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Author: Vivek Bakshi Publisher: SPIE Press ISBN: 0819469645 Category : Art Languages : en Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: Vivek Bakshi Publisher: SPIE Press ISBN: 0819469645 Category : Art Languages : en Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: Kouichi Tsuji Publisher: John Wiley & Sons ISBN: 0470020423 Category : Science Languages : en Pages : 616
Book Description
X-Ray Spectrometry: Recent Technological Advances covers the latest developments and areas of research in the methodological and instrumental aspects of x-ray spectrometry. Includes the most advanced and high-tech aspects of the chemical analysis techniques based on x-rays Introduces new types of X-ray optics and X-ray detectors, covering history, principles, characteristics and future trends Written by internationally recognized scientists, all of whom are eminent specialists in each of the sub-fields Sections include: X-Ray Sources, X-Ray Optics, X-Ray Detectors, Special Configurations, New Computerization Methods, New Applications This valuable book will assist all analytical chemists and other users of x-ray spectrometry to fully exploit the capabilities of this set of powerful analytical tools and to further expand applications in such fields as material and environmental sciences, medicine, toxicology, forensics, archaeometry and many others.
Author: Publisher: ISBN: Category : Optical instruments Languages : en Pages : 510
Book Description
Publishes papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.
Author: Piero Pianetta Publisher: Springer ISBN: 9781563969416 Category : Medical Languages : en Pages : 520
Book Description
This conference presents invited and contributed papers by international experts devoted to explosive phenomena in cosmic settings as diverse as stellar flares, X-ray bursts, jets, novae, supernovae, hypernovae, and gamma-ray bursts. The conference considered not only the origins of explosive behavior, but also information about the host systems that the explosive phenomena might yield. For example, X-ray bursts can be used to determine structural parameters of neutron stars, and specific types of supernovae can be used as standard candles to study the deceleration of the Hubble expansion.
Author: Libor Juha Publisher: SPIE-International Society for Optical Engineering ISBN: Category : Science Languages : en Pages : 246
Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author: Ozgur Baskan Publisher: BoD – Books on Demand ISBN: 9535125923 Category : Mathematics Languages : en Pages : 326
Book Description
This book covers state-of-the-art optimization methods and their applications in wide range especially for researchers and practitioners who wish to improve their knowledge in this field. It consists of 13 chapters divided into two parts: (I) Engineering applications, which presents some new applications of different methods, and (II) Applications in various areas, where recent contributions of state-of-the-art optimization methods to diverse fields are presented.
Author: Vivek Bakshi
Author: Vivek Bakshi
Author: Kouichi Tsuji
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Author: Piero Pianetta
Author: Libor Juha
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Author: Ozgur Baskan
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