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Author: P. Schattschneider Publisher: Springer Science & Business Media ISBN: 3709188660 Category : Technology & Engineering Languages : en Pages : 205
Book Description
Electron energy loss spectroscopy (ELS) is a vast subject with a long and honorable history. The problem of stopping power for high energy particles interested the earliest pioneers of quantum mechanics such as Bohr and Bethe, who laid the theoretical foun dations of the subject. The experimental origins might perhaps be traced to the original Franck-Hertz experiment. The modern field includes topics as diverse as low energy reflection electron energy loss studies of surface vibrational modes, the spectroscopy of gases and the modern theory of plasmon excitation in crystals. For the study of ELS in electron microscopy, several historically distinct areas of physics are relevant, including the theory of the Debye Waller factor for virtual inelastic scattering, the use of complex optical potentials, lattice dynamics for crystalline specimens and the theory of atomic ionisation for isolated atoms. However the field of electron energy loss spectroscopy contains few useful texts which can be recommended for students. With the recent appearance of Raether's and Egerton's hooks (see text for references), we have for the first time both a comprehensive review text-due to Raether-and a lucid introductory text which emphasizes experimental aspects-due to Egerton. Raether's text tends to emphasize the recent work on surface plasmons, while the strength of Egerton's book is its treatment of inner shell excitations for microanalysis, based on the use of atomic wavefunctions for crystal electrons.
Author: P. Schattschneider Publisher: Springer Science & Business Media ISBN: 3709188660 Category : Technology & Engineering Languages : en Pages : 205
Book Description
Electron energy loss spectroscopy (ELS) is a vast subject with a long and honorable history. The problem of stopping power for high energy particles interested the earliest pioneers of quantum mechanics such as Bohr and Bethe, who laid the theoretical foun dations of the subject. The experimental origins might perhaps be traced to the original Franck-Hertz experiment. The modern field includes topics as diverse as low energy reflection electron energy loss studies of surface vibrational modes, the spectroscopy of gases and the modern theory of plasmon excitation in crystals. For the study of ELS in electron microscopy, several historically distinct areas of physics are relevant, including the theory of the Debye Waller factor for virtual inelastic scattering, the use of complex optical potentials, lattice dynamics for crystalline specimens and the theory of atomic ionisation for isolated atoms. However the field of electron energy loss spectroscopy contains few useful texts which can be recommended for students. With the recent appearance of Raether's and Egerton's hooks (see text for references), we have for the first time both a comprehensive review text-due to Raether-and a lucid introductory text which emphasizes experimental aspects-due to Egerton. Raether's text tends to emphasize the recent work on surface plasmons, while the strength of Egerton's book is its treatment of inner shell excitations for microanalysis, based on the use of atomic wavefunctions for crystal electrons.
Author: Brent Fultz Publisher: Springer Science & Business Media ISBN: 3642297609 Category : Science Languages : en Pages : 775
Book Description
This book explains concepts of transmission electron microscopy (TEM) and x-ray diffractometry (XRD) that are important for the characterization of materials. The fourth edition adds important new techniques of TEM such as electron tomography, nanobeam diffraction, and geometric phase analysis. A new chapter on neutron scattering completes the trio of x-ray, electron and neutron diffraction. All chapters were updated and revised for clarity. The book explains the fundamentals of how waves and wavefunctions interact with atoms in solids, and the similarities and differences of using x-rays, electrons, or neutrons for diffraction measurements. Diffraction effects of crystalline order, defects, and disorder in materials are explained in detail. Both practical and theoretical issues are covered. The book can be used in an introductory-level or advanced-level course, since sections are identified by difficulty. Each chapter includes a set of problems to illustrate principles, and the extensive Appendix includes laboratory exercises.
Author: Peter W. Hawkes Publisher: Academic Press ISBN: 0323916473 Category : Technology & Engineering Languages : en Pages : 665
Book Description
Principles of Electron Optics: Second Edition, Advanced Wave Optics provides a self-contained, modern account of electron optical phenomena with the Dirac or Schrödinger equation as a starting point. Knowledge of this branch of the subject is essential to understanding electron propagation in electron microscopes, electron holography and coherence. Sections in this new release include, Electron Interactions in Thin Specimens, Digital Image Processing, Acquisition, Sampling and Coding, Enhancement, Linear Restoration, Nonlinear Restoration – the Phase Problem, Three-dimensional Reconstruction, Image Analysis, Instrument Control, Vortex Beams, The Quantum Electron Microscope, and much more. - Includes authoritative coverage of many recent developments in wave electron optics - Describes the interaction of electrons with solids and the information that can be obtained from electron-beam techniques - Includes new content on multislice optics, 3D reconstruction, Wigner optics, vortex beams and the quantum electron microscope
Author: Marc J. Madou Publisher: CRC Press ISBN: 1482274663 Category : Technology & Engineering Languages : en Pages : 1983
Book Description
Now in its third edition, Fundamentals of Microfabrication and Nanotechnology continues to provide the most complete MEMS coverage available. Thoroughly revised and updated the new edition of this perennial bestseller has been expanded to three volumes, reflecting the substantial growth of this field. It includes a wealth of theoretical and practical information on nanotechnology and NEMS and offers background and comprehensive information on materials, processes, and manufacturing options. The first volume offers a rigorous theoretical treatment of micro- and nanosciences, and includes sections on solid-state physics, quantum mechanics, crystallography, and fluidics. The second volume presents a very large set of manufacturing techniques for micro- and nanofabrication and covers different forms of lithography, material removal processes, and additive technologies. The third volume focuses on manufacturing techniques and applications of Bio-MEMS and Bio-NEMS. Illustrated in color throughout, this seminal work is a cogent instructional text, providing classroom and self-learners with worked-out examples and end-of-chapter problems. The author characterizes and defines major research areas and illustrates them with examples pulled from the most recent literature and from his own work.
