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Author: Helmut Mehrer Publisher: Springer Science & Business Media ISBN: 354071488X Category : Technology & Engineering Languages : en Pages : 645
Book Description
This book describes the central aspects of diffusion in solids, and goes on to provide easy access to important information about diffusion in metals, alloys, semiconductors, ion-conducting materials, glasses and nanomaterials. Coverage includes diffusion-controlled phenomena including ionic conduction, grain-boundary and dislocation pipe diffusion. This book will benefit graduate students in such disciplines as solid-state physics, physical metallurgy, materials science, and geophysics, as well as scientists in academic and industrial research laboratories.
Author: Igor Bezverkhyy Publisher: Trans Tech Publications Ltd ISBN: 3038137030 Category : Technology & Engineering Languages : en Pages : 573
Book Description
Selected, peer reviewed papers from the International Conference on Diffusion in Materials (DIMAT 2011), July 3-8, 2011, Dijon, France
Author: Marek Danielewski Publisher: ISBN: Category : Science Languages : en Pages : 620
Book Description
These volumes contain the contributions presented at DIMAT 2004: the Sixth International Conference on Diffusion in Materials, held in Cracow, under the Patronage of the AGH University of Science and Technology, the Institute of Metallurgy and Materials Science of the Polish Academy of Sciences and the Cracow University of Technology.
Author: Reza Ghomashchi Publisher: CRC Press ISBN: 1040154484 Category : Technology & Engineering Languages : en Pages : 253
Book Description
Diffusion, the movement of atoms in a material, is an integral part of many metallurgical and materials treatment processes. Understanding diffusion mechanisms helps to control and improve materials properties. This book offers a comprehensive overview of diffusion in the synthesis and analysis of materials (metals and non‐metals) from the fundamentals through applications. Discusses defects in materials, fundamentals of the diffusion process, and different diffusion mechanisms active in metallic alloys Describes diffusion within non‐metallic materials, including ceramics, polymers, and semiconducting materials, with special emphasis on silicon Covers diffusion along high‐energy paths, short‐circuiting diffusion, such as grain boundaries, dislocations, and materials surface Explores diffusion under thermal and electrical gradients and explains how this information is useful for materials purification Details the application of diffusion on carbides during the thermal and thermomechanical treatments of steels Includes problems and solutions for each chapter to reinforce reader’s comprehension Written with less emphasis on complex mathematical equations, this text is accessible to researchers and students in materials, mechanical, and related engineering disciplines studying the phenomenon of diffusion in materials and its application in the engineering of materials.
Author: Yuri Mishin Publisher: Mrs Proceedings ISBN: Category : Science Languages : en Pages : 576
Book Description
Participants of the symposium held in April 1998 in San Francisco as part of the 1998 MRS Spring Meeting cleared the fog at least on some aspects of solid-state diffusion, particularly experimental and simulation techniques that provide access to atomic-scale mechanisms of diffusion in diverse classes of crystalline materials. The 68 contributions (including 18 invited talks) added to the knowledge base in several key areas: diffusion mechanisms in metals and alloys, in intermetallic compounds, and in semiconductors; grain boundary and surface diffusion, and diffusion in quasicrystals; and diffusion and ionic conductivity in ionic materials. Annotation copyrighted by Book News, Inc., Portland, OR
Author: C A J Ammerlaan Publisher: World Scientific ISBN: 9814546674 Category : Languages : en Pages : 554
Book Description
This book is devoted to the specific physical and chemical properties of centers in semiconductors with shallow energy levels and electronic distributions of an extended size. Reports are included on the most advanced experimental and theoretical methods for identifying and further characterizing these materials. Attention is given to such topics as shallow-level centers in host semiconductors of lower dimensionality, centers in wide-bandgap semiconductors, shallow excited states of centers with deep ground states, passivation of centers, and other aspects of impurity control during crystal growth and processing with its relevance to applications.
Author: Peter Pichler Publisher: Springer Science & Business Media ISBN: 3709105978 Category : Technology & Engineering Languages : en Pages : 576
Book Description
This book contains the first comprehensive review of intrinsic point defects, impurities and their complexes in silicon. Besides compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behaviour from investigations, it gives a comprehensive introduction into the relevant fundamental concepts.
Author: Helmut Mehrer
Author: Helmut Mehrer
Author: Helmut Mehrer
Author: Igor Bezverkhyy
Author: Marek Danielewski
Author: Reza Ghomashchi
Author: 
Author: Jörg Kärger
Author: Yuri Mishin
Author: C A J Ammerlaan
Author: Peter Pichler