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Growth and Characterization of Large High Purity Beta Silicon Carbide Single Crystals

Growth and Characterization of Large High Purity Beta Silicon Carbide Single Crystals PDF Author: William R. Harding
Publisher:
ISBN:
Category :
Languages : en
Pages : 112

Book Description
The report summarizes the development program in the growth of large high purity beta silicon carbide crystals. Conditions for stable beta growth were partially established. Beta silicon carbide can be grown in the region of 2000-2200C and 28-42 microns pressure. Within this region, large beta crystals will grow by sublimation. Lang topographs of crystals were compared with etched surface structures and petrographic examination. Correlation among the results of these techniques was shown to exist. This analysis indicated the presence of large stacking faults within the structure as well as polytype intergrowths. Resistivity and Hall measurements were made with indications of highly compensated material. (Author).

Growth and Characterization of Large High Purity Beta Silicon Carbide Single Crystals

Growth and Characterization of Large High Purity Beta Silicon Carbide Single Crystals PDF Author: William R. Harding
Publisher:
ISBN:
Category :
Languages : en
Pages : 112

Book Description
The report summarizes the development program in the growth of large high purity beta silicon carbide crystals. Conditions for stable beta growth were partially established. Beta silicon carbide can be grown in the region of 2000-2200C and 28-42 microns pressure. Within this region, large beta crystals will grow by sublimation. Lang topographs of crystals were compared with etched surface structures and petrographic examination. Correlation among the results of these techniques was shown to exist. This analysis indicated the presence of large stacking faults within the structure as well as polytype intergrowths. Resistivity and Hall measurements were made with indications of highly compensated material. (Author).

Growth and Characterization of Beta-silicon Carbide Single Crystals

Growth and Characterization of Beta-silicon Carbide Single Crystals PDF Author: Frank A. Halden
Publisher:
ISBN:
Category :
Languages : en
Pages : 25

Book Description
Changes in crystal size and morphology were obtained by modifying the process for growing crystals of betasilicon carbide from solution in carbon-saturated melts. Well developed laths and plates were grown under conditions favoring dendritic growth mechanisms (low thermal gradient with moderate stirring). Polyhedral crystals grew under high thermal gradient conditions when high velocity stirring was employed. Three-dimensionaltype growth was also produced from a 73 wt percent ironsilicon alloy under conditions that normally produce lath-type growth. Uncorrected electron mobilities of 700 to 1000 sq cm/v-sec were measured at room temperature, and a few preliminary Hall measurements were made over the temperature range from 77 to 300 K. (Author).

Growth, Processing, and Characterization of Beta-silicon Carbide Single Crystals

Growth, Processing, and Characterization of Beta-silicon Carbide Single Crystals PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 25

Book Description
Equipment and growth procedures for growing beta-silicon carbide epitaxially on beta-silicon carbide substrates from methyltrichlorosilane in a carrier gas of hydrogen is described. Hall and resistivity measurements and electron spin resonance measurements are discussed. The results show that the quality of the epitaxially grown material is comparable with that of the best solution grown crystals. Processing steps such as oxidation, masking, and etching have been performed and simple electroluminescent diodes have been fabricated. (Author).

A Unique High-temperature, High-pressure Crystal Growth System for Silicon Carbide

A Unique High-temperature, High-pressure Crystal Growth System for Silicon Carbide PDF Author: J. R. Littler
Publisher:
ISBN:
Category : Crystal growth
Languages : en
Pages : 24

Book Description
A high-pressure, high-temperature furnace system is described for crystal growth experiments using crucibles up to 13 cm in diameter and 26 cm high. The vertical temperature gradient is electronically controlled during growth such that the ends of the crucible can be maintained at temperatures above or below the crucible center. Temperatures up to 2800C can be maintained at pressures up to 50 atmospheres. A vacuum capability up to .000001 torr at 1800C has been incorporated into the system. Single crystals of alpha silicon carbide grown in this system at 2600C are described to illustrate its use. (Author).

Growth of Single Crystal Beta Silicon Carbide

Growth of Single Crystal Beta Silicon Carbide PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 35

Book Description
Beta-SiC is a promising, wide bandgap material for high power electronic devices capable of operation at high temperatures. Its high saturation velocity, high breakdown electric field, and high thermal conductivity point to superior performance for high frequency applications. The successful fabrication of Beta-SiC devices requires high quality films to be epitaxially grown on lattice-matched substrate materials. Single crystals of Beta-SiC offer the optimum substrate material for lattice matching. The major problem to be overcome in the growth of large single crystals of Beta-SiC is polytype alpha-SiC formation. Cubic Beta-SiC crystallizes only below 2000 deg C. Above this temperature, SiC undergoes a phase transformation from the Beta-to the alpha-phase. In Phase I, we investigated two crystal growth techniques: sublimation and gas-vapor transport. We were able to grow small 3C-SiC crystals by both methods.

High Purity Silicon 9

High Purity Silicon 9 PDF Author: Cor L. Claeys
Publisher: The Electrochemical Society
ISBN: 1566775043
Category : Crystal growth
Languages : en
Pages : 504

Book Description
This issue discusses the latest developments in the growth, characterization, device processing and applications of high-purity silicon in either bulk or epitaxial form. Information is given on the control and prevention of impurity incorporation, characterization and detection of defects and impurity states. Device and circuit aspects are also covered. Advanced substrates such as SOI, strained Si and germanium-on-insulator are discussed.

Vapor Growth and Characterization of Single Crystal Silicon Carbide

Vapor Growth and Characterization of Single Crystal Silicon Carbide PDF Author: Feng Liu
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 146

Book Description


Technical Abstract Bulletin

Technical Abstract Bulletin PDF Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 828

Book Description


Bulk Growth and Characterization of SiC Single Crystal

Bulk Growth and Characterization of SiC Single Crystal PDF Author: Lina Ning
Publisher:
ISBN: 9789533079684
Category :
Languages : en
Pages :

Book Description


Development of Manufacturing Methods for Growing Large Beta-silicon Carbide Single Crystals

Development of Manufacturing Methods for Growing Large Beta-silicon Carbide Single Crystals PDF Author: Walter E. Nelson
Publisher:
ISBN:
Category : Crystal growth
Languages : en
Pages : 59

Book Description