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Author: Ozgur Baskan Publisher: BoD – Books on Demand ISBN: 9535125923 Category : Mathematics Languages : en Pages : 326
Book Description
This book covers state-of-the-art optimization methods and their applications in wide range especially for researchers and practitioners who wish to improve their knowledge in this field. It consists of 13 chapters divided into two parts: (I) Engineering applications, which presents some new applications of different methods, and (II) Applications in various areas, where recent contributions of state-of-the-art optimization methods to diverse fields are presented.
Author: Ozgur Baskan Publisher: BoD – Books on Demand ISBN: 9535125923 Category : Mathematics Languages : en Pages : 326
Book Description
This book covers state-of-the-art optimization methods and their applications in wide range especially for researchers and practitioners who wish to improve their knowledge in this field. It consists of 13 chapters divided into two parts: (I) Engineering applications, which presents some new applications of different methods, and (II) Applications in various areas, where recent contributions of state-of-the-art optimization methods to diverse fields are presented.
Author: Alan Michette Publisher: Royal Society of Chemistry ISBN: 1849734569 Category : Science Languages : en Pages : 468
Book Description
Our ability to manipulate short wavelength radiation (0.01-100nm, equivalent to 120keV-12eV) has increased significantly over the last three decades. This has lead to major advances in applications in a wide range of disciplines such as: the life and medical sciences, including cancer-related studies; environmental science, including studies of pollution and its effects; archaeology and other cultural heritage disciplines; and materials science. Although expansion in application areas is due largely to modern synchrotron sources, many applications will not become widespread, and therefore routinely available as analytical tools, if they are confined to synchrotrons. This is because synchrotrons require enormous capital and infrastructure costs and are often, of necessity, national or international facilities. This seriously limits their scope for applications in research and analysis, in both academia and industry. How many universities, research institutes or even industrial laboratories would have electron microscopes if electron sources cost ú100M or more Hence the need to develop bright but small and (relatively) cheap x-ray sources, not to replace synchrotrons but to complement them. Written by a distinguished team of international authors this exemplary new handbook is based on the COST Action MP0601: Short Wavelength Laboratory Sources. The contents are divided into five main sections. The introductory section provides a comprehensive introduction to the fundamentals of radiation, generation mechanisms and short wavelength laboratory sources. The middle sections focus on modelling and simulation, source development: improvement and characterisation and integrated systems: sources, optics and detectors. The final section looks at recent applications.
Author: Vivek Bakshi Publisher: SPIE Press ISBN: 0819469645 Category : Art Languages : ru Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: David Attwood Publisher: Cambridge University Press ISBN: 1139643428 Category : Technology & Engineering Languages : en Pages : 611
Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Author: Syed Rizvi Publisher: CRC Press ISBN: 1420028782 Category : Technology & Engineering Languages : en Pages : 730
Book Description
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Author: Kouichi Tsuji Publisher: John Wiley & Sons ISBN: 0470020423 Category : Science Languages : en Pages : 616
Book Description
X-Ray Spectrometry: Recent Technological Advances covers the latest developments and areas of research in the methodological and instrumental aspects of x-ray spectrometry. Includes the most advanced and high-tech aspects of the chemical analysis techniques based on x-rays Introduces new types of X-ray optics and X-ray detectors, covering history, principles, characteristics and future trends Written by internationally recognized scientists, all of whom are eminent specialists in each of the sub-fields Sections include: X-Ray Sources, X-Ray Optics, X-Ray Detectors, Special Configurations, New Computerization Methods, New Applications This valuable book will assist all analytical chemists and other users of x-ray spectrometry to fully exploit the capabilities of this set of powerful analytical tools and to further expand applications in such fields as material and environmental sciences, medicine, toxicology, forensics, archaeometry and many others.
Author: Bo Cui Publisher: BoD – Books on Demand ISBN: 953307602X Category : Science Languages : en Pages : 630
Book Description
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Author: Vivek Bakshi Publisher: SPIE Press ISBN: 9780819458452 Category : Art Languages : en Pages : 1104
Book Description
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author: Ozgur Baskan
Author: Ozgur Baskan
Author: Alan Michette
Author: Vivek Bakshi
Author: David Attwood
Author: Nen-Wen Pu
Author: Syed Rizvi
Author: Kouichi Tsuji
Author: Bo Cui
Author: National Institute of Standards and Technology (U.S.)
Author: Vivek Bakshi