Author: Pedro Andreo Publisher: John Wiley & Sons ISBN: 3527808248 Category : Science Languages : en Pages : 1310
Book Description
A new, comprehensively updated edition of the acclaimed textbook by F.H. Attix (Introduction to Radiological Physics and Radiation Dosimetry) taking into account the substantial developments in dosimetry since its first edition. This monograph covers charged and uncharged particle interactions at a level consistent with the advanced use of the Monte Carlo method in dosimetry; radiation quantities, macroscopic behaviour and the characterization of radiation fields and beams are covered in detail. A number of chapters include addenda presenting derivations and discussions that offer new insight into established dosimetric principles and concepts. The theoretical aspects of dosimetry are given in the comprehensive chapter on cavity theory, followed by the description of primary measurement standards, ionization chambers, chemical dosimeters and solid state detectors. Chapters on applications include reference dosimetry for standard and small fields in radiotherapy, diagnostic radiology and interventional procedures, dosimetry of unsealed and sealed radionuclide sources, and neutron beam dosimetry. The topics are presented in a logical, easy-to-follow sequence and the text is supplemented by numerous illustrative diagrams, tables and appendices. For senior undergraduate- or graduate-level students and professionals.
Author: Kurt Gottfried Publisher: Springer Science & Business Media ISBN: 0387216235 Category : Science Languages : en Pages : 631
Book Description
Quantum mechanics was already an old and solidly established subject when the first edition of this book appeared in 1966. The context in which a graduate text on quantum mechanics is studied today has changed a good deal, however. In 1966, most entering physics graduate students had a quite limited exposure to quan tum mechanics in the form of wave mechanics. Today the standard undergraduate curriculum contains a large dose of elementary quantum mechanics, and often intro duces the abstract formalism due to Dirac. Back then, the study of the foundations by theorists and experimenters was close to dormant, and very few courses spent any time whatever on this topic. At that very time, however, John Bell's famous theorem broke the ice, and there has been a great flowering ever since, especially in the laboratory thanks to the development of quantum optics, and more recently because of the interest in quantum computing. And back then, the Feynman path integral was seen by most as a very imaginative but rather useless formulation of quantum mechanics, whereas it now plays a large role in statistical physics and quantum field theory, especially in computational work. For these and other reasons, this book is not just a revision of the 1966 edition. It has been rewritten throughout, is differently organized, and goes into greater depth on many topics that were in the old edition.
Author: Budhika G. Mendis Publisher: John Wiley & Sons ISBN: 1118696654 Category : Technology & Engineering Languages : en Pages : 303
Book Description
A detailed presentation of the physics of electron beam-specimen interactions Electron microscopy is one of the most widely used characterisation techniques in materials science, physics, chemistry, and the life sciences. This book examines the interactions between the electron beam and the specimen, the fundamental starting point for all electron microscopy. Detailed explanations are provided to help reinforce understanding, and new topics at the forefront of current research are presented. It provides readers with a deeper knowledge of the subject, particularly if they intend to simulate electron beam-specimen interactions as part of their research projects. The book covers the vast majority of commonly used electron microscopy techniques. Some of the more advanced topics (annular bright field and dopant atom imaging, atomic resolution chemical analysis, band gap measurements) provide additional value, especially for readers who have access to advanced instrumentation, such as aberration-corrected and monochromated microscopes. Electron Beam-Specimen Interactions and Simulation Methods in Microscopy offers enlightening coverage of: the Monte-Carlo Method; Multislice Simulations; Bloch Waves in Conventional and Analytical Transmission Electron Microscopy; Bloch Waves in Scanning Transmission Electron Microscopy; Low Energy Loss and Core Loss EELS. It also supplements each chapter with clear diagrams and provides appendices at the end of the book to assist with the pre-requisites. A detailed presentation of the physics of electron beam-specimen interactions Each chapter first discusses the background physics before moving onto simulation methods Uses computer programs to simulate electron beam-specimen interactions (presented in the form of case studies) Includes hot topics brought to light due to advances in instrumentation (particularly aberration-corrected and monochromated microscopes) Electron Beam-Specimen Interactions and Simulation Methods in Microscopy benefits students undertaking higher education degrees, practicing electron microscopists who wish to learn more about their subject, and researchers who wish to obtain a deeper understanding of the subject matter for their own work.
Author: P. Schattschneider
Author: P. Schattschneider
Author: Peter Schattschneider
Author: Marc De Graef
Author: Michel van Veenendaal
Author: Brent Fultz
Author: Peter W. Hawkes
Author: Marc J. Madou
Author: Pedro Andreo
Author: Kurt Gottfried
Author: Budhika G. Mendis