Pulsed Laser Deposition of Thin Films PDF Download

Author: Robert Eason
Publisher: John Wiley & Sons
ISBN: 0470052112
Category : Science
Languages : en
Pages : 754

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Book Description
Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.

Author: David J. Uhl
Publisher:
ISBN:
Category : Materials science
Languages : en
Pages : 76

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Book Description
The majority of nanotechnology-related research at the CSCU-CNT at Southern Connecticut State University involves depositing thin films of controlled thicknesses using a thermal physical vapor deposition method. The thermal evaporative method, however, is limited to the deposition of single transition metals with low melting points. This project greatly expands the scope of available materials for deposition through the development and implementation of a pulsed-laser deposition technique. A solid state, Nd:YAG, Q-switched laser from 1989 was restored and aligned, and a 3-dimensional CAD model of the high vacuum chamber was produced to aid in the configuration of the system. The power output of the laser beam was monitored using a digital intensity readout; the beam reached a maximum power of 2 Watts. Three target elements were selected for deposition onto a Silicon substrate in order to test the efficiency of the system. Copper, Iron, and Tantalum samples were exposed to the beam under vacuum for 5 minutes. The Silicon substrates were imaged under a scanning electron microscope. The images demonstrate successful depositions. This development has greatly widened the scope of materials available for thin film deposition, subsequently impacting future research at the CSCU-CNT in the field of nanotechnology.

Author: Liviu Duta
Publisher: MDPI
ISBN: 3036510443
Category : Medical
Languages : en
Pages : 224

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Book Description
Despite its limitation in terms of surface covered area, the PLD technique still gathers interest among researchers by offering endless possibilities for tuning thin film composition and enhancing their properties of interest due to: (i) the easiness of a stoichiometric transfer even for very complex target materials, (ii) high adherence of the deposited structures to the substrate, (iii) controlled degree of phase, crystallinity, and thickness of deposited coatings, (iv) versatility of the experimental set-up which allows for simultaneous ablation of multiple targets resulting in combinatorial maps or consecutive ablation of multiple targets producing multi-layered structures, and (v) adjustment of the number of laser pulses, resulting in either a spread of nanoparticles, islands of materials or a complete covering of a surface. Moreover, a variation of PLD, known as Matrix Assisted Pulsed Laser Evaporation, allows for deposition of organic materials, ranging from polymers to proteins and even living cells, otherwise difficult to transfer unaltered in the form of thin films by other techniques. Furthermore, the use of laser light as transfer agent ensures purity of films and pulse-to-pulse deposition allows for an unprecedented control of film thickness at the nm level. This Special Issue is a collection of state-of-the art research papers and reviews in which the topics of interest are devoted to thin film synthesis by PLD and MAPLE, for numerous research and industry field applications, such as bio-active coatings for medical implants and hard, protective coatings for cutting and drilling tools withstanding high friction and elevated temperatures, sensors, solar cells, lithography, magnetic devices, energy-storage and conversion devices, controlled drug delivery and in situ microstructuring for boosting of surface properties.

Author: Ion N. Mihailescu
Publisher: CRC Press
ISBN: 1351733524
Category : Science
Languages : en
Pages : 334

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Book Description
Pulsed laser–based techniques for depositing and processing materials are an important area of modern experimental and theoretical scientific research and development, with promising, challenging opportunities in the fields of nanofabrication and nanostructuring. Understanding the interplay between deposition/processing conditions, laser parameters, as well as material properties and dimensionality is demanding for improved fundamental knowledge and novel applications. This book introduces and discusses the basic principles of pulsed laser–matter interaction, with a focus on its peculiarities and perspectives compared to other conventional techniques and state-of-the-art applications. The book starts with an overview of the growth topics, followed by a discussion of laser–matter interaction depending on laser pulse duration, background conditions, materials, and combination of materials and structures. The information outlines the foundation to introduce examples of laser nanostructuring/processing of materials, pointing out the importance of pulsed laser–based technologies in modern (nano)science. With respect to similar texts and monographs, the book offers a comprehensive review including bottom-up and top-down laser-induced processes for nanoparticles and nanomicrostructure generation. Theoretical models are discussed by correlation with advanced experimental protocols in order to account for the fundamentals and underline physical mechanisms of laser–matter interaction. Reputed, internationally recognized experts in the field have contributed to this book. In particular, this book is suitable for a reader (graduate students as well as postgraduates and more generally researchers) new to the subject of pulsed laser ablation in order to gain physical insight into and advanced knowledge of mechanisms and processes involved in any deposition/processing experiment based on pulsed laser–matter interaction. Since knowledge in the field is given step by step comprehensively, this book serves as a valid introduction to the field as well as a foundation for further specific readings.

Author: KOJI SUGIOKA.
Publisher:
ISBN: 9783319695372
Category : Lasers in engineering
Languages : en
Pages :

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Book Description
This handbook provides a comprehensive review of the entire field of laser micro and nano processing, including not only a detailed introduction to individual laser processing techniques but also the fundamentals of laser-matter interaction and lasers, optics, equipment, diagnostics, as well as monitoring and measurement techniques for laser processing. Consisting of 11 sections, each composed of 4 to 6 chapters written by leading experts in the relevant field. Each main part of the handbook is supervised by its own part editor(s) so that high-quality content as well as completeness are assured. The book provides essential scientific and technical information to researchers and engineers already working in the field as well as students and young scientists planning to work in the area in the future. Lasers found application in materials processing practically since their invention in 1960, and are currently used widely in manufacturing. The main driving force behind this fact is that the lasers can provide unique solutions in material processing with high quality, high efficiency, high flexibility, high resolution, versatility and low environmental load. Macro-processing based on thermal process using infrared lasers such as CO2 lasers has been the mainstream in the early stages, while research and development of micro- and nano-processing are becoming increasingly more active as short wavelength and/or short pulse width lasers have been developed. In particular, recent advances in ultrafast lasers have opened up a new avenue to laser material processing due to the capabilities of ultrahigh precision micro- and nanofabrication of diverse materials. This handbook is the first book covering the basics, the state-of-the-art and important applications of the dynamic and rapidly expanding discipline of laser micro- and nanoengineering. This comprehensive source makes readers familiar with a broad spectrum of approaches to solve all relevant problems in science and technology. This handbook is the ultimate desk reference for all people working in the field.

