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Author: Vu Huynh Lam Publisher: ISBN: Category : Languages : en Pages : 58
Book Description
To further reduce the resistivity of the VO[subscript x] and maintain the TCR value, co-sputtering of noble metals (gold and platinum) with VO[subscript x] was studied. The metals were co-sputtered at various power settings with the vanadium oxide reactive process at a fixed percentage of oxygen. The TCR and resistivity results showed that the additions of Au and Pt into VO[subscript x] reduced the resistivity. However, only Au was found to improve TCR value.
Author: Vu Huynh Lam Publisher: ISBN: Category : Languages : en Pages : 58
Book Description
To further reduce the resistivity of the VO[subscript x] and maintain the TCR value, co-sputtering of noble metals (gold and platinum) with VO[subscript x] was studied. The metals were co-sputtered at various power settings with the vanadium oxide reactive process at a fixed percentage of oxygen. The TCR and resistivity results showed that the additions of Au and Pt into VO[subscript x] reduced the resistivity. However, only Au was found to improve TCR value.
Author: Nikolay Nikitenkov Publisher: BoD – Books on Demand ISBN: 953513003X Category : Science Languages : en Pages : 446
Book Description
Development of the thin film and coating technologies (TFCT) made possible the technological revolution in electronics and through it the revolution in IT and communications in the end of the twentieth century. Now, TFCT penetrated in many sectors of human life and industry: biology and medicine; nuclear, fusion, and hydrogen energy; protection against corrosion and hydrogen embrittlement; jet engine; space materials science; and many others. Currently, TFCT along with nanotechnologies is the most promising for the development of almost all industries. The 20 chapters of this book present the achievements of thin-film technology in many areas mentioned above but more than any other in medicine and biology and energy saving and energy efficiency.
Author: Vincent David Barth Publisher: ISBN: Category : Tungsten Languages : en Pages : 192
Book Description
The report presents a detailed review of available information on the oxidation of W and its alloys. W is relatively inert below 700 C. As the temperature is increased above this level, however, oxidation becomes progressively more rapid, reaching catastrophic rates at temperatures around 1200 C and above. Various theories for the mechanism and rates of W oxidation at different temperatures are reviewed, and the effect of pressure and water vapor on the stability of W oxides is discussed in detail. The elevatedtemperature reactions of W with other materials, such as refractory oxides, and with gases other than oxygen also are covered. Information on the protection of W by alloying and coating is included. (Author).
Author: Steve Durbin Publisher: Materials Research Society ISBN: 9781605116105 Category : Technology & Engineering Languages : en Pages : 0
Book Description
Symposium R, "Oxide Semiconductors" was held December 1-6 at the 2013 MRS Fall Meeting in Boston, Massachusetts. Oxide semiconductors are poised to take a more active role in modern electronics, particularly in the field of thin film transistors. While many advances have been made in terms of our understanding of fundamental optical and electronic characteristics, there remain many questions in terms of defects, doping, and optimal growth/synthesis conditions. This symposium proceedings volume represents recent advances in growth and characterization of a number of different oxide semiconductors, as well as device fabrication.
Author: Hernan M. R. Publisher: ISBN: Category : Science Languages : en Pages :
Book Description
This chapter describes a new deposition method proposed to achieve Vanadium Oxide VOx/V2O5 thin films with high temperature coefficient of resistance (TCR), intended to be used as functional material in IR microsensors (bolometers). The main aim of the work is to attain a deposition method compatible with the lift-off microstructuring technique in order to avoid the use of a reactive-ion etching (RIE) process step to selectively remove the VOx/V2O5 deposited layer in the course of the definition of the bolometer geometry, preventing the harmful effects linked to the spatial variability and the lack of selectivity of the RIE process. The proposed technique makes use of a two-stage process to produce the well-controlled VOx or V2O5 thin films by applying a suitable thermal annealing to a previously deposited layer, which was obtained before at room temperature by RF magnetron sputtering and patterned by lift-off. A set of measurements has been carried out with thin films attained in order to check the quality and properties of the materials achieved with this method. The results reached with V2O5 pure phase films are consistent with a charge transport model based on the small polarons hopping derived from Mott's model under the Schnakenberg form.
Author: V. K. Jain Publisher: Springer Science & Business Media ISBN: 3319030027 Category : Science Languages : en Pages : 841
Book Description
The purpose of this workshop is to spread the vast amount of information available on semiconductor physics to every possible field throughout the scientific community. As a result, the latest findings, research and discoveries can be quickly disseminated. This workshop provides all participating research groups with an excellent platform for interaction and collaboration with other members of their respective scientific community. This workshop’s technical sessions include various current and significant topics for applications and scientific developments, including • Optoelectronics • VLSI & ULSI Technology • Photovoltaics • MEMS & Sensors • Device Modeling and Simulation • High Frequency/ Power Devices • Nanotechnology and Emerging Areas • Organic Electronics • Displays and Lighting Many eminent scientists from various national and international organizations are actively participating with their latest research works and also equally supporting this mega event by joining the various organizing committees.
Author: Wing Andy Li Publisher: Open Dissertation Press ISBN: 9781374735187 Category : Science Languages : en Pages : 118
Book Description
This dissertation, "The Electrical Properties of Vanadium Oxide Films" by Wing, Andy, Li, 李榮, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. DOI: 10.5353/th_b3120506 Subjects: Sputtering (Physics) Vanadium oxide Amorphous substances
Author: P. K. Giri Publisher: Springer Science & Business Media ISBN: 3642342167 Category : Technology & Engineering Languages : en Pages : 588
Book Description
Nanoscale science and technology have occupied centre stage globally in modern scientific research and discourses in the early twenty first century. The enabling nature of the technology makes it important in modern electronics, computing, materials, healthcare, energy and the environment. This volume contains selected articles presented (as Invited/Oral/Poster presentations) at the 2nd international conference on advanced materials and nanotechnology (ICANN-2011) held recently at the Indian Institute of Technology Guwahati, during Dec 8-10, 2011. The list of topics covered in this proceedings include: Synthesis and self assembly of nanomaterials Nanoscale characterisation Nanophotonics & Nanoelectronics Nanobiotechnology Nanocomposites F Nanomagnetism Nanomaterials for Energy Computational Nanotechnology Commercialization of Nanotechnology The conference was represented by around 400 participants from several countries including delegates invited from USA, Germany, Japan, UK, Taiwan, Italy, Singapore, India etc.
Author: Vu Huynh Lam
Author: Vu Huynh Lam
Author: Nikolay Nikitenkov
Author: Marshall Devin Wilson
Author: Kaushik Chhotani
Author: Vincent David Barth
Author: Steve Durbin
Author: Hernan M. R.
Author: V. K. Jain
Author: Wing Andy Li
Author: P. K. Giri