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Author: N.P. Bigelow Publisher: Springer Science & Business Media ISBN: 1441989072 Category : Science Languages : en Pages : 699
Book Description
The Eighth Rochester Conference on Coherence and Quantum Optics was held on the campus of the University of Rochester during the period June 13-16,2001. This volume contains the proceedings of the meeting. The meeting was preceded by an affiliated conference, the International Conference on Quantum Information, with some overlapping sessions on June 13. The proceedings of the affiliated conference will be published separately by the Optical Society of America. A few papers that were presented in common plenary sessions of the two conferences will be published in both proceedings volumes. More than 268 scientists from 28 countries participated in the week long discussions and presentations. This Conference differed from the previous seven in the CQO series in several ways, the most important of which was the absence of Leonard Mandel. Professor Mandel died a few months before the conference. A special memorial symposium in his honor was held at the end of the conference. The presentations from that symposium are included in this proceedings volume. An innovation, that we believe made an important contribution to the conference, was the inclusion of a series of invited lectures chaired by CQO founder Emil Wolf, reviewing the history of the fields of coherence and quantum optics before about 1970. These were given by three prominent participants in the development of the field, C. Cohen-Tannoudji, 1. F. Clauser, and R. I. Glauber.
Author: N.P. Bigelow Publisher: Springer Science & Business Media ISBN: 1441989072 Category : Science Languages : en Pages : 699
Book Description
The Eighth Rochester Conference on Coherence and Quantum Optics was held on the campus of the University of Rochester during the period June 13-16,2001. This volume contains the proceedings of the meeting. The meeting was preceded by an affiliated conference, the International Conference on Quantum Information, with some overlapping sessions on June 13. The proceedings of the affiliated conference will be published separately by the Optical Society of America. A few papers that were presented in common plenary sessions of the two conferences will be published in both proceedings volumes. More than 268 scientists from 28 countries participated in the week long discussions and presentations. This Conference differed from the previous seven in the CQO series in several ways, the most important of which was the absence of Leonard Mandel. Professor Mandel died a few months before the conference. A special memorial symposium in his honor was held at the end of the conference. The presentations from that symposium are included in this proceedings volume. An innovation, that we believe made an important contribution to the conference, was the inclusion of a series of invited lectures chaired by CQO founder Emil Wolf, reviewing the history of the fields of coherence and quantum optics before about 1970. These were given by three prominent participants in the development of the field, C. Cohen-Tannoudji, 1. F. Clauser, and R. I. Glauber.
Author: Luca Dal Negro Publisher: Cambridge University Press ISBN: 1107037506 Category : Science Languages : en Pages : 713
Book Description
An interdisciplinary introduction to the structural and scattering properties of complex photonic media, focusing on deterministic aperiodic structures and their conceptual roots in geometry and number theory. An essential tool for students at the graduate or advanced undergraduate level.
Author: Bruce W. Smith Publisher: CRC Press ISBN: 1420051539 Category : Technology & Engineering Languages : en Pages : 864
Book Description
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Author: Alois Ferscha Publisher: Springer ISBN: 3540246460 Category : Computers Languages : en Pages : 375
Book Description
nd Welcome to the proceedings of PERVASIVE 2004, the 2 International C- ference on Pervasive Computing and the premier forum for the presentation and appraisal of the most recent and most advanced research results in all - undational and applied areas of pervasive and ubiquitous computing. Consi- ring the half-life period of technologies and knowledge this community is facing, PERVASIVE is one of the most vibrant, dynamic, and evolutionary among the computer-science-related symposia and conferences. The research challenges, e?orts, and contributions in pervasive computing have experienced a breathtaking acceleration over the past couple of years, mostly due to technological progress, growth, and a shift of paradigms in c- puter science in general. As for technological advances, a vast manifold of tiny, embedded, and autonomous computing and communication systems have st- ted to create and populate a pervasive and ubiquitous computing landscape, characterized by paradigms like autonomy, context-awareness, spontaneous - teraction, seamless integration, self-organization, ad hoc networking, invisible services, smart artifacts, and everywhere interfaces. The maturing of wireless networking, miniaturized information-processing possibilities induced by novel microprocessor technologies, low-power storage systems, smart materials, and technologies for motors, controllers, sensors, and actuators envision a future computing scenario in which almost every object in our everyday environment will be equipped with embedded processors, wireless communication facilities, and embedded software to perceive, perform, and control a multitude of tasks and functions.
Author: James D. Plummer Publisher: Cambridge University Press ISBN: 1009303570 Category : Technology & Engineering Languages : en Pages : 680
Book Description
Master fundamental technologies for modern semiconductor integrated circuits with this definitive textbook, for students from a range of STEM backgrounds, with a focus on big-picture thinking and industry-grade simulation. Includes over 450 full-color figures and over 280 homework problems, with solutions and lecture slides for instructors.
Author: N.P. Bigelow
Author: N.P. Bigelow
Author: J. L. Poirier
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Author: Luca Dal Negro
Author: Bruce W. Smith
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Author: Alois Ferscha
Author: James D. Plummer
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