Author: Dongfang Yang
Publisher: BoD – Books on Demand
ISBN: 9535128116
Category : Technology & Engineering
Languages : en
Pages : 430

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Book Description
Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters, and liquid or solid particles. This book covers various aspects of using laser ablation phenomenon for material processing including laser ablation applied for the deposition of thin films, for the synthesis of nanomaterials, and for the chemical compositional analysis and surface modification of materials. Through the 18 chapters written by experts from international scientific community, the reader will have access to the most recent research and development findings on laser ablation through original research studies and literature reviews.

Author: Yuan Lin
Publisher: John Wiley & Sons
ISBN: 3527696458
Category : Technology & Engineering
Languages : en
Pages : 328

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Book Description
This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.

Author: Roman Gr. Maev
Publisher: CRC Press
ISBN: 1466584432
Category : Science
Languages : en
Pages : 342

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Book Description
Your Guide to Advanced Cold Spray TechnologyCold Gas Dynamic Spray centers on cold gas dynamic spray (or cold spray-CS) technology, one of the most versatile thermal spray coating methods in materials engineering, and effectively describes and analyzes the main trends and developments behind the spray (coating) techniques. The book combines theory

Author: Douglas B. Chrisey
Publisher: Wiley-Interscience
ISBN: 9780471592181
Category : Technology & Engineering
Languages : en
Pages : 0

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Book Description
A comprehensive overview of what is required to set up and begin research in this newly developing technology and understand the basics of the process. Internationally recognized experts in their fields cover such fundamentals as history, theory, film characteristics, surface modification, laser technology, materials and applications including excellent reviews regarding the entire areas of semiconductor buffer layers, thin-film ferroelectrics and ferrites along with the work involving films deposited by PLD.

Author: Xiaojun Zhang
Publisher:
ISBN:
Category :
Languages : en
Pages : 79

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Book Description
Pulsed laser deposition (PLD) is a physical vapor deposition technique for thin film fabrication. Compared with other techniques, pulsed laser deposition technique has advantages such as stoichiometry, flexibility, versatility, lower deposition temperature, ability to grow metastable materials. Because of these advantages, pulsed laser deposition has been widely used in materials research. In this dissertation, pulsed laser deposition has been used to grow thin films for solid oxide fuel cell, light-emitting diode, and solar cell applications. Firstly, yttria-stabilized zirconia (YSZ) and cerium dioxide (CeO2) thin films are deposited in oxygen-deficient environments; their properties are compared to those deposited in oxygen-rich environments. Oxygen-deficient films are highly (001)-oriented, which corresponds to a surface that is expected to be forbidden based on Tasker's theoretical calculation of stoichiometric ionic crystals. A model considering non-stoichiometry-induced surface relaxation and surface atomic density is proposed to explain the orientation phenomenon observed under oxygen-deficient deposition conditions. This model is consistent with previous experimental results for indium tin oxide (ITO), SnO2 and NiO thin films deposited under similar conditions. Detailed studies of the preferred orientation of these oxygen-deficient ionic crystals are of direct relevance to the fabrication of films for use in solid oxide fuel cells. Secondly, undoped, Cu-doped, Se-enriched, Cu2Se-doped, Ag-doped, Ag2Se-doped, and nitrogen-doped ZnSe films have been grown on fused quartz substrates by pulsed laser deposition. It is found that adding a small amount (~2 mol%) of Cu2Se can significantly improve crystallinity and (111) texturing of ZnSe films. While the other films are highly resistive, Cu2Se-doped ZnSe films are p-type conducting with hole concentrations of ~ cm-3 and resistivity of ~0.098 ohm*cm (compared with previous reports of ~ cm-3 and 0.75 ohm*cm, respectively). The successful heavy p-type doping of ZnSe films is attributed to substitution of Zn atoms with Cu while limiting selenium-vacancy-associated compensating defects with additional selenium. Nitrogen doping has turned ZnSe films more favorable to wurtzite structures. Two newly observed Raman peaks at 555 cm-1 and 602 cm-1 are assigned to N local vibrational modes of hexagonal ZnSe structures. The nitrogen-doped ZnSe films are not conductive, which might be due to compensating defects arising from the presence of native defects or other impurities. This work is of importance to solve doping difficulties and contact problems of wide-bandgap semiconductors. Finally, batch growth of thin films by pulsed laser deposition has been tried. Using the natural temperature gradient, films with different deposition temperatures have been fabricated together. With change of deposition temperatures, ZnSe films are shown to have problems associated with crystalline defects, selenium loss, or phase separation. ZnSe films with improved crystallinity and no phase separation have been achieved using a 16 mol% Se enriched target. Multi-plume pulsed laser deposition has been proposed and discussed. With directionality of PLD plumes and non-uniformity of PLD films, this system is supposed to be more suitable for high-throughput compound thin film fabrication, which makes it very promising for efficient materials optimization and exploration. High-throughput fabrication of compound thin films has been successfully achieved using this system.