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Author: Bo Cui Publisher: ISBN: 9789535155546 Category : Languages : en Pages : 628
Book Description
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Author: Bo Cui Publisher: ISBN: 9789535155546 Category : Languages : en Pages : 628
Book Description
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Author: Vivek Bakshi Publisher: SPIE Press ISBN: 0819469645 Category : Art Languages : ru Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: David Attwood Publisher: Cambridge University Press ISBN: 1139643428 Category : Technology & Engineering Languages : en Pages : 611
Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Author: Tim Salditt Publisher: Springer Nature ISBN: 3030344134 Category : Science Languages : en Pages : 634
Book Description
This open access book, edited and authored by a team of world-leading researchers, provides a broad overview of advanced photonic methods for nanoscale visualization, as well as describing a range of fascinating in-depth studies. Introductory chapters cover the most relevant physics and basic methods that young researchers need to master in order to work effectively in the field of nanoscale photonic imaging, from physical first principles, to instrumentation, to mathematical foundations of imaging and data analysis. Subsequent chapters demonstrate how these cutting edge methods are applied to a variety of systems, including complex fluids and biomolecular systems, for visualizing their structure and dynamics, in space and on timescales extending over many orders of magnitude down to the femtosecond range. Progress in nanoscale photonic imaging in Göttingen has been the sum total of more than a decade of work by a wide range of scientists and mathematicians across disciplines, working together in a vibrant collaboration of a kind rarely matched. This volume presents the highlights of their research achievements and serves as a record of the unique and remarkable constellation of contributors, as well as looking ahead at the future prospects in this field. It will serve not only as a useful reference for experienced researchers but also as a valuable point of entry for newcomers.
Author: Michael Werner Zürch Publisher: Springer ISBN: 3319123882 Category : Science Languages : en Pages : 139
Book Description
This thesis describes novel approaches and implementation of high-resolution microscopy in the extreme ultraviolet light regime. Using coherent ultrafast laser-generated short wavelength radiation for illuminating samples allows imaging beyond the resolution of visible-light microscopes. Michael Zürch gives a comprehensive overview of the fundamentals and techniques involved, starting from the laser-based frequency conversion scheme and its technical implementation as well as general considerations of diffraction-based imaging at nanoscopic spatial resolution. Experiments on digital in-line holography and coherent diffraction imaging of artificial and biologic specimens are demonstrated and discussed in this book. In the field of biologic imaging, a novel award-winning cell classification scheme and its first experimental application for identifying breast cancer cells are introduced. Finally, this book presents a newly developed technique of generating structured illumination by means of so-called optical vortex beams in the extreme ultraviolet regime and proposes its general usability for super-resolution imaging.
Author: Vivek Bakshi Publisher: SPIE Press ISBN: 9780819458452 Category : Art Languages : en Pages : 1104
Book Description
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author: Klaus D. Sattler Publisher: CRC Press ISBN: 1466505109 Category : Science Languages : en Pages : 754
Book Description
Ushering in the next technological era, this state-of-the-art book focuses on the instrumentation and experiments emerging at the picometer scale. International scientists and researchers at the forefront of the field address the key challenges in developing new instrumentation and techniques to visualize and measure structures at this sub-nanometer level. The book helps you understand how picoscience is an extension of nanoscience, determine which experimental technique to use in your research, and connect basic studies to the development of next-generation picoelectronic devices.
Author: Ichiro Inasaki Publisher: Springer Science & Business Media ISBN: 0306470004 Category : Science Languages : en Pages : 996
Book Description
Faced with ever-increasing market demands, manufacturing industry is forced to seek innovation and technological breakthrough. This state-of-the-art text aims to integrate broad aspects of precision and production engineering to cope with rapid changes in market needs and technological developments as we enter the 21st century. It addresses basic theory, extensive research in advanced topics, industrial applications, and relevant surveys in related fields. Major subjects covered by this book include: Advanced manufacturing systems; Ultra-precision machining and micro machining; Nanotechnology for fabrication and measurement; Chemo-mechanical processes; Rapid prototyping technology; New materials and advanced processes; Computer-aided production engineering; Manufacturing process control; Planning. This volume contains the proceedings of the 10th International Conference on Precision Engineering (ICPE), which was held in July 2001, in Yokohama, Japan. ICPE is a well-established conference in the field of production and precision engineering, covering a wide range of topics for future-oriented manufacturing systems and processes; it is organized by the Japan Society for Precision Engineering (JSPE). This book can be used as a reference for graduate and undergraduate courses in precision and production engineering, and also for researchers and industrial engineers to capture current trends in this field.
Author: Bo Cui Publisher: BoD – Books on Demand ISBN: 953307602X Category : Science Languages : en Pages : 630
Book Description
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Author: Franco Pavese Publisher: World Scientific ISBN: 9812839518 Category : Mathematics Languages : en Pages : 419
Book Description
The main theme of the AMCTM 2008 conference, reinforced by the establishment of IMEKO TC21, was to provide a central opportunity for the metrology and testing community worldwide to engage with applied mathematicians, statisticians and software engineers working in the relevant fields. This review volume consists of reviewed papers prepared on the basis of the oral and poster presentations of the Conference participants. It covers all the general matters of advanced statistical modeling (e.g. uncertainty evaluation, experimental design, optimization, data analysis and applications, multiple measurands, correlation, etc.), metrology software (e.g. engineering aspects, requirements or specification, risk assessment, software development, software examination, software tools for data analysis, visualization, experiment control, best practice, standards, etc.), numerical methods (e.g. numerical data analysis, numerical simulations, inverse problems, uncertainty evaluation of numerical algorithms, applications, etc.), and data fusion techniques and design and analysis of inter-laboratory comparisons.
Author: Bo Cui
Author: Bo Cui
Author: Vivek Bakshi
Author: David Attwood
Author: Tim Salditt
Author: Michael Werner Zürch
Author: Vivek Bakshi
Author: Klaus D. Sattler
Author: Ichiro Inasaki
Author: Bo Cui
Author: Franco Pavese