes the ejection of another electron, which is by definition mean free path of electrons in the 0-3000 e V kinetic energy an Auger electron. The Auger electron transition, denoted by range. The Auger peaks decay exponentially with overlayer cov the electron levels involved, is independent of the excitation erage, which is consistent with an exponential dependence of source and leaves the atom with a constant kinetic energy. The escape probability on the depth of the parent atom. A compila kinetic energy is given by the differences in binding energies for tion of data from a variety of sources has been used to generate the three levels (for example, EK-E L, - EL ) minus a correction 2 an escape depth curve which falls in the range of 5-30 A in the term for the work function and electron wave function relaxation. energy range from 0 to 3000 eV. The observed escape depth does When the Auger transition occurs within a few angstroms of the not show a strong dependence on the matrix.
Handbook of Auger Electron Spectroscopy
Author: Kenton D. Childs
Publisher:
ISBN: 9780964812406
Category : Science
Languages : en
Pages : 405
Book Description
Publisher:
ISBN: 9780964812406
Category : Science
Languages : en
Pages : 405
Book Description
Auger- and X-Ray Photoelectron Spectroscopy in Materials Science
Author: Siegfried Hofmann
Publisher: Springer Science & Business Media
ISBN: 3642273807
Category : Science
Languages : en
Pages : 544
Book Description
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Publisher: Springer Science & Business Media
ISBN: 3642273807
Category : Science
Languages : en
Pages : 544
Book Description
To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
Handbook of Monochromatic XPS Spectra
Author: B. Vincent Crist
Publisher: John Wiley & Sons
ISBN: 0471492655
Category : Science
Languages : de
Pages : 562
Book Description
These three volumes provide comprehensive information about the instrument, the samples, and the methods used to collect the spectra. The spectra are presented on a landscape format and cover a wide variety of elements,polymers, semiconductors, and other materials. Offers a clear presentation of spectra with the rightamount of experimental detail. All of the experiments have been conducted under controlled conditions on the same instrument by aworld-renowned expert.
Publisher: John Wiley & Sons
ISBN: 0471492655
Category : Science
Languages : de
Pages : 562
Book Description
These three volumes provide comprehensive information about the instrument, the samples, and the methods used to collect the spectra. The spectra are presented on a landscape format and cover a wide variety of elements,polymers, semiconductors, and other materials. Offers a clear presentation of spectra with the rightamount of experimental detail. All of the experiments have been conducted under controlled conditions on the same instrument by aworld-renowned expert.
An Introduction to Surface Analysis by XPS and AES
Author: John F. Watts
Publisher: John Wiley & Sons
ISBN: 1119417643
Category : Technology & Engineering
Languages : en
Pages : 320
Book Description
Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
Publisher: John Wiley & Sons
ISBN: 1119417643
Category : Technology & Engineering
Languages : en
Pages : 320
Book Description
Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.
Handbook of X-Ray Data
Author: GĂĽnter H. Zschornack
Publisher: Springer Science & Business Media
ISBN: 3540286187
Category : Technology & Engineering
Languages : en
Pages : 969
Book Description
This is the only handbook available on X-ray data. In a concise and informative manner, the most important data connected with the emission of characteristic X-ray lines are tabulated for all elements up to Z = 95 (Americium). The tabulated data are characterized and, in most cases, evaluated. Furthermore, all important processes and phenomena connected with the production, emission and detection of characteristic X-rays are discussed.
Publisher: Springer Science & Business Media
ISBN: 3540286187
Category : Technology & Engineering
Languages : en
Pages : 969
Book Description
This is the only handbook available on X-ray data. In a concise and informative manner, the most important data connected with the emission of characteristic X-ray lines are tabulated for all elements up to Z = 95 (Americium). The tabulated data are characterized and, in most cases, evaluated. Furthermore, all important processes and phenomena connected with the production, emission and detection of characteristic X-rays are discussed.
