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Ferroelectric Thin Films III: Volume 310

Ferroelectric Thin Films III: Volume 310 PDF Author: Edward R. Myers
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 528

Book Description
Papers of the symposium held April 13-16, 1993 in San Francisco, Calif., on: novel analysis techniques to characterize materials and device properties, process integration, degradation and modelling, CVD, spin pyrolysis, niobium and barium based ferroelectrics, materials and processes, sputter deposition, pulsed laser and other deposition techniques. Annotation copyright by Book News, Inc., Portland, OR
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