Author: Phillip D. Blais
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 280

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Book Description

Author: Phillip D. Blais
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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Book Description

Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : en
Pages : 704

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Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

Author:
Publisher:
ISBN:
Category : Ion beam lithography
Languages : en
Pages : 0

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Author: Arnold W. Yanof
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 404

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Book Description

Author: P. Rai-Choudhury
Publisher: SPIE Press
ISBN: 9780819423788
Category : Technology & Engineering
Languages : en
Pages : 780

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Book Description
The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.

Author: Raymond C. Elton
Publisher: Elsevier
ISBN: 0323138454
Category : Science
Languages : en
Pages : 302

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Book Description
The first in its field, this book is both an introduction to x-ray lasers and a how-to guide for specialists. It provides new entrants and others interested in the field with a comprehensive overview and describes useful examples of analysis and experiments as background and guidance for researchers undertaking new laser designs. In one succinct volume, X-Ray Lasers collects the knowledge and experience gained in two decades of x-ray laser development and conveys the exciting challenges and possibilities still to come. The reader is first introduced to the technical challenges unique to the design and operation of lasers in the "vacuum" region of the spectrum, where the atmosphere is highly absorbent and optics are--at best--unconventional. A discussion of the basic principles for and limitations in achieving significant x-ray amplification, as well as descriptions of gain measurement techniques and instrumentation follows. Various approaches for pumping media to x-ray gain conditions are also analyzed, and descriptions of experimental progress are included wherever possible. The book concludes with a description and comparison with alternate sources and applications for an x-ray laser. This work is both an introduction to x-ray lasers and a how-to guide for specialists. It provides new entrants and others interested in the field with a comprehensive overview and describes useful analyses and experiments as guidance for researchers undertaking new laser designs. - Provides first comprehensive treatment of lasers for wavelengths shorter than the near-ultraviolet 2000 - Contains descriptions and comparisons with alternate sources - Includes a section describing possible applications

Author: Ernst Weihreter
Publisher: World Scientific
ISBN: 9789810224592
Category : Science
Languages : en
Pages : 236

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Book Description
This book covers a new niche in circular accelerator design, motivated by the promising industrial prospects of recent micromanufacturing methods ? X-ray lithography, synchrotron radiation-based micromachining and microanalysis techniques. It describes the basic concepts and the essential challenges for the development of compact synchrotron radiation sources from an accelerator designer's point of view and gives an outline of the actual state of the art. The volume is intended as an introduction and as a reference for physicists, engineers and managers involved in this rapidly developing field.

Author: Stuart K. Tewksbury
Publisher: Springer Science & Business Media
ISBN: 1468455117
Category : Technology & Engineering
Languages : en
Pages : 719

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Book Description
The 1987 Princeton Workshop on Algorithm, Architecture and Technology Issues for Models of Concurrent Computation was organized as an interdisciplinary work shop emphasizing current research directions toward concurrent computing systems. With participants from several different fields of specialization, the workshop cov ered a wide variety of topics, though by no means a complete cross section of issues in this rapidly moving field. The papers included in this book were prepared for the workshop and, taken together, provide a view of the broad range of issues and alternative directions being explored. To organize the various papers, the book has been divided into five parts. Part I considers new technology directions. Part II emphasizes underlying theoretical issues. Communication issues, which are ad dressed in the majority of papers, are specifically highlighted in Part III. Part IV includes papers stressing the fault tolerance and reliability of systems. Finally, Part V includes systems-oriented papers, where the system ranges from VLSI circuits through powerful parallel computers. Much of the initial planning of the workshop was completed through an informal AT&T Bell Laboratories group consisting of Mehdi Hatamian, Vijay Kumar, Adri aan Ligtenberg, Sailesh Rao, P. Subrahmanyam and myself. We are grateful to Stuart Schwartz, both for the support of Princeton University and for his orga nizing local arrangements for the workshop, and to the members of the organizing committee, whose recommendations for participants and discussion topics were par ticularly helpful. A. Rosenberg, and A. T.

Author:
Publisher: Academic Press
ISBN: 0080577628
Category : Science
Languages : en
Pages : 919

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Book Description
As a complement to The Beginnings of Electron Microscopy, Advances in Imaging and Electron Physics is pleased to present Volume 96, The Growth of Electron Microscopy. This comprehensive collection of articles surveys the accomplishments of various national groups that comprise the International Federation of Societies of Electron Microscopy (IFSEM).