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Gallium Arsenide Antimonide Grown by Low-temperature Molecular Beam Epitaxy

Gallium Arsenide Antimonide Grown by Low-temperature Molecular Beam Epitaxy PDF Author: Curtis Friedrich Sell
Publisher:
ISBN:
Category :
Languages : en
Pages : 92

Book Description
This research studies electrical properties of low-temperature grown gallium arsenide antimonide (LT GaAs[subscript x]Sb[subscript (, -x)]) films as a function of composition, and examines low-temperature aluminum arsenide and gallium arsenide for comparison. Literature on LT GaAs, bulk GaAsSb, and MBE grown GaAsSb, and existing models for choosing MBE growth parameters are presented. After MBE growth of samples at 300°C, and measurement of their composition using XRD, an improved growth model is constructed. Sheet resistance, mobility, doping type and carrier concentration of the samples grown were determined by Hall and Van der Pauw measurements. The LT GaAsSb sheet resistance decreases with increasing Sb content.

Gallium Arsenide Antimonide Grown by Low-temperature Molecular Beam Epitaxy

Gallium Arsenide Antimonide Grown by Low-temperature Molecular Beam Epitaxy PDF Author: Curtis Friedrich Sell
Publisher:
ISBN:
Category :
Languages : en
Pages : 92

Book Description
This research studies electrical properties of low-temperature grown gallium arsenide antimonide (LT GaAs[subscript x]Sb[subscript (, -x)]) films as a function of composition, and examines low-temperature aluminum arsenide and gallium arsenide for comparison. Literature on LT GaAs, bulk GaAsSb, and MBE grown GaAsSb, and existing models for choosing MBE growth parameters are presented. After MBE growth of samples at 300°C, and measurement of their composition using XRD, an improved growth model is constructed. Sheet resistance, mobility, doping type and carrier concentration of the samples grown were determined by Hall and Van der Pauw measurements. The LT GaAsSb sheet resistance decreases with increasing Sb content.

Low Temperature Growth of Gallium Arsenide by Molecular Beam Epitaxy

Low Temperature Growth of Gallium Arsenide by Molecular Beam Epitaxy PDF Author: S. P. OH̀agan
Publisher:
ISBN:
Category :
Languages : en
Pages :

Book Description


Molecular beam epitaxy of low temperature gallium arsenide

Molecular beam epitaxy of low temperature gallium arsenide PDF Author: Anand Srinivasan
Publisher:
ISBN:
Category : Molecular beam epitaxy
Languages : en
Pages : 142

Book Description


The Structural Electrical and Optical Characterisation of Indium Gallium Arsenide Grown by Molecular Beam Epitaxy at Low Temperature

The Structural Electrical and Optical Characterisation of Indium Gallium Arsenide Grown by Molecular Beam Epitaxy at Low Temperature PDF Author: S. M. Townsend
Publisher:
ISBN:
Category :
Languages : en
Pages :

Book Description


Growth and Characterization of Molecular Beam Epitaxial Gallium Arsenide Antimonide and Gallium Antimonide Gallium Arsenide Superlattices

Growth and Characterization of Molecular Beam Epitaxial Gallium Arsenide Antimonide and Gallium Antimonide Gallium Arsenide Superlattices PDF Author: John Frederick Klem
Publisher:
ISBN:
Category :
Languages : en
Pages : 252

Book Description


Growth and Characterization of Molecular Beam Epitaxial Gallium-Arsenide Antimonide and Gallium-Arsenide Antimonide/gallium-Arsenide Superlattices

Growth and Characterization of Molecular Beam Epitaxial Gallium-Arsenide Antimonide and Gallium-Arsenide Antimonide/gallium-Arsenide Superlattices PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

Book Description


Molecular Beam Epitaxial Growth and Characterization of Indium Antimonide on Gallium Arsenide

Molecular Beam Epitaxial Growth and Characterization of Indium Antimonide on Gallium Arsenide PDF Author: Jen-Inn Chyi
Publisher:
ISBN:
Category :
Languages : en
Pages : 198

Book Description
Described in this thesis are the molecular beam epitaxial growth and characterization of InSb on GaAs substrates. The growth conditions and mechanisms of this highly lattice-mismatched system are detailed. Structural, electrical, and optical properties of the InSb epilayers are characterized by transmission electron microscopy (TEM), X-ray rocking curves, Hall measurements, photoluminescence (PL), and transmission measurements. The TEM study reveals pure edge-type, instead of the common 60$spcirc$-type, misfit dislocations at the InSb/GaAs interfaces. The reason for the formation of these misfit dislocations are given. Electrical measurements show that dislocation scattering is an important scattering mechanism in the epilayers. A charged dislocation scattering is proposed to explain the temperature and carrier concentration dependence of electron mobility. Low temperature PL shows a single band-edge transition similar to that of bulk InSb, indicating very little or no residual strain in the epilayers. Indium antimonide p$sp{+}$-n diodes have been successfully fabricated on as-grown and ion-implanted wafers. The electrical characteristics of these diodes compare favorably to those reported on similar devices. Further improvement can be achieved by proper surface passivation. Indium antimonide-Gallium arsenide p-n, p-p, and n-n heterojunctions have also been prepared for this study with all of the junctions exhibiting excellent rectifying characteristics. From capacitance-voltage measurements, the band offsets of InSb/GaAs junctions have been, for the first time, determined experimentally.

Electrical Measurements on Electron Irradiated Low-temperature Grown Molecular Beam Epitaxial Gallium Arsenide

Electrical Measurements on Electron Irradiated Low-temperature Grown Molecular Beam Epitaxial Gallium Arsenide PDF Author: Susan M. Lindsay
Publisher:
ISBN:
Category : Gallium arsenide semiconductors
Languages : en
Pages : 130

Book Description


Gallium Arsenide and Related Compounds

Gallium Arsenide and Related Compounds PDF Author:
Publisher:
ISBN:
Category : Gallium arsenide
Languages : en
Pages : 876

Book Description


Silicon Molecular Beam Epitaxy

Silicon Molecular Beam Epitaxy PDF Author: E. Kasper
Publisher: CRC Press
ISBN: 1351093525
Category : Technology & Engineering
Languages : en
Pages : 411

Book Description
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.