Fabrication and Study of ITO Thin Films Prepared by Magnetron Sputtering PDF Download

Author: Zhaohui Qiao
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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Author: Sergei Pyshkin
Publisher: BoD – Books on Demand
ISBN: 9535133691
Category : Technology & Engineering
Languages : en
Pages : 374

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Book Description
Optoelectronics - Advanced Device Structures (Book IV) is following the Optoelectronics (Books I, II, and III) published in 2011, 2013, and 2015, as part of the InTech collection of international works on optoelectronics. Accordingly, as with the first three books of the collection, this book covers recent achievements by specialists around the world. The growing number of countries participating in this endeavor as well as joint participation of the US and Moldova scientists in edition of this book testifies to the unifying effect of science. An interested reader will find in the book the description of properties and applications employing organic and inorganic materials, as well as the methods of fabrication and analysis of operation and regions of application of modern optoelectronic devices.

Author: 曾坤三
Publisher:
ISBN:
Category :
Languages : en
Pages : 150

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Author: Öcal Tuna
Publisher: LAP Lambert Academic Publishing
ISBN: 9783838365695
Category :
Languages : en
Pages : 100

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Book Description
In this study Indium Tin Oxide (ITO) thin films were grown by both DC and RF magnetron sputtering techniques. To know deposition rate of ITO, system was calibrated for both DCMS and RFMS and then ITO were grown on glass substrate with the thickness of 70 nm and 40 nm by changing substrate temperature. The effect of substrate temperature, film thickness and sputtering method on structural, electrical and optical properties were investigated. The results show that substrate temperature and film thickness substantially affects the film properties, especially crystallization and resistivity. The thin films grown at the lower than 150 oC showed amorphous structure. However, crystallization was detected with the furtherincrease of substrate temperature. Band gap of ITO was calculated to be about 3.64eV at the substrate temperature of 150 oC, and itwidened with substrate temperature increment. From electrical measurements the resistivity at room temperature was obtained 1.28x10-4 and 1.29x10-4 D-cm, for DC and RF sputtered films, respectively. We also measured temperature dependence resistivity and the Hall coefficient of the films, and we calculated carrier concentration and Hall mobility."

Author: Chi Keung Fung
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages :

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Author: Prasad Yarlagadda
Publisher: Trans Tech Publications Ltd
ISBN: 3038262978
Category : Technology & Engineering
Languages : en
Pages : 2162

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Book Description
Volume is indexed by Thomson Reuters CPCI-S (WoS). Collection of selected, peer reviewed papers from the 3rd International Conference on Materials and Products Manufacturing Technology (ICMPMT 2013), September 25-26, 2013, Guangzhou, China. The 402 papers are grouped as follows: Chapter 1: Micro/Nano Materials and Films; Chapter 2: Polymer Materials; Chapter 3: Composites; Chapter 4: Ceramic; Chapter 5: Metal, Alloys and Mining Engineering; Chapter 6: Chemical Materials; Chapter 7: Biomaterials and Technology; Chapter 8: Surface Engineering/Coatings; Chapter 9: Building Materials, Construction and Architecture; Chapter 10: Material Processing Technology; Chapter 11: Sensors and Detecting Technology; Chapter 12: Signal and Intelligent Information Processing; Chapter 13: Electronic, Optoelectronic and Automation; Chapter 14: Industrial Robotics and Mechatronics; Chapter 15: Mechanical Design and Modeling; Chapter 16: CAD/CAM/CAE; Chapter 17: Product Design and Manufacture; Chapter 18: Advanced Manufacturing Technology; Chapter 19: Computer Applications and Mathematical Modeling; Chapter 20: Industrial Engineering and System Analysis; Chapter 21: Engineering Management and Engineering Education

Author: Ramón Escobar-Galindo
Publisher:
ISBN: 9783036516585
Category :
Languages : en
Pages : 90

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Book Description
This book contains the articles collected for the Special Issue entitled "Micro-nano Surface Functionalization of Materials and Thin Films for Optical Applications" in the journal Coatings (ISSN 2079-6412). These selected articles provide a meaningful overview of recent advances and concepts beyond the state-of-the-art regarding surface functionalization of materials and deposition of thin films to be used in optical applications. The aim was to cover all relevant aspects of the topic (simulation, design, fabrication, characterization and applications) with a special emphasis on nonconventional methods for surface modification of materials, combinations of mature fabrication routes with emerging technologies (i.e., additive manufacturing) and largearea fabrication concepts to pave the way to an industrial utilization of the developed materials. This overview comprises the recent work of reputed scientists from Germany, Austria, Spain and India on: - New developments on the scale-up deposition of transparent conductive materials by magnetron sputtering, - Design of hierarchical surface structures at different scale lengths for nanoimprinting of optical nano- and micro-structures, - Non-conventional preparation of rutile-type TiO2 films at room temperature for optical applications on heat-sensitive substrates, - Design of spectrally selective solar absorber coatings based on computational simulation and ellipsometry measurements.

Author: Alberto Palmero
Publisher: MDPI
ISBN: 3039364294
Category : Science
Languages : en
Pages : 148

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Book Description
Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.

Author: D Glocker
Publisher: CRC Press
ISBN: 1351081241
Category : Science
Languages : en
Pages : 135

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Book Description
The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume presents additional recipe-type information (i.e. important deposition system details and process parameters) for optical materials.

Author: Kiyotaka Wasa
Publisher: William Andrew
ISBN: 0815519311
Category : Technology & Engineering
Languages : en
Pages : 533

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Book Description
An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.