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Author: Yen-Min Lee Publisher: IOP Publishing Limited ISBN: 9780750326506 Category : Science Languages : en Pages : 150
Book Description
Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method. Key Features Addresses knowledge of extreme ultraviolet (EUV) mirrors and EUV lithography. Establishes a relation between photonic bands and Fresnel's equation. Introduces the high reflectivity EUV mirror design rules. Applies numerical simulation for EUV mirror design. Details efficient finite-difference time-domain (FDTD) approach.
Author: Yen-Min Lee Publisher: IOP Publishing Limited ISBN: 9780750326506 Category : Science Languages : en Pages : 150
Book Description
Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method. Key Features Addresses knowledge of extreme ultraviolet (EUV) mirrors and EUV lithography. Establishes a relation between photonic bands and Fresnel's equation. Introduces the high reflectivity EUV mirror design rules. Applies numerical simulation for EUV mirror design. Details efficient finite-difference time-domain (FDTD) approach.
Author: Greggory Scranton Publisher: ISBN: Category : Languages : en Pages : 72
Book Description
As optics and photonics technologies advance, more energy efficient use of light will be necessary. This dissertation presents methods developed to enhance the efficiency of three different optical systems: extreme ultraviolet lithography, a hybrid solar photovoltaic/thermal collection system, and thermo-photovoltaics. Extreme ultraviolet (EUV) lithography is the leading contender to become the next industrial scale lithography technology in the semiconductor industry. Traditionally, aberration correction in extreme ultraviolet projection optics requires the use of multiple lossy mirrors, which results in prohibitively high source power requirements. This dissertation analyzes a single spherical mirror projection optical system where aberration correction is built into the mask itself through an adjoint-based optimization algorithm. This greatly reduces the power requirements for the source. Hybrid solar photovoltaic/thermal systems offer a way to convert sunlight into electricity and heat that efficiently uses different parts of the solar spectrum. Highly efficient hybrid solar photovoltaic/thermal systems are enabled by recent advances in photovoltaic technology. Record breaking photovoltaic cells have highly reflective rear mirrors to maximize luminescence efficiency. This reflectivity can also be used to create reflective optics to concentrate the reflected radiation onto a thermal absorber. This dissertation reports on a hybrid solar photovoltaic/thermal system with a thermal efficiency of 37% at a maximum absorber temperature of 365°C, and a direct solar to electric efficiency of 8%. Thermo-photovoltaics offers a method to use photovoltaic cells to efficiently convert heat to electricity. In a thermo-photovoltaic system, light is collected by photovoltaic cells from a local black body source. This dissertation reports on a thermo-photovoltaic device that recycles unused radiation from the photovoltaics with a highly reflective rear mirror. Theoretical efficiencies using this strategy are in excess of 50%. For an emitter temperature of 1207°C, this dissertation reports an experimental power conversion efficiency of 28.1%.
Author: Martin A. Barstow Publisher: Cambridge University Press ISBN: 1139435124 Category : Science Languages : en Pages : 412
Book Description
This book describes the development of astronomy in the Extreme Ultraviolet wavelength range, from the first rocket-based experiments to later satellite missions. It will be of great value to graduate students and researchers.
Author: Roger F. Malina Publisher: Elsevier ISBN: 1483287181 Category : Nature Languages : en Pages : 533
Book Description
The field of extreme ultraviolet astronomy will see two major satellite observatories to be launched in 1991, one by ESA (ROSAT mission), one by NASA (EUVE mission). These Proceedings discuss the potential for EUV Astronomy, results from recent missions, approved and possible future missions and new developments in EUV technology.
Author: Federico Canova Publisher: Springer ISBN: 3662474433 Category : Science Languages : en Pages : 205
Book Description
The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Author: BE. Newnam Publisher: ISBN: Category : Aluminum films Languages : en Pages : 9
Book Description
Resonator mirrors with reflectance greater than ~40% are required if free-electron laser (FEL) oscillators are to be extended to wavelengths below 100 nm. The principle of total-external reflection has been used to design multifacet mirrors of several metal films that surpass this requirement between 10 and 100 nm. These reflectors have high reflectance over a relatively broad band which suits well the inherent FEL wavelength tunability. The practical limitations to achieving and maintaining high reflectance include oxide- and carbon-contamination, scattering, and surface-plasmon absorption.
Author: Vivek Bakshi Publisher: SPIE Press ISBN: 0819469645 Category : Art Languages : ru Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: Yen-Min Lee
Author: Yen-Min Lee
Author: Greggory Scranton
Author: 
Author: Martin A. Barstow
Author: Roger F. Malina
Author: Stephen P. Maran
Author: Federico Canova
Author: Stephen Ernest Harris
Author: BE. Newnam
Author: Vivek Bakshi