Surface Analysis by Auger and X-ray Photoelectron Spectroscopy
Author: David Briggs
Publisher: Im Publications
ISBN: 9781901019049
Category : Electron spectroscopy
Languages : en
Pages : 899
Book Description
Publisher: Im Publications
ISBN: 9781901019049
Category : Electron spectroscopy
Languages : en
Pages : 899
Book Description
Scanning Auger Electron Microscopy
Author: Martin Prutton
Publisher: John Wiley & Sons
ISBN: 0470866780
Category : Technology & Engineering
Languages : en
Pages : 384
Book Description
This eagerly-awaited volume has been edited by two academic researchers with extensive and reputable experience in this field. Emphasis is given to the underlying science of the method of Auger microscopy, and its instrumental realization, the visualization and interpretation of the data in the sets of the images that form the output of the measurements and the methods used to quantify the images. Imaging artefacts in Auger microscopy and methods to correct them are also detailed. The authors describe the technique of Multi-Spectral Auger Microscopy (MULSAM) and demonstrate its advantages in mapping complex multi-component surfaces. The book concludes with an outlook for the future of Auger microscopy.
Publisher: John Wiley & Sons
ISBN: 0470866780
Category : Technology & Engineering
Languages : en
Pages : 384
Book Description
This eagerly-awaited volume has been edited by two academic researchers with extensive and reputable experience in this field. Emphasis is given to the underlying science of the method of Auger microscopy, and its instrumental realization, the visualization and interpretation of the data in the sets of the images that form the output of the measurements and the methods used to quantify the images. Imaging artefacts in Auger microscopy and methods to correct them are also detailed. The authors describe the technique of Multi-Spectral Auger Microscopy (MULSAM) and demonstrate its advantages in mapping complex multi-component surfaces. The book concludes with an outlook for the future of Auger microscopy.
Handbook of Auger Electron Spectroscopy
Practical Guide to Surface Science and Spectroscopy
Author: Yip-Wah Chung
Publisher: Elsevier
ISBN: 0080497780
Category : Science
Languages : en
Pages : 201
Book Description
Practical Guide to Surface Science and Spectroscopy provides a practical introduction to surface science as well as describes the basic analytical techniques that researchers use to understand what occurs at the surfaces of materials and at their interfaces. These techniques include auger electron spectroscopy, photoelectron spectroscopy, inelastic scattering of electrons and ions, low energy electron diffraction, scanning probe microscopy, and interfacial segregation. Understanding the behavior of materials at their surfaces is essential for materials scientists and engineers as they design and fabricate microelectronics and semiconductor devices. The book gives over 100 examples, discussion questions and problems with varying levels of difficulty. Included with this book is a CD-ROM, which not only contains the same information, but also provides many elements of animation and interaction that are not easily emulated on paper. In diverse subject matters ranging from the operation of ion pumps, computer-assisted data acquisition to tapping mode atomic force microscopy, the interactive component is especially helpful in conveying difficult concepts and retention of important information. The succinct style and organization of this practical guide is ideal for anyone who wants to get up to speed on a given topic in surface spectroscopy or phenomenon within a reasonable amount of time. - Both theory and practice are emphasized - Logical organization allows one to get up to speed on any given topic quickly - Numerous examples, questions for discussion and practice problems are included - The CD includes animation and interactive elements that help to convey difficult concepts
Publisher: Elsevier
ISBN: 0080497780
Category : Science
Languages : en
Pages : 201
Book Description
Practical Guide to Surface Science and Spectroscopy provides a practical introduction to surface science as well as describes the basic analytical techniques that researchers use to understand what occurs at the surfaces of materials and at their interfaces. These techniques include auger electron spectroscopy, photoelectron spectroscopy, inelastic scattering of electrons and ions, low energy electron diffraction, scanning probe microscopy, and interfacial segregation. Understanding the behavior of materials at their surfaces is essential for materials scientists and engineers as they design and fabricate microelectronics and semiconductor devices. The book gives over 100 examples, discussion questions and problems with varying levels of difficulty. Included with this book is a CD-ROM, which not only contains the same information, but also provides many elements of animation and interaction that are not easily emulated on paper. In diverse subject matters ranging from the operation of ion pumps, computer-assisted data acquisition to tapping mode atomic force microscopy, the interactive component is especially helpful in conveying difficult concepts and retention of important information. The succinct style and organization of this practical guide is ideal for anyone who wants to get up to speed on a given topic in surface spectroscopy or phenomenon within a reasonable amount of time. - Both theory and practice are emphasized - Logical organization allows one to get up to speed on any given topic quickly - Numerous examples, questions for discussion and practice problems are included - The CD includes animation and interactive elements that help to convey difficult